JPS5961969A - 半導体装置の製造方法 - Google Patents
半導体装置の製造方法Info
- Publication number
- JPS5961969A JPS5961969A JP57172174A JP17217482A JPS5961969A JP S5961969 A JPS5961969 A JP S5961969A JP 57172174 A JP57172174 A JP 57172174A JP 17217482 A JP17217482 A JP 17217482A JP S5961969 A JPS5961969 A JP S5961969A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- type
- recess
- semiconductor layer
- gaas
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/40—FETs having zero-dimensional [0D], one-dimensional [1D] or two-dimensional [2D] charge carrier gas channels
- H10D30/47—FETs having zero-dimensional [0D], one-dimensional [1D] or two-dimensional [2D] charge carrier gas channels having 2D charge carrier gas channels, e.g. nanoribbon FETs or high electron mobility transistors [HEMT]
- H10D30/471—High electron mobility transistors [HEMT] or high hole mobility transistors [HHMT]
- H10D30/475—High electron mobility transistors [HEMT] or high hole mobility transistors [HHMT] having wider bandgap layer formed on top of lower bandgap active layer, e.g. undoped barrier HEMTs such as i-AlGaN/GaN HEMTs
- H10D30/4755—High electron mobility transistors [HEMT] or high hole mobility transistors [HHMT] having wider bandgap layer formed on top of lower bandgap active layer, e.g. undoped barrier HEMTs such as i-AlGaN/GaN HEMTs having wide bandgap charge-carrier supplying layers, e.g. modulation doped HEMTs such as n-AlGaAs/GaAs HEMTs
Landscapes
- Weting (AREA)
- Junction Field-Effect Transistors (AREA)
- Bipolar Transistors (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP57172174A JPS5961969A (ja) | 1982-09-30 | 1982-09-30 | 半導体装置の製造方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP57172174A JPS5961969A (ja) | 1982-09-30 | 1982-09-30 | 半導体装置の製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5961969A true JPS5961969A (ja) | 1984-04-09 |
JPS6357948B2 JPS6357948B2 (enrdf_load_stackoverflow) | 1988-11-14 |
Family
ID=15936938
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP57172174A Granted JPS5961969A (ja) | 1982-09-30 | 1982-09-30 | 半導体装置の製造方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5961969A (enrdf_load_stackoverflow) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63258023A (ja) * | 1987-04-15 | 1988-10-25 | Fujitsu Ltd | 半導体装置の製造方法 |
JPH0318037A (ja) * | 1989-06-14 | 1991-01-25 | Fujitsu Ltd | 半導体装置の製造方法 |
-
1982
- 1982-09-30 JP JP57172174A patent/JPS5961969A/ja active Granted
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63258023A (ja) * | 1987-04-15 | 1988-10-25 | Fujitsu Ltd | 半導体装置の製造方法 |
JPH0318037A (ja) * | 1989-06-14 | 1991-01-25 | Fujitsu Ltd | 半導体装置の製造方法 |
Also Published As
Publication number | Publication date |
---|---|
JPS6357948B2 (enrdf_load_stackoverflow) | 1988-11-14 |
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