JPS5986238A - 半導体装置の製造方法 - Google Patents
半導体装置の製造方法Info
- Publication number
- JPS5986238A JPS5986238A JP58161616A JP16161683A JPS5986238A JP S5986238 A JPS5986238 A JP S5986238A JP 58161616 A JP58161616 A JP 58161616A JP 16161683 A JP16161683 A JP 16161683A JP S5986238 A JPS5986238 A JP S5986238A
- Authority
- JP
- Japan
- Prior art keywords
- region
- oxide
- junction
- films
- semiconductor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Bipolar Transistors (AREA)
- Element Separation (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP58161616A JPS5986238A (ja) | 1983-09-02 | 1983-09-02 | 半導体装置の製造方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP58161616A JPS5986238A (ja) | 1983-09-02 | 1983-09-02 | 半導体装置の製造方法 |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP51114052A Division JPS6035818B2 (ja) | 1976-09-22 | 1976-09-22 | 半導体装置の製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5986238A true JPS5986238A (ja) | 1984-05-18 |
JPS6229891B2 JPS6229891B2 (enrdf_load_stackoverflow) | 1987-06-29 |
Family
ID=15738553
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP58161616A Granted JPS5986238A (ja) | 1983-09-02 | 1983-09-02 | 半導体装置の製造方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5986238A (enrdf_load_stackoverflow) |
-
1983
- 1983-09-02 JP JP58161616A patent/JPS5986238A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS6229891B2 (enrdf_load_stackoverflow) | 1987-06-29 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US4074304A (en) | Semiconductor device having a miniature junction area and process for fabricating same | |
US4408387A (en) | Method for producing a bipolar transistor utilizing an oxidized semiconductor masking layer in conjunction with an anti-oxidation mask | |
US4191595A (en) | Method of manufacturing PN junctions in a semiconductor region to reach an isolation layer without exposing the semiconductor region surface | |
JPH0828424B2 (ja) | 半導体装置およびその製造方法 | |
JPS5986238A (ja) | 半導体装置の製造方法 | |
JPS6244862B2 (enrdf_load_stackoverflow) | ||
JP2526556B2 (ja) | ショットキバリヤダイオ−ドの製造方法 | |
JPS628939B2 (enrdf_load_stackoverflow) | ||
JPS61135136A (ja) | 半導体装置の製造方法 | |
JPS61172346A (ja) | 半導体集積回路装置 | |
JPS6229889B2 (enrdf_load_stackoverflow) | ||
JP2571449B2 (ja) | バイポーラicの製造方法 | |
JPS59107572A (ja) | 半導体装置の製造方法 | |
JPS6229890B2 (enrdf_load_stackoverflow) | ||
JPS59134868A (ja) | 半導体装置の製造方法 | |
JPH0855999A (ja) | 半導体装置 | |
JPS639150A (ja) | 半導体装置の製造方法 | |
JPS63122161A (ja) | 半導体集積回路装置の製造方法 | |
JPS6214948B2 (enrdf_load_stackoverflow) | ||
JPS60170258A (ja) | 半導体装置の製造方法 | |
JPS59231833A (ja) | 半導体装置及びその製造法 | |
JPS60103640A (ja) | 半導体装置 | |
JPH0371770B2 (enrdf_load_stackoverflow) | ||
JPH0650740B2 (ja) | 半導体装置 | |
JPS61172369A (ja) | 半導体装置の製造方法 |