JPS5957424A - 電子ビ−ム露光装置 - Google Patents

電子ビ−ム露光装置

Info

Publication number
JPS5957424A
JPS5957424A JP57168803A JP16880382A JPS5957424A JP S5957424 A JPS5957424 A JP S5957424A JP 57168803 A JP57168803 A JP 57168803A JP 16880382 A JP16880382 A JP 16880382A JP S5957424 A JPS5957424 A JP S5957424A
Authority
JP
Japan
Prior art keywords
electron beam
closer
object lens
dynamic focus
magnetic field
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP57168803A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0434290B2 (OSRAM
Inventor
Mamoru Nakasuji
護 中筋
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Priority to JP57168803A priority Critical patent/JPS5957424A/ja
Publication of JPS5957424A publication Critical patent/JPS5957424A/ja
Publication of JPH0434290B2 publication Critical patent/JPH0434290B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/3002—Details
    • H01J37/3007—Electron or ion-optical systems

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Electron Beam Exposure (AREA)
JP57168803A 1982-09-28 1982-09-28 電子ビ−ム露光装置 Granted JPS5957424A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57168803A JPS5957424A (ja) 1982-09-28 1982-09-28 電子ビ−ム露光装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57168803A JPS5957424A (ja) 1982-09-28 1982-09-28 電子ビ−ム露光装置

Publications (2)

Publication Number Publication Date
JPS5957424A true JPS5957424A (ja) 1984-04-03
JPH0434290B2 JPH0434290B2 (OSRAM) 1992-06-05

Family

ID=15874770

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57168803A Granted JPS5957424A (ja) 1982-09-28 1982-09-28 電子ビ−ム露光装置

Country Status (1)

Country Link
JP (1) JPS5957424A (OSRAM)

Also Published As

Publication number Publication date
JPH0434290B2 (OSRAM) 1992-06-05

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