JPS5952814B2 - ポジ型ホトレジスト層のきず密度減少法 - Google Patents

ポジ型ホトレジスト層のきず密度減少法

Info

Publication number
JPS5952814B2
JPS5952814B2 JP52068992A JP6899277A JPS5952814B2 JP S5952814 B2 JPS5952814 B2 JP S5952814B2 JP 52068992 A JP52068992 A JP 52068992A JP 6899277 A JP6899277 A JP 6899277A JP S5952814 B2 JPS5952814 B2 JP S5952814B2
Authority
JP
Japan
Prior art keywords
photoresist
exposure
layer
photoresist layer
density
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP52068992A
Other languages
English (en)
Japanese (ja)
Other versions
JPS52154405A (en
Inventor
ガボ−ル・パ−ル
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Publication of JPS52154405A publication Critical patent/JPS52154405A/ja
Publication of JPS5952814B2 publication Critical patent/JPS5952814B2/ja
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/76—Photosensitive materials characterised by the base or auxiliary layers
    • G03C1/85—Photosensitive materials characterised by the base or auxiliary layers characterised by antistatic additives or coatings
    • A—HUMAN NECESSITIES
    • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61K—PREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
    • A61K8/00—Cosmetics or similar toiletry preparations
    • A61K8/18—Cosmetics or similar toiletry preparations characterised by the composition
    • A61K8/72—Cosmetics or similar toiletry preparations characterised by the composition containing organic macromolecular compounds
    • A61K8/73—Polysaccharides
    • A61K8/736—Chitin; Chitosan; Derivatives thereof
    • A—HUMAN NECESSITIES
    • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61Q—SPECIFIC USE OF COSMETICS OR SIMILAR TOILETRY PREPARATIONS
    • A61Q5/00—Preparations for care of the hair
    • A61Q5/06—Preparations for styling the hair, e.g. by temporary shaping or colouring
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/0226—Quinonediazides characterised by the non-macromolecular additives

Landscapes

  • Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Veterinary Medicine (AREA)
  • General Physics & Mathematics (AREA)
  • Public Health (AREA)
  • Animal Behavior & Ethology (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Birds (AREA)
  • Epidemiology (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Materials For Photolithography (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP52068992A 1976-06-12 1977-06-13 ポジ型ホトレジスト層のきず密度減少法 Expired JPS5952814B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE000P26264197 1976-06-12
DE2626419A DE2626419C2 (de) 1976-06-12 1976-06-12 Lichtempfindliches Gemisch

Publications (2)

Publication Number Publication Date
JPS52154405A JPS52154405A (en) 1977-12-22
JPS5952814B2 true JPS5952814B2 (ja) 1984-12-21

Family

ID=5980401

Family Applications (1)

Application Number Title Priority Date Filing Date
JP52068992A Expired JPS5952814B2 (ja) 1976-06-12 1977-06-13 ポジ型ホトレジスト層のきず密度減少法

Country Status (5)

Country Link
US (1) US4142892A (enExample)
JP (1) JPS5952814B2 (enExample)
AU (1) AU516133B2 (enExample)
DE (1) DE2626419C2 (enExample)
FR (1) FR2354578A1 (enExample)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5558531A (en) * 1978-10-25 1980-05-01 Chiyou Lsi Gijutsu Kenkyu Kumiai Fine processing
US4340654A (en) * 1980-06-19 1982-07-20 Campi James G Defect-free photomask
US4517281A (en) * 1980-10-06 1985-05-14 E. I. Du Pont De Nemours And Company Development process for aqueous developable photopolymerizable elements
US4485167A (en) * 1980-10-06 1984-11-27 E. I. Du Pont De Nemours And Company Aqueous developable photopolymerizable elements
US5168030A (en) * 1986-10-13 1992-12-01 Mitsubishi Denki Kabushiki Kaisha Positive type o-quinone diazide photo-resist containing antistatic agent selected from hydrazones, ethylcarbazole and bis(dimethylamino)benzene
JPH083628B2 (ja) * 1986-10-13 1996-01-17 三菱電機株式会社 非帯電性レジスト

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB772517A (en) * 1954-02-06 1957-04-17 Kalle & Co Ag Improvements in or relating to photo-mechanical reproduction
US2974042A (en) * 1956-06-23 1961-03-07 Keuffel & Esser Co Diazotype reproduction process
US3615532A (en) * 1963-12-09 1971-10-26 Union Carbide Corp Printing plate compositions
US3637644A (en) * 1967-03-08 1972-01-25 Eastman Kodak Co Azonia diazo ketones
US3661582A (en) * 1970-03-23 1972-05-09 Western Electric Co Additives to positive photoresists which increase the sensitivity thereof
US3873316A (en) * 1970-06-11 1975-03-25 Kalle Ag Process for the production of a light-sensitive copying material having a copper-containing support, and copying material so produced
US3827908A (en) * 1972-12-11 1974-08-06 Ibm Method for improving photoresist adherence
US4036644A (en) * 1973-03-16 1977-07-19 International Business Machines Corporation Photoresist process and photosensitive O-quinone diazide article with aliphatic carboxylic acid as adhesion promotor
DE2331377C2 (de) * 1973-06-20 1982-10-14 Hoechst Ag, 6000 Frankfurt Lichtempfindliches Kopiermaterial
US4009033A (en) * 1975-09-22 1977-02-22 International Business Machines Corporation High speed positive photoresist composition

Also Published As

Publication number Publication date
FR2354578B1 (enExample) 1980-02-01
DE2626419C2 (de) 1982-10-21
DE2626419A1 (de) 1977-12-22
AU516133B2 (en) 1981-05-21
US4142892A (en) 1979-03-06
AU2618077A (en) 1978-12-21
JPS52154405A (en) 1977-12-22
FR2354578A1 (fr) 1978-01-06

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