JPS5948936A - 垂直形半導体基板表面処理装置の基板搬送保持装置 - Google Patents

垂直形半導体基板表面処理装置の基板搬送保持装置

Info

Publication number
JPS5948936A
JPS5948936A JP15895582A JP15895582A JPS5948936A JP S5948936 A JPS5948936 A JP S5948936A JP 15895582 A JP15895582 A JP 15895582A JP 15895582 A JP15895582 A JP 15895582A JP S5948936 A JPS5948936 A JP S5948936A
Authority
JP
Japan
Prior art keywords
substrate
holder
reaction chamber
substrate holder
spring
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP15895582A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6240856B2 (enExample
Inventor
Ryoji Tsunoda
角田　良二
Fumio Muramatsu
村松　文雄
Genichi Kanazawa
金沢　元一
Makoto Ozawa
誠 小沢
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kokusai Denki Electric Inc
Original Assignee
Kokusai Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kokusai Electric Co Ltd filed Critical Kokusai Electric Co Ltd
Priority to JP15895582A priority Critical patent/JPS5948936A/ja
Publication of JPS5948936A publication Critical patent/JPS5948936A/ja
Publication of JPS6240856B2 publication Critical patent/JPS6240856B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
    • H01L21/67751—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber vertical transfer of a single workpiece

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Drying Of Semiconductors (AREA)
  • Manipulator (AREA)
JP15895582A 1982-09-14 1982-09-14 垂直形半導体基板表面処理装置の基板搬送保持装置 Granted JPS5948936A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15895582A JPS5948936A (ja) 1982-09-14 1982-09-14 垂直形半導体基板表面処理装置の基板搬送保持装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15895582A JPS5948936A (ja) 1982-09-14 1982-09-14 垂直形半導体基板表面処理装置の基板搬送保持装置

Publications (2)

Publication Number Publication Date
JPS5948936A true JPS5948936A (ja) 1984-03-21
JPS6240856B2 JPS6240856B2 (enExample) 1987-08-31

Family

ID=15682990

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15895582A Granted JPS5948936A (ja) 1982-09-14 1982-09-14 垂直形半導体基板表面処理装置の基板搬送保持装置

Country Status (1)

Country Link
JP (1) JPS5948936A (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02129345A (ja) * 1988-11-08 1990-05-17 Sanyo Special Steel Co Ltd Ｆｅ−Ａｌ−Ｓｉ系合金及びその製造方法
CN116100391A (zh) * 2023-02-22 2023-05-12 苏州希瑞格机器人科技有限公司 一种智能夹取定位的法兰表面多角度打磨装置

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02129345A (ja) * 1988-11-08 1990-05-17 Sanyo Special Steel Co Ltd Ｆｅ−Ａｌ−Ｓｉ系合金及びその製造方法
CN116100391A (zh) * 2023-02-22 2023-05-12 苏州希瑞格机器人科技有限公司 一种智能夹取定位的法兰表面多角度打磨装置
CN116100391B (zh) * 2023-02-22 2023-10-10 苏州希瑞格机器人科技有限公司 一种智能夹取定位的法兰表面多角度打磨装置

Also Published As

Publication number Publication date
JPS6240856B2 (enExample) 1987-08-31

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