JPS5950442U - wafer holder - Google Patents

wafer holder

Info

Publication number
JPS5950442U
JPS5950442U JP14738782U JP14738782U JPS5950442U JP S5950442 U JPS5950442 U JP S5950442U JP 14738782 U JP14738782 U JP 14738782U JP 14738782 U JP14738782 U JP 14738782U JP S5950442 U JPS5950442 U JP S5950442U
Authority
JP
Japan
Prior art keywords
wafer holder
movable support
wafer
movable
support pieces
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP14738782U
Other languages
Japanese (ja)
Inventor
武部 朋子
門脇 好伸
Original Assignee
三菱電機株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 三菱電機株式会社 filed Critical 三菱電機株式会社
Priority to JP14738782U priority Critical patent/JPS5950442U/en
Publication of JPS5950442U publication Critical patent/JPS5950442U/en
Pending legal-status Critical Current

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  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。
(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【図面の簡単な説明】[Brief explanation of drawings]

第1図〜第3図は何れも従来のウェハホルダを示すもの
で、第1図は斜視図、第2図は第1図の■−■線におけ
る断面図、第3図は金属薄膜を真空蒸着すべきウェハを
載着した状態を示す断面図である。第4図〜第9図は何
れもこの考案の一実、雄側を示すもので、第4図は可動
支持片を有するウェハホルダの平面図、第5図は第4図
の■−■線における断面図、第6図は可動支持片をウェ
ハホルダの中心に向って伸長させた状態を示す平面図、
第7図は第6図の■−■線における断面図、第8図は可
動支持片に真空蒸着すべきウェハを載置した状態を示す
平面図、第9図は第8図の■−■線における断面図であ
る。第10図A、 B、 Cは何れもこの考案の他の実
施例を示すもので、第10図Aは可動支持片を支持ピン
によってウェハホルダに回動自在に保持させるようにし
た状態を示す平面図、第10図Bは可動支持片の自由端
部をウェハホルダの中心に向って回動させた状態を示す
平面図、第10図Cはウェハホルダにウェハを載置した
状態を示す平面図である。 図面中、2はウェハ、3は可動支持片、3aは切欠き段
部、3bは支持ピン、4はウェハホルダ、4aは保持溝
である。なお、図中同一符号は同一または相当部分を示
す。 ユ 第3図 ′、。
Figures 1 to 3 all show conventional wafer holders; Figure 1 is a perspective view, Figure 2 is a sectional view taken along the line ■-■ in Figure 1, and Figure 3 is a thin metal film deposited by vacuum evaporation. FIG. Figures 4 to 9 all show the male side of this invention. Figure 4 is a plan view of a wafer holder with a movable support piece, and Figure 5 is taken along the line ■-■ in Figure 4. 6 is a sectional view, and FIG. 6 is a plan view showing a state in which the movable support piece is extended toward the center of the wafer holder.
FIG. 7 is a sectional view taken along the line ■-■ in FIG. 6, FIG. 8 is a plan view showing a state in which a wafer to be vacuum-deposited is placed on a movable support piece, and FIG. 9 is a cross-sectional view taken along the line ■-■ in FIG. FIG. 10A, B, and C all show other embodiments of this invention, and FIG. 10A is a plane view showing a state in which the movable support piece is rotatably held on the wafer holder by a support pin. 10B is a plan view showing a state in which the free end of the movable support piece is rotated toward the center of the wafer holder, and FIG. 10C is a plan view showing a state in which a wafer is placed on the wafer holder. . In the drawings, 2 is a wafer, 3 is a movable support piece, 3a is a notch step, 3b is a support pin, 4 is a wafer holder, and 4a is a holding groove. Note that the same reference numerals in the figures indicate the same or corresponding parts. Figure 3'.

Claims (4)

【実用新案登録請求の範囲】[Scope of utility model registration request] (1)環状のウェハホルダに、金属薄膜を真空蒸着すべ
きウェハを載置する複数の可動支持片をこれの中心部に
向って放射方向に移動自在に保持させたことを特徴とす
るウェハホルダ。
(1) A wafer holder characterized in that the annular wafer holder holds a plurality of movable support pieces on which wafers to be vacuum-deposited with metal thin films are placed, so as to be movable in the radial direction toward the center of the ring-shaped wafer holder.
(2)ウコ゛エバホルダに内周面に形成した保持溝に、
複数の可動支持片を放射方向に移動調整自在に保持させ
たことを特徴とする実用新案登録請求の範囲第1項記載
のウェハホルダ。
(2) In the retaining groove formed on the inner peripheral surface of the Ukoever holder,
A wafer holder according to claim 1, characterized in that a plurality of movable support pieces are held so as to be movable and adjustable in a radial direction.
(3)  ウェハホルダに、保持ピンにより複数の可動
支持片を回動自在に保持させたことを特徴とする実用新
案登録請求の範囲第1項記載のウェハホルダ。
(3) The wafer holder according to claim 1, wherein the wafer holder rotatably holds a plurality of movable support pieces using holding pins.
(4)各可動支持片に、ウェハを載置する切欠き段部を
形成したことを特徴とする実用新案登録請求の範囲第1
項記載のウェハホルダ。
(4) Utility model registration claim 1, characterized in that each movable support piece is formed with a stepped notch on which a wafer is placed.
Wafer holder described in section.
JP14738782U 1982-09-27 1982-09-27 wafer holder Pending JPS5950442U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14738782U JPS5950442U (en) 1982-09-27 1982-09-27 wafer holder

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14738782U JPS5950442U (en) 1982-09-27 1982-09-27 wafer holder

Publications (1)

Publication Number Publication Date
JPS5950442U true JPS5950442U (en) 1984-04-03

Family

ID=30327774

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14738782U Pending JPS5950442U (en) 1982-09-27 1982-09-27 wafer holder

Country Status (1)

Country Link
JP (1) JPS5950442U (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008260607A (en) * 2007-04-11 2008-10-30 Takachiho Takeda Centering unit

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008260607A (en) * 2007-04-11 2008-10-30 Takachiho Takeda Centering unit

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