JPS596527A - 高移動度のインジウム−アンチモン系複合結晶薄膜の製造方法 - Google Patents
高移動度のインジウム−アンチモン系複合結晶薄膜の製造方法Info
- Publication number
- JPS596527A JPS596527A JP57116542A JP11654282A JPS596527A JP S596527 A JPS596527 A JP S596527A JP 57116542 A JP57116542 A JP 57116542A JP 11654282 A JP11654282 A JP 11654282A JP S596527 A JPS596527 A JP S596527A
- Authority
- JP
- Japan
- Prior art keywords
- temperature
- thin film
- evaporation
- indium
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
- H10P14/20—Formation of materials, e.g. in the shape of layers or pillars of semiconductor materials
- H10P14/34—Deposited materials, e.g. layers
- H10P14/3402—Deposited materials, e.g. layers characterised by the chemical composition
- H10P14/3414—Deposited materials, e.g. layers characterised by the chemical composition being group IIIA-VIA materials
- H10P14/3422—Antimonides
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
- H10P14/20—Formation of materials, e.g. in the shape of layers or pillars of semiconductor materials
- H10P14/22—Formation of materials, e.g. in the shape of layers or pillars of semiconductor materials using physical deposition, e.g. vacuum deposition or sputtering
Landscapes
- Physical Vapour Deposition (AREA)
- Hall/Mr Elements (AREA)
- Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
- Inorganic Compounds Of Heavy Metals (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57116542A JPS596527A (ja) | 1982-07-05 | 1982-07-05 | 高移動度のインジウム−アンチモン系複合結晶薄膜の製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57116542A JPS596527A (ja) | 1982-07-05 | 1982-07-05 | 高移動度のインジウム−アンチモン系複合結晶薄膜の製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS596527A true JPS596527A (ja) | 1984-01-13 |
| JPH0359571B2 JPH0359571B2 (enExample) | 1991-09-11 |
Family
ID=14689691
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP57116542A Granted JPS596527A (ja) | 1982-07-05 | 1982-07-05 | 高移動度のインジウム−アンチモン系複合結晶薄膜の製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS596527A (enExample) |
-
1982
- 1982-07-05 JP JP57116542A patent/JPS596527A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0359571B2 (enExample) | 1991-09-11 |
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