JPS5945913A - ホスフインの精製方法 - Google Patents
ホスフインの精製方法Info
- Publication number
- JPS5945913A JPS5945913A JP15400382A JP15400382A JPS5945913A JP S5945913 A JPS5945913 A JP S5945913A JP 15400382 A JP15400382 A JP 15400382A JP 15400382 A JP15400382 A JP 15400382A JP S5945913 A JPS5945913 A JP S5945913A
- Authority
- JP
- Japan
- Prior art keywords
- phosphine
- activated carbon
- active carbon
- arsenic
- pressure
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- XYFCBTPGUUZFHI-UHFFFAOYSA-N Phosphine Chemical compound P XYFCBTPGUUZFHI-UHFFFAOYSA-N 0.000 title claims abstract description 122
- 229910000073 phosphorus hydride Inorganic materials 0.000 title claims abstract description 61
- 238000000034 method Methods 0.000 title claims description 25
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims abstract description 69
- 239000012535 impurity Substances 0.000 claims abstract description 7
- -1 arsenic hydride compound Chemical class 0.000 claims description 8
- 238000001179 sorption measurement Methods 0.000 claims description 8
- 229910000070 arsenic hydride Inorganic materials 0.000 claims description 5
- 238000009849 vacuum degassing Methods 0.000 claims description 4
- 238000010438 heat treatment Methods 0.000 claims 1
- RBFQJDQYXXHULB-UHFFFAOYSA-N arsane Chemical compound [AsH3] RBFQJDQYXXHULB-UHFFFAOYSA-N 0.000 abstract description 18
- 150000001495 arsenic compounds Chemical class 0.000 abstract description 8
- 229910052799 carbon Inorganic materials 0.000 abstract description 8
- 238000006243 chemical reaction Methods 0.000 abstract description 4
- 150000001875 compounds Chemical class 0.000 abstract description 3
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 abstract description 2
- 239000011261 inert gas Substances 0.000 abstract description 2
- 239000001301 oxygen Substances 0.000 abstract description 2
- 229910052760 oxygen Inorganic materials 0.000 abstract description 2
- 239000007789 gas Substances 0.000 description 18
- 238000000746 purification Methods 0.000 description 12
- 229910052785 arsenic Inorganic materials 0.000 description 10
- RQNWIZPPADIBDY-UHFFFAOYSA-N arsenic atom Chemical compound [As] RQNWIZPPADIBDY-UHFFFAOYSA-N 0.000 description 10
- 230000000694 effects Effects 0.000 description 7
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 6
- 239000007788 liquid Substances 0.000 description 6
- 238000011437 continuous method Methods 0.000 description 5
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 5
- 239000003610 charcoal Substances 0.000 description 4
- 229940093920 gynecological arsenic compound Drugs 0.000 description 4
- 229910052698 phosphorus Inorganic materials 0.000 description 4
- 239000011574 phosphorus Substances 0.000 description 4
- 230000008929 regeneration Effects 0.000 description 4
- 238000011069 regeneration method Methods 0.000 description 4
- OBSZRRSYVTXPNB-UHFFFAOYSA-N tetraphosphorus Chemical compound P12P3P1P32 OBSZRRSYVTXPNB-UHFFFAOYSA-N 0.000 description 4
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 3
- MWUXSHHQAYIFBG-UHFFFAOYSA-N Nitric oxide Chemical compound O=[N] MWUXSHHQAYIFBG-UHFFFAOYSA-N 0.000 description 3
- 230000007423 decrease Effects 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 229910052757 nitrogen Inorganic materials 0.000 description 3
- 239000012286 potassium permanganate Substances 0.000 description 3
- 230000001105 regulatory effect Effects 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- 229910019142 PO4 Inorganic materials 0.000 description 2
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 2
- 239000003463 adsorbent Substances 0.000 description 2
- 239000001307 helium Substances 0.000 description 2
- 229910052734 helium Inorganic materials 0.000 description 2
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 2
- 229910001872 inorganic gas Inorganic materials 0.000 description 2
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 2
- FVZVCSNXTFCBQU-UHFFFAOYSA-N phosphanyl Chemical group [PH2] FVZVCSNXTFCBQU-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 2
- 239000010452 phosphate Substances 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- 239000007858 starting material Substances 0.000 description 2
- IHGSAQHSAGRWNI-UHFFFAOYSA-N 1-(4-bromophenyl)-2,2,2-trifluoroethanone Chemical compound FC(F)(F)C(=O)C1=CC=C(Br)C=C1 IHGSAQHSAGRWNI-UHFFFAOYSA-N 0.000 description 1
- OTMSDBZUPAUEDD-UHFFFAOYSA-N Ethane Chemical compound CC OTMSDBZUPAUEDD-UHFFFAOYSA-N 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
- 239000006011 Zinc phosphide Substances 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 238000001479 atomic absorption spectroscopy Methods 0.000 description 1
- 235000015278 beef Nutrition 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 229910002092 carbon dioxide Inorganic materials 0.000 description 1
- 239000001569 carbon dioxide Substances 0.000 description 1
- 235000011089 carbon dioxide Nutrition 0.000 description 1
- 229910002090 carbon oxide Inorganic materials 0.000 description 1
- 239000003638 chemical reducing agent Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000007872 degassing Methods 0.000 description 1
- 238000004821 distillation Methods 0.000 description 1
- 238000011049 filling Methods 0.000 description 1
- 150000004820 halides Chemical class 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 238000005984 hydrogenation reaction Methods 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 229910052754 neon Inorganic materials 0.000 description 1
- GKAOGPIIYCISHV-UHFFFAOYSA-N neon atom Chemical compound [Ne] GKAOGPIIYCISHV-UHFFFAOYSA-N 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- HOKBIQDJCNTWST-UHFFFAOYSA-N phosphanylidenezinc;zinc Chemical compound [Zn].[Zn]=P.[Zn]=P HOKBIQDJCNTWST-UHFFFAOYSA-N 0.000 description 1
- 238000011084 recovery Methods 0.000 description 1
- 239000003507 refrigerant Substances 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- 229940048462 zinc phosphide Drugs 0.000 description 1
Landscapes
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Treating Waste Gases (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15400382A JPS5945913A (ja) | 1982-09-06 | 1982-09-06 | ホスフインの精製方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15400382A JPS5945913A (ja) | 1982-09-06 | 1982-09-06 | ホスフインの精製方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5945913A true JPS5945913A (ja) | 1984-03-15 |
JPS623762B2 JPS623762B2 (enrdf_load_stackoverflow) | 1987-01-27 |
Family
ID=15574784
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP15400382A Granted JPS5945913A (ja) | 1982-09-06 | 1982-09-06 | ホスフインの精製方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5945913A (enrdf_load_stackoverflow) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2019188680A1 (ja) | 2018-03-27 | 2019-10-03 | 日本化学工業株式会社 | シリルホスフィン化合物、シリルホスフィン化合物の製造方法及びInP量子ドットの製造方法 |
-
1982
- 1982-09-06 JP JP15400382A patent/JPS5945913A/ja active Granted
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2019188680A1 (ja) | 2018-03-27 | 2019-10-03 | 日本化学工業株式会社 | シリルホスフィン化合物、シリルホスフィン化合物の製造方法及びInP量子ドットの製造方法 |
KR20200136376A (ko) | 2018-03-27 | 2020-12-07 | 니폰 가가쿠 고교 가부시키가이샤 | 실릴포스핀 화합물, 실릴포스핀 화합물의 제조 방법 및 InP 양자 도트의 제조 방법 |
US11578266B2 (en) | 2018-03-27 | 2023-02-14 | Nippon Chemical Industrial Co., Ltd. | Silyl phosphine compound, process for producing silyl phosphine compound and process for producing InP quantum dots |
US20230167359A1 (en) * | 2018-03-27 | 2023-06-01 | Nippon Chemical Industrial Co., Ltd. | SILYL PHOSPHINE COMPOUND, PROCESS FOR PRODUCING SILYL PHOSPHINE COMPOUND AND PROCESS FOR PRODUCING InP QUANTUM DOTS |
Also Published As
Publication number | Publication date |
---|---|
JPS623762B2 (enrdf_load_stackoverflow) | 1987-01-27 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP2001089131A (ja) | 三塩化硼素の精製プロセス及び装置 | |
JP2008537720A (ja) | 三フッ化窒素の精製 | |
JPH01261208A (ja) | 三弗化窒素ガスの精製方法 | |
JPS6260128B2 (enrdf_load_stackoverflow) | ||
EP1320414A2 (en) | Adsorbent for purifying perfluorocarbon, process for producing same, high purity octafluoropropane and octafluorocyclobutane, and use thereof | |
JP2003286013A (ja) | ガス状三フッ化窒素の精製法 | |
US4193976A (en) | Removal of dinitrogen difluoride from nitrogen trifluoride | |
JPH062682B2 (ja) | アセチレンの精製法およびそれに用いる装置 | |
US5944876A (en) | Cd-exchanged zeolite rho compositions and compositions of zeolite rho encapsulated with hydrogen made therefrom | |
JPS5945913A (ja) | ホスフインの精製方法 | |
JPH0353017B2 (enrdf_load_stackoverflow) | ||
JP3516716B2 (ja) | トリフルオロメタンの精製法 | |
JPH09142833A (ja) | アンモニア中の水分の除去方法および装置 | |
JP2000511506A (ja) | プロセスストリームから不純物水素を分離し選択的に除去する方法 | |
US6790419B1 (en) | Purification of gaseous inorganic halide | |
EP1409400A1 (en) | Purification of gaseous inorganic halide | |
JPS6274430A (ja) | 希ガスハライドエキシマ−レ−ザ−ガスの精製法 | |
KR20070061891A (ko) | 불소 가스의 제조 방법 | |
JP2000119024A (ja) | 六弗化タングステンの製造方法 | |
EP0714849B1 (en) | Production process for refined hydrogen iodide | |
JPS61197415A (ja) | ジクロロシランの精製法 | |
CN111991978A (zh) | 一种氟化氢气体的除水装置及方法 | |
JP3512285B2 (ja) | 精ヨウ化水素の製造方法 | |
JPH04925B2 (enrdf_load_stackoverflow) | ||
JPH08134675A (ja) | 高純度三フッ化窒素ガスの製造方法 |