JPH0434290B2 - - Google Patents

Info

Publication number
JPH0434290B2
JPH0434290B2 JP57168803A JP16880382A JPH0434290B2 JP H0434290 B2 JPH0434290 B2 JP H0434290B2 JP 57168803 A JP57168803 A JP 57168803A JP 16880382 A JP16880382 A JP 16880382A JP H0434290 B2 JPH0434290 B2 JP H0434290B2
Authority
JP
Japan
Prior art keywords
electron beam
magnetic field
objective lens
dynamic focus
focusing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP57168803A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5957424A (ja
Inventor
Mamoru Nakasuji
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Shibaura Electric Co Ltd filed Critical Tokyo Shibaura Electric Co Ltd
Priority to JP57168803A priority Critical patent/JPS5957424A/ja
Publication of JPS5957424A publication Critical patent/JPS5957424A/ja
Publication of JPH0434290B2 publication Critical patent/JPH0434290B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/3002—Details
    • H01J37/3007—Electron or ion-optical systems

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Electron Beam Exposure (AREA)
JP57168803A 1982-09-28 1982-09-28 電子ビ−ム露光装置 Granted JPS5957424A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57168803A JPS5957424A (ja) 1982-09-28 1982-09-28 電子ビ−ム露光装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57168803A JPS5957424A (ja) 1982-09-28 1982-09-28 電子ビ−ム露光装置

Publications (2)

Publication Number Publication Date
JPS5957424A JPS5957424A (ja) 1984-04-03
JPH0434290B2 true JPH0434290B2 (OSRAM) 1992-06-05

Family

ID=15874770

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57168803A Granted JPS5957424A (ja) 1982-09-28 1982-09-28 電子ビ−ム露光装置

Country Status (1)

Country Link
JP (1) JPS5957424A (OSRAM)

Also Published As

Publication number Publication date
JPS5957424A (ja) 1984-04-03

Similar Documents

Publication Publication Date Title
US7598497B2 (en) Charged particle beam scanning method and charged particle beam apparatus
JPH07134964A (ja) 試料の高さ計測手段を備えた電子ビーム装置
JPH04242060A (ja) 反射電子顕微鏡
US4710639A (en) Ion beam lithography system
EP0035556B1 (en) Electron beam system
JP4677571B2 (ja) 電子ビーム投影装置及びフォーカシング方法
JP2002367552A (ja) 荷電粒子線装置
JPS5727551A (en) Electron microscope
US7388198B2 (en) Electron microscope
JPH0434290B2 (OSRAM)
US6858845B2 (en) Scanning electron microscope
WO2019049261A1 (ja) 電子銃および電子ビーム応用装置
JPH0877957A (ja) 荷電粒子投射装置
JP4896626B2 (ja) 走査電子顕微鏡
JP2824340B2 (ja) 断面加工観察方法
JP7627791B2 (ja) 荷電粒子線装置及び荷電粒子線装置におけるビームの偏向方法
JPS63216256A (ja) 荷電粒子線装置
JP2886168B2 (ja) 電子線装置
JPH0587014B2 (OSRAM)
JP2019169362A (ja) 電子ビーム装置
JPH0689683A (ja) 電磁型レンズ
JPS5945173B2 (ja) 走査電子顕微鏡
SU1243046A1 (ru) Электронный микроскоп
JPS62115715A (ja) 電子ビ−ム露光装置
JPS62140346A (ja) 走査形電子顕微鏡