JPS5952563A - コ−テイング装置 - Google Patents
コ−テイング装置Info
- Publication number
- JPS5952563A JPS5952563A JP16345182A JP16345182A JPS5952563A JP S5952563 A JPS5952563 A JP S5952563A JP 16345182 A JP16345182 A JP 16345182A JP 16345182 A JP16345182 A JP 16345182A JP S5952563 A JPS5952563 A JP S5952563A
- Authority
- JP
- Japan
- Prior art keywords
- sample
- specimen
- sintered filter
- chemical liquid
- clean
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Coating Apparatus (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16345182A JPS5952563A (ja) | 1982-09-20 | 1982-09-20 | コ−テイング装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16345182A JPS5952563A (ja) | 1982-09-20 | 1982-09-20 | コ−テイング装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5952563A true JPS5952563A (ja) | 1984-03-27 |
JPH0361510B2 JPH0361510B2 (de) | 1991-09-20 |
Family
ID=15774126
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP16345182A Granted JPS5952563A (ja) | 1982-09-20 | 1982-09-20 | コ−テイング装置 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5952563A (de) |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0169541A2 (de) * | 1984-07-24 | 1986-01-29 | J.T. Baker Inc. | Chemischer Reaktor für VLSI |
JPS6251221A (ja) * | 1985-08-30 | 1987-03-05 | Nec Kyushu Ltd | 塗布装置 |
JPS62198122A (ja) * | 1986-02-26 | 1987-09-01 | Hitachi Ltd | 半導体処理装置 |
JPS6482628A (en) * | 1987-09-25 | 1989-03-28 | Toshiba Corp | Photoresist processing device |
JPH01254277A (ja) * | 1988-03-31 | 1989-10-11 | Matsushita Electric Ind Co Ltd | スピナー回転処理装置 |
JPH03267169A (ja) * | 1990-03-15 | 1991-11-28 | Matsushita Electric Ind Co Ltd | 薄膜製造装置 |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS498499A (de) * | 1972-03-27 | 1974-01-25 | ||
JPS56113377A (en) * | 1980-02-12 | 1981-09-07 | Fujitsu Ltd | Rotary coater |
-
1982
- 1982-09-20 JP JP16345182A patent/JPS5952563A/ja active Granted
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS498499A (de) * | 1972-03-27 | 1974-01-25 | ||
JPS56113377A (en) * | 1980-02-12 | 1981-09-07 | Fujitsu Ltd | Rotary coater |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0169541A2 (de) * | 1984-07-24 | 1986-01-29 | J.T. Baker Inc. | Chemischer Reaktor für VLSI |
JPS6251221A (ja) * | 1985-08-30 | 1987-03-05 | Nec Kyushu Ltd | 塗布装置 |
JPS62198122A (ja) * | 1986-02-26 | 1987-09-01 | Hitachi Ltd | 半導体処理装置 |
JPS6482628A (en) * | 1987-09-25 | 1989-03-28 | Toshiba Corp | Photoresist processing device |
JPH01254277A (ja) * | 1988-03-31 | 1989-10-11 | Matsushita Electric Ind Co Ltd | スピナー回転処理装置 |
JPH03267169A (ja) * | 1990-03-15 | 1991-11-28 | Matsushita Electric Ind Co Ltd | 薄膜製造装置 |
Also Published As
Publication number | Publication date |
---|---|
JPH0361510B2 (de) | 1991-09-20 |
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