JPS5981850A - 電子レンズ - Google Patents

電子レンズ

Info

Publication number
JPS5981850A
JPS5981850A JP57191787A JP19178782A JPS5981850A JP S5981850 A JPS5981850 A JP S5981850A JP 57191787 A JP57191787 A JP 57191787A JP 19178782 A JP19178782 A JP 19178782A JP S5981850 A JPS5981850 A JP S5981850A
Authority
JP
Japan
Prior art keywords
coil
magnetomotive force
lens
excitation
temperature
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP57191787A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0234419B2 (enExample
Inventor
Akira Yonezawa
米沢　彬
Tetsuo Iwaki
岩城　哲郎
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
INTERNATL PRECISION Inc
Original Assignee
INTERNATL PRECISION Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by INTERNATL PRECISION Inc filed Critical INTERNATL PRECISION Inc
Priority to JP57191787A priority Critical patent/JPS5981850A/ja
Publication of JPS5981850A publication Critical patent/JPS5981850A/ja
Publication of JPH0234419B2 publication Critical patent/JPH0234419B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/10—Lenses
    • H01J37/14—Lenses magnetic
    • H01J37/141—Electromagnetic lenses

Landscapes

  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
JP57191787A 1982-11-02 1982-11-02 電子レンズ Granted JPS5981850A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57191787A JPS5981850A (ja) 1982-11-02 1982-11-02 電子レンズ

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57191787A JPS5981850A (ja) 1982-11-02 1982-11-02 電子レンズ

Publications (2)

Publication Number Publication Date
JPS5981850A true JPS5981850A (ja) 1984-05-11
JPH0234419B2 JPH0234419B2 (enExample) 1990-08-03

Family

ID=16280529

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57191787A Granted JPS5981850A (ja) 1982-11-02 1982-11-02 電子レンズ

Country Status (1)

Country Link
JP (1) JPS5981850A (enExample)

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62100936A (ja) * 1985-10-28 1987-05-11 Shimadzu Corp 荷電粒子線を用いた分析装置の試料汚染防止方法
US4735288A (en) * 1986-01-24 1988-04-05 Ckd Kabushiki Kaisha Detachably attaching mechanism for cup of lubricator or filter used with air-actuated device
EP0596529A1 (en) * 1992-11-06 1994-05-11 Hitachi, Ltd. Electron lens
US6429607B1 (en) 2000-08-15 2002-08-06 International Business Machines Corporation Constant power dynamic focus coil
JP2005038853A (ja) * 2003-07-14 2005-02-10 Fei Co 二重ビーム装置
JP2005038857A (ja) * 2003-07-14 2005-02-10 Fei Co 磁界レンズ
JP2007335134A (ja) * 2006-06-13 2007-12-27 Hitachi High-Technologies Corp 走査電子顕微鏡
US8183547B2 (en) 2009-05-28 2012-05-22 Fei Company Dual beam system
JP2019050189A (ja) * 2017-08-08 2019-03-28 エクスロン インターナショナル ゲゼルシャフト ミット ベシュレンクテル ハフツングＹｘｌｏｎ Ｉｎｔｅｒｎａｔｉｏｎａｌ Ｇｍｂｈ Ｘ線管用の対物レンズ及び集束レンズ、ｘ線管並びにそのようなｘ線管を操作する方法
JP2020087701A (ja) * 2018-11-26 2020-06-04 日本電子株式会社 荷電粒子線装置及び荷電粒子線装置の制御方法

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57151160A (en) * 1981-03-16 1982-09-18 Internatl Precision Inc Electron lens

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57151160A (en) * 1981-03-16 1982-09-18 Internatl Precision Inc Electron lens

Cited By (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62100936A (ja) * 1985-10-28 1987-05-11 Shimadzu Corp 荷電粒子線を用いた分析装置の試料汚染防止方法
US4735288A (en) * 1986-01-24 1988-04-05 Ckd Kabushiki Kaisha Detachably attaching mechanism for cup of lubricator or filter used with air-actuated device
EP0596529A1 (en) * 1992-11-06 1994-05-11 Hitachi, Ltd. Electron lens
US6429607B1 (en) 2000-08-15 2002-08-06 International Business Machines Corporation Constant power dynamic focus coil
US8013311B2 (en) 2003-07-14 2011-09-06 Fei Company Dual beam system
JP2005038857A (ja) * 2003-07-14 2005-02-10 Fei Co 磁界レンズ
EP1498929A3 (en) * 2003-07-14 2009-09-02 FEI Company Magnetic lens
JP2011151042A (ja) * 2003-07-14 2011-08-04 Fei Co 磁界レンズ
JP2005038853A (ja) * 2003-07-14 2005-02-10 Fei Co 二重ビーム装置
JP2007335134A (ja) * 2006-06-13 2007-12-27 Hitachi High-Technologies Corp 走査電子顕微鏡
US8183547B2 (en) 2009-05-28 2012-05-22 Fei Company Dual beam system
JP2019050189A (ja) * 2017-08-08 2019-03-28 エクスロン インターナショナル ゲゼルシャフト ミット ベシュレンクテル ハフツングＹｘｌｏｎ Ｉｎｔｅｒｎａｔｉｏｎａｌ Ｇｍｂｈ Ｘ線管用の対物レンズ及び集束レンズ、ｘ線管並びにそのようなｘ線管を操作する方法
JP2020087701A (ja) * 2018-11-26 2020-06-04 日本電子株式会社 荷電粒子線装置及び荷電粒子線装置の制御方法

Also Published As

Publication number Publication date
JPH0234419B2 (enExample) 1990-08-03

Similar Documents

Publication Publication Date Title
JPS5981850A (ja) 電子レンズ
EP0045844B1 (en) Arrangement for focusing a beam of charged particles with variable focus
EP0622637A2 (en) Atomic layered materials for giant magnetoresistive sensor
JP2005031089A (ja) 開ループ電流センサとそのセンサを備えた電源回路
WO2002065609A1 (fr) Protection contre la surcharge de courant faisant appel a un element d'impedance magnetique
JPS60137077A (ja) 超電導回路の持続電流ル−プの微調節用スイツチ
Goodwill et al. Intrinsic current overshoot during thermal-runaway threshold switching events in TaOx devices
Gerhardt et al. Magnetic diagnostics for equilibrium reconstruction and realtime plasma control in NSTX-Upgrade
Benedict Use of an Alternating Current Bridge in Laboratory Temperature Control
Ceriale et al. Electro-thermal bistability in (La0. 7Sr0. 3) MnO3 suspended microbridges: Thermal characterization and transient analysis
JP7198605B2 (ja) Ｘ線管用の対物レンズ及び集束レンズ、ｘ線管並びにそのようなｘ線管を操作する方法
JPH07302747A (ja) 駆動装置
US3559039A (en) Regulated power supply with thermal compensation
KR20180091666A (ko) 자기저항 메모리 장치
US2319406A (en) Temperature control instrument
JP2020068293A (ja) 超電導磁石装置
JPH07302124A (ja) 駆動装置
JPH0454458A (ja) 電流検出装置
US7019308B2 (en) Thermal compensation in magnetic field influencing of an electron beam
US2282480A (en) Measuring and control apparatus
JP2005079092A (ja) 電子ビームの磁場作用における熱補償
US2249876A (en) Resistor
JPS6338825B2 (enExample)
KR102553568B1 (ko) 탭절환 변압기 제어 장치 및 방법
Chambers Power Calorimetry of Fast-Particle Beams