JPS5945913A - Purification of phosphine - Google Patents

Purification of phosphine

Info

Publication number
JPS5945913A
JPS5945913A JP15400382A JP15400382A JPS5945913A JP S5945913 A JPS5945913 A JP S5945913A JP 15400382 A JP15400382 A JP 15400382A JP 15400382 A JP15400382 A JP 15400382A JP S5945913 A JPS5945913 A JP S5945913A
Authority
JP
Japan
Prior art keywords
phosphine
activated carbon
active carbon
arsenic
pressure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP15400382A
Other languages
Japanese (ja)
Other versions
JPS623762B2 (en
Inventor
Shukichi Nabekawa
奈部川 修吉
Koichi Takahashi
宏一 高橋
Shuji Oota
太田 秀志
Masayuki Maruyama
丸山 昌幸
Yutaka Demura
出村 豊
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Chemical Industrial Co Ltd
Original Assignee
Nippon Chemical Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Chemical Industrial Co Ltd filed Critical Nippon Chemical Industrial Co Ltd
Priority to JP15400382A priority Critical patent/JPS5945913A/en
Publication of JPS5945913A publication Critical patent/JPS5945913A/en
Publication of JPS623762B2 publication Critical patent/JPS623762B2/ja
Granted legal-status Critical Current

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  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Treating Waste Gases (AREA)

Abstract

PURPOSE:To adsorb and remove hydrogenated arsenic compound, selectively and efficiently from crude phosphine containing the compound as an impruity, by contacting the crude phosphine with active carbon in the absence of oxygen. CONSTITUTION:A reaction vessel filled with active carbon is made oxygen- free state by introducing an inert gas into the vessel or evacuating the vessel. A crude phosphine containing 50-300ppm of hydrogenated arsenic compound (e.g. arsine) as an impurity is introduced into the reaction vessel, and made to contact with the active carbon under the pressure of 0-60kg/cm<2> to adsorb the hydrogenated arsenic compound to the active carbon and remove the compound from the system. The weight ratio of the phosphine to the active carbon is <=1. The used active carbon can be regenerated by evacuating at 100-130 deg.C.

Description

【発明の詳細な説明】 あり、更にifrL <謂えばアルシン( AF3H3
)を代表とする水素化砒素化合物等の不純物を含有する
ホスフィン(以下、1粗製ホスフイン−1と称す)から
水素化砒素化合物を選択的に除去し、実質的に純ホスフ
ィンおよび水素のみを含有する精製ホスフィンを得る方
法を提供しようとするものである。
[Detailed description of the invention] Yes, and ifrL < so-called arsine (AF3H3
) The arsenic hydride compound is selectively removed from the phosphine (hereinafter referred to as 1 crude phosphine-1) containing impurities such as arsenic hydride compounds represented by (1), and the phosphine contains only substantially pure phosphine and hydrogen. It is an object of the present invention to provide a method for obtaining purified phosphine.

一般にホスフィンの製造方法とし7ては、黄りんにアル
カリを作用させる方法、苗りんを高温で加水分解する方
法、金属りん化合物、例えばりん化アルミニウム、りん
化亜鉛などに水または酸を反応させて得る方法、黄りん
の電解還元による方法などが提案されている。
Generally, methods for producing phosphine7 include a method in which alkali is applied to yellow phosphorus, a method in which seedling phosphorus is hydrolyzed at high temperature, and a method in which a metal phosphorus compound such as aluminum phosphide or zinc phosphide is reacted with water or acid. A method for obtaining it, a method using electrolytic reduction of yellow phosphorus, etc., has been proposed.

しかし、これ等の方法はいずれも黄りんを出発原料とし
ているが、該黄りん中にはりん鉱石の産地により異るが
、通常、砒素か40〜6 0 I)pm含有されている
ために製造された粗製ホスフィン中にはアルシンを代表
とする水素化砒素11合物がアルシンとして10〜4 
0 0 ppm程度含有されて(・る。
However, all of these methods use yellow phosphorus as a starting material, but this yellow phosphorus usually contains 40 to 60 I) pm of arsenic, depending on the production area of the phosphate ore. In the produced crude phosphine, there are 11 arsenic hydride compounds represented by arsine with a concentration of 10 to 4 as arsine.
Contains about 0 0 ppm (・ru.

ホスフィンは各種りん化合物誘導体の出発物質、還元剤
、また半導体原料として重要なものであり、その使用に
当って、特に半導体原料として用いる際、ホスフィン中
に砒素が含有されているとl(i.Q体の品質の低下を
きたす原因になりQTましくな(・。
Phosphine is important as a starting material for various phosphorus compound derivatives, as a reducing agent, and as a raw material for semiconductors.When using it, especially as a raw material for semiconductors, if arsenic is contained in the phosphine, l(i. It causes a decline in the quality of the Q body, which is not typical of QT (・.

従って、粗製ホスフィンに含有している水素化(di、
 J化合物を除去することは、業界において重要/〔課
題てあイ、。しがし、りん及び砒素はいずれも周期律表
第■族に属している元素で・あるために、そJlらの誘
j9体であるホスフィシとアルシンは化学的1’l ’
l’↓かJ1′1・;;1゛に良く類似し、又物理的性
質におし・てもアルツノ(沸点−62,4°C1融点−
116.3゛Cl2(じCにおける水に対する溶解度2
3mol/l (1(l me )とホスフィン(沸点
−877°C1融点+ 33″Cl2O°Cにおける水
に対する溶解度2 (l mO/! / 100 me
)は酷似しているために化学的手段及び物理的手段のい
ずれを用いても粗製ホスフィン中のアルシンの除去は極
めて困難である。
Therefore, the hydrogenation (di,
Removing J compounds is an important issue in the industry. Phosphate, phosphorus, and arsenic are all elements that belong to Group III of the periodic table.
It is very similar to l'↓ or J1'1;;
116.3゛Cl2 (Solubility in water in Cl2
3 mol/l (1 (l me ) and phosphine (boiling point -877 ° C1 melting point + 33" Cl2 solubility in water at 0 ° C 2 (l mO/! / 100 me
) are very similar, so it is extremely difficult to remove arsine from crude phosphine using either chemical or physical means.

加えて、粗製ホスフィン中に数100 ppm以下しか
含有されて(・ないアルシンを除去することは、尚更困
ガ1であるために、除去法を記載した技術文献はνH5
声1もツー、現状においてはアルシン以外の不純物を1
吸着除去する精製の際に副次的に除去されて(・るに過
ぎず、使用目的たとえば前記の半導体によっては゛アル
シン以外の極めて少ない高純度のホスツインを容易に人
手出来ない間顆点があった。
In addition, since it is even more difficult to remove arsine, which is contained in crude phosphine at only several hundred ppm or less, technical literature describing removal methods is limited to νH5.
Voice 1 is also 2, at present, impurities other than arsine are 1
It is only removed as a side effect during purification by adsorption and removal, and depending on the purpose of use, for example, the semiconductors mentioned above, it is difficult to handle very few high-purity hosts other than arsine. .

そこで本発明者等は1−頑の現状に汎みアv、、 シン
等の水素化砒素化合物を含有すイ、和製ボスフィンの精
製法について鋭意研究し7た結果、和製ボスフィンを活
性炭と特定の重量割合で接触させるだけという容易かつ
工業的な方法で極めて効率的に水素化砒素化合物を選択
的に吸着除去し得ろことを知見し本発明の完成に至った
ものである。
Therefore, the present inventors have conducted extensive research on the purification method of Japanese-made Bosfin containing hydrogenated arsenic compounds such as 1-1-Harden, and found that Japanese-made Bosfin can be purified by using activated carbon and a specific method. The present invention has been completed based on the discovery that arsenic hydride compounds can be selectively adsorbed and removed very efficiently by a simple and industrial method of just contacting them in weight proportions.

即ち本発明は実質的に無酸素状態において、不純物とし
て水素化砒素化合物を含有する和製ホスフィンを活性炭
と、活性炭単位重量当り等重量以下の割合で接触させ、
該水素化砒素化合物を1吸着させ除去することを特徴と
するホスフィンのしlf製方法である。
That is, the present invention involves contacting Japanese phosphine containing an arsenic hydride compound as an impurity with activated carbon in a proportion equal to or less than the same weight per unit weight of activated carbon in a substantially oxygen-free state,
This is a method for producing phosphine, which is characterized by adsorbing and removing the arsenic hydride compound.

ここで実質的に無酸素状態とし・うのは、空気または酸
素の不存在の状態、例えば窒素、ネオン、アノンゴン等
の不活性ガスで反応容器内を置換した状態又は真空にし
た状態をいう。本発明の実施にアタってはかかる無酸素
状態において粗製ホスフィンを特定の重量割合で活性炭
と接触処理すればよい。しかして不純物の水素化砒素化
合物は選択的に話1/1炭に吸錨され、一方ホスフィン
は活性炭4・詰めた容器の出口から水素化砒素化合物を
ほと7.7と含(+せす((回収される。この接触操作
は回分式あイハ・げ連続式のいずれの方法においても実
施づイノ1−とかてきろ。
Here, "substantially anoxic state" refers to a state in which air or oxygen is absent, for example, a state in which the interior of the reaction vessel is replaced with an inert gas such as nitrogen, neon, anongon, etc., or a state in which the reaction vessel is evacuated. In carrying out the present invention, crude phosphine may be brought into contact with activated carbon in a specific weight proportion under such anoxic conditions. Therefore, impurity arsenic hydride compounds are selectively anchored to 1/1 carbon, while phosphine contains almost 7.7% of arsenic hydride compounds from the outlet of the container packed with activated carbon 4. ((Recovered. This contact operation can be carried out in either the batch method or the continuous method.)

、−こに回分ノ(とは圧力容器例えばオートクレーブ中
に活性炭を充填し、その中に粗製ホスフィンを伺込ツノ
、 ・定時間和製ボスフィンと接触させる方法である。
- Batch method is a method in which a pressure vessel such as an autoclave is filled with activated carbon, and the crude phosphine is brought into contact with a Japanese-made boss fin for a fixed period of time.

ボスフィンはガス状又は液状で仕込んでもよい。The boss fin may be charged in gaseous or liquid form.

ガス状で什込む場合はホスフィンの自圧でその蒸気L1
−まで仕込むことができる。液状で仕込む場合G土適当
な冷媒例えば液体窒素またはドライアイス/アセトン等
を使用し、圧力容器中に凝縮させることに」、って容易
に仕込むことができる。処理温度は室?!r7+ ]で
十分である。処理時間は長ければ長い+”+: fl’
f製効果は大きいが、ガス状又は液状で仕込んて4. 
I (1時間以上、好ましくは20時間必要でル]イ)
3、処理圧力は仕込み量によって規制され処理11力か
低くても一定時間活性炭と接触させれば水素化砒素化合
物を除去できるが、処理能力は低下する。従って処理能
力に応じたホスフィンθ)処Il1条件を選定すれば良
(・0この様にして処理した′41¥製ホスフィンを徐
々に圧力容器から回収するだけで水素化砒素化合物をき
わめて効率良く除去することができる。
If it is supplied in gaseous form, its vapor L1 will be released under the natural pressure of phosphine.
It can be prepared up to -. When charging in liquid form, it can be easily charged by using a suitable refrigerant such as liquid nitrogen or dry ice/acetone and condensing it into a pressure vessel. Is the processing temperature room temperature? ! r7+] is sufficient. The longer the processing time, the longer it is +”+: fl’
4. The effect of f-coating is large, but it can be prepared in gaseous or liquid form.
I (1 hour or more, preferably 20 hours)
3. Processing pressure is regulated by the amount of charge, and even if the processing pressure is low, arsenic hydride compounds can be removed by contacting with activated carbon for a certain period of time, but the processing capacity will decrease. Therefore, it is only necessary to select the phosphine θ) treatment Il1 conditions according to the processing capacity (・0 Arsenic hydride compounds can be removed very efficiently by simply recovering the 41¥ phosphine treated in this way from the pressure vessel. can do.

次に連続法とは活性炭を詰めたカラム中へ和製ホスフィ
ンを常圧又は加圧下で通ず方法である3、操作は室温下
で行なえる事は云うまでイ、ない。ボスフィンガスの処
理速度はとくに規制されるものでなく、それが遅ければ
遅い程処理効果は大きいが、逆に処理速度は低下する事
は云5まてもZfい。
Next, the continuous method is a method in which Japanese phosphine is passed through a column packed with activated carbon under normal pressure or increased pressure.3 Needless to say, the operation can be carried out at room temperature. The processing speed of Bosphin gas is not particularly regulated, and the slower it is, the greater the processing effect is, but it goes without saying that the processing speed will decrease.

処理速度は強いて云えば活性炭単位型1)−1つ5〜3
50重量部/Hrの範囲が適当である。この範囲以外で
も操作は可能であり精製効果も十分あるが、精製ホスフ
ィンガスの回収操作」−からみろと実際的でない。
In terms of processing speed, activated carbon unit type 1)-1 5 to 3
A range of 50 parts by weight/Hr is appropriate. Although it is possible to operate outside this range and the purification effect is sufficient, it is not practical from the point of view of the recovery operation of purified phosphine gas.

この様に回分式、連続式の(・ずれの方法を用(・ても
水素化砒素化合物を除去することかできるが、本発明に
おいて粗製ホスフィン中の水素化砒素化合物を選択的に
活1イ1炭に吸着せしめるためには使用1−る活性炭の
?111☆:重量に対してそれと等重量以下の粗製ホス
フィンを処理する事が必須要件である。これ以上のホス
フィンを処理すると回分法の場合は処理時間が極度に長
くなり、また連続法の場合には破過状態に達するため処
理能力が消失してしまう。活性炭に対するホスフィンの
処理圧力はとくに規制されず、常圧からその温度におけ
るホスフィンの蒸気圧に至るまで任意に選択する事が出
来る。
In this way, it is possible to remove arsenic hydride compounds using both batch and continuous methods, but in the present invention, arsenic hydride compounds in crude phosphine are selectively activated in one step. 111☆ of the activated carbon used in order to adsorb onto the charcoal: It is essential to treat crude phosphine in an amount equal to or less than the weight of the activated carbon.If more than this amount of phosphine is treated in the batch method, The treatment time becomes extremely long, and in the case of a continuous method, the treatment capacity is lost due to reaching a breakthrough state.The treatment pressure of phosphine on activated carbon is not particularly regulated, and the pressure of phosphine at that temperature ranges from normal pressure. You can arbitrarily select up to the vapor pressure.

活性炭は吸着速度及び容量が大きい吸着剤であるが、特
に加圧下で被吸着物としてホスフィンを接触させると吸
着容量が著しく増大する。例えばホスフィンの比吸着量
をホスフィンの吸着容量<N−1)/活性炭の見掛けの
体積(4) で表わすと、ホスフィン圧5 kg7cm
2では82、] Okg/cm2では107、さらに2
0kg//Cm2では]/10にも達する。
Activated carbon is an adsorbent with a high adsorption rate and capacity, but its adsorption capacity increases significantly especially when it is brought into contact with phosphine as an adsorbent under pressure. For example, if the specific adsorption amount of phosphine is expressed as adsorption capacity of phosphine <N-1)/apparent volume of activated carbon (4), the phosphine pressure is 5 kg 7 cm.
2 is 82, ] Okg/cm2 is 107, and 2
At 0 kg//Cm2, it reaches ]/10.

したがってホスフィンを加圧下で活性炭と接触さぜると
活性炭との接触面におけるホスフィンの濃度が高くなり
、又接触時間が長くなるため精製効果が高くなるが、そ
の反面吸着ホスフィン量も増大する為、再生の際υて未
処理のホスフィノ量が増える事になる。しかし再生の際
の末処[11ホスフインは予め別に用意した活11−炭
塔又は容器中に・!lく事によって再利用する事ができ
る。従つ−(、連続法の場合は複数の例えば2本の精製
塔を使用すわば、精製と再生とを交互に行なう事により
連続的にホスフィンの精製かり能である。この様(・て
して本発明の使用圧力範囲は0〜60 kg4□2、り
fましくは0〜30 kg/4*t’が適当である。
Therefore, when phosphine is brought into contact with activated carbon under pressure, the concentration of phosphine at the contact surface with activated carbon increases, and the contact time becomes longer, resulting in a higher purification effect, but on the other hand, the amount of adsorbed phosphine also increases. During regeneration, the amount of untreated phosphino increases. However, the final stage during regeneration [11 phosphine is placed in a separately prepared live 11-charcoal tower or container... It can be reused by deleting it. Therefore, in the case of a continuous method, phosphine can be purified continuously by using a plurality of purification columns, for example, two, and performing purification and regeneration alternately. Therefore, the working pressure range of the present invention is suitably 0 to 60 kg4□2, preferably 0 to 30 kg/4*t'.

本発明で使用する活性炭の形状は粒状、破砕状または粉
末状を問わずいずれも採用でき、そ才1それ精製操作に
適した形状の活性炭を使用ず才1ば良いが、特に粒状又
は破砕状のものがIrましく・。また活性炭は湿った状
態でも乾燥した状態でも十分使用できるが、湿った状態
て使用すると精製ホスフィン中に水分が混入する可能性
があり、乾燥状態で使用すれば精製効果はさら((増大
する。
The activated carbon used in the present invention can be in any form, regardless of whether it is granular, crushed or powdered. That thing is so funny. Activated carbon can be used either wet or dry, but if it is used in a wet state, water may get mixed into the purified phosphine, and if it is used in a dry state, the purification effect will be even greater.

又、活性炭を使用するにあたり、活性炭に硫rヒ水素、
−酸化炭素、二酸化炭素、ハロゲン化物。
In addition, when using activated carbon, sulfur and arsenic,
-Carbon oxides, carbon dioxide, halides.

窒素酸化物等の無機ガス、メタン、エタン等の有機ガス
を1汲着した状態で使用すると精製ホスフィン中に混入
されろ可能性があるため予め加熱、不活性ガス(Cよろ
加圧、および真空脱気等の前処理を行なう必要がある。
If an inorganic gas such as nitrogen oxide or an organic gas such as methane or ethane is used in a state where it is used, it may be mixed into the purified phosphine. It is necessary to perform pretreatment such as deaeration.

本発明における使用済み活性炭は100〜130°Cの
温度下で真空脱気する事により容易に再生され、この両
生活性炭は使用開始前の活性炭の処理能力と同程度まで
十分に復帰するため繰り返し使用することかで゛きる3
3 この様にして得られた精製ホスフィンおよび精製前の和
製ホスフィン中の砒素含量は検体ガスの一定量を過マン
ガン酸カリウム水溶液に・完全に吸収させた後、その吸
収液を砒素について原子吸光法にJこり分析することに
より精度よく測定することができく)。
The used activated carbon in the present invention can be easily regenerated by vacuum degassing at a temperature of 100 to 130°C, and this amphibiotic carbon can be used repeatedly because it fully returns to the same level of processing capacity as the activated carbon before use. I can do it 3
3 The arsenic content in the purified phosphine thus obtained and the Japanese phosphine before purification was determined by completely absorbing a certain amount of the sample gas into an aqueous potassium permanganate solution, and then using the absorbed liquid for arsenic using atomic absorption spectrometry. It is possible to measure with high accuracy by performing a J stiffness analysis).

J:ノ、下、本発明の効果を列挙する。J: ノ Below, the effects of the present invention are listed.

])本発明の活性炭による吸着法は蒸留、およびfヒ学
桑品1でよる精製法に比較して繁雑な操作、複列な装置
を必要としないため操作、装置共に簡単である。
]) The adsorption method using activated carbon of the present invention is simpler in terms of operation and equipment than the distillation and purification methods using Fhigakusokuwahin 1 because it does not require complicated operations or multiple rows of equipment.

2)活性炭は吸着寸度、容量共に太き(・吸翁削である
。これら活性炭は比較的安価で人手し易く、また再生し
て繰り返し使用することがてきろのみならず、連続法を
用(・れば複数、例えば2本のカラムを使用する事によ
り連続的に操作可能なため経済的で実用性が高し・0 3)本発明の方法゛によって精製ホスフィンから砒素化
合物を選択的に吸着てきるのみならず、もしかりに他の
無機ガスおよび・61機ガス等の不純物が混入した場合
でもこ−れらを同時に除去することができる。
2) Activated carbon has a large adsorption size and capacity (it is suction-cut. These activated carbons are relatively inexpensive and easy to handle, and can be recycled and used repeatedly. 3) The method of the present invention selectively removes arsenic compounds from purified phosphine. Not only can it be adsorbed, but even if impurities such as other inorganic gases and organic gases are mixed in, they can be removed at the same time.

4)本発明の方法によって砒素化合物(A・+1I3)
を50ないし300 ppm含有して(・る第11製ホ
スフインから砒素化合物を選択的に吸着することにより
Oないし数pplnの実171↓的にQ、+、視てきる
程度まで除去することができる。
4) Arsenic compound (A・+1I3) by the method of the present invention
By selectively adsorbing arsenic compounds from No. 11 phosphine containing 50 to 300 ppm of phosphine, O to several ppl can be removed to the extent that Q,+ can be seen. .

次に実施例を掲げて本発明を説明するがこれに限定され
るものではない。
Next, the present invention will be explained with reference to Examples, but the present invention is not limited thereto.

実施例1 内’?i’ 4)’i I eのステ/レス製オートク
レーブ中に#j、tJ’、 71’i ’li炭’、’
+ 50ノ(商品者ツルミコール4 CM >を充填し
、ヘリウムガスによる加圧と真空脱気とを十分繰り返し
た後系内を真空にし、このオーl、クレープを1イク体
窒素で冷却することによって粗製ボスフィン3 (+ 
(1]を仕込んだ。これを室温に戻1、た結果圧力に’
r 35 k!?/cm’まで一ヒ昇し、この圧力の下
て75時間放置した。処理したホスフィンガスを取り出
し、その内の10(lllをサンプリングし、1規定の
過マンガン酸カリウム水溶液50m1に吸収さぜた結果
、莞全に吸収した。この吸収液を原r吸九法により分析
した結果、砒素化合物の含量はアルノン(ASI+3)
としてホスフィン(I)H8)ニ対シて0.6 :3 
ppmであった。一方精製前のホスフィンガスを同様に
して過マンガン酸カリウム水浴液に吸収させた結果、完
全に吸収されたが、砒素[ヒ合物の含mは9 :3 p
pmであった。
Example 1 Inside'? i'4)'i Ie #j, tJ', 71'i 'li charcoal','
After filling the system with +50 liters (product name: Tsurumicol 4 CM), repeating pressurization with helium gas and vacuum degassing sufficiently, the system was evacuated, and the crepe was cooled with nitrogen. Crude boss fin 3 (+
(1) was prepared.It was returned to room temperature, and the pressure was increased.
r35k! ? /cm' and left under this pressure for 75 hours. The treated phosphine gas was taken out, 10 ml of it was sampled and absorbed into 50 ml of 1N potassium permanganate aqueous solution, and as a result, it was completely absorbed.This absorbed liquid was analyzed by the original r-absorption method. As a result, the content of arsenic compounds was arunone (ASI+3)
Phosphine (I) H8) as 0.6:3
It was ppm. On the other hand, when phosphine gas before purification was similarly absorbed into a potassium permanganate water bath, it was completely absorbed, but the m content of arsenic was 9:3 p.
It was pm.

実施例2 実施例1と同様に内容11のステンレス製オートクレー
ブ中に活性炭3509を充填し、室温上砒素含量103
ppmの和製ホスフィンガスを25に9/cm2の圧力
に達するまて圧入した結果、和製ホスフィンを70り仕
込むことができた。、こ)1を48時間放置した後精製
ホスフィノガスを取り出l−分析した結果、砒素含量は
A s I−13として20円・tllであった。
Example 2 Activated carbon 3509 was filled in a stainless steel autoclave with content 11 in the same manner as in Example 1, and the arsenic content was 103 at room temperature.
As a result of pressurizing 25 ppm of Japanese phosphine gas until the pressure reached 9/cm2, it was possible to charge 70 ppm of Japanese phosphine. After leaving 1) for 48 hours, the purified phosphino gas was taken out and analyzed, and the arsenic content was 20 yen·tll as As I-13.

実施例3 ガス人口部に二次用調節、器、ガス出1]部に流1jt
調節器をそなえた内径5 cm、長さ2mのステンレス
製耐圧カラムに成形した活性炭(ツルミコール)174
49を充填し、ヘリウムガスによる加圧と真空脱気とを
十分繰り返した後系内を真空にし+ 5009の粗製ホ
スフィンを導、ノ(シ六二。このとき、ガス人口部(C
設置した二次用調節器により系内のホスフィンガスの圧
力を20 kg、7cm2に、また出口部の流量調節器
によりホスフィンガスの流;iiを150910r に
調節した。このようにしてl占1牛炭充填カラムから流
出してきた精製ポスフィンガスを一定時間毎に採取し、
実施例1と同様にし、て精製ホスフィンガス中の砒素含
量を分析した。この結果Asl+、、として0.3−0
.7 ppmであった。
Example 3 Secondary adjustment, container, gas outlet 1] flow 1jt in the gas intake section
Activated carbon (Tsurumicol) 174 molded into a stainless steel pressure-resistant column with an inner diameter of 5 cm and a length of 2 m equipped with a regulator.
After sufficiently repeating pressurization with helium gas and vacuum degassing, the system was evacuated and the crude phosphine of 5009 was introduced. At this time, the gas population (C
The pressure of the phosphine gas in the system was adjusted to 20 kg, 7 cm2 by the installed secondary regulator, and the flow rate of the phosphine gas (ii) was adjusted to 150910 r by the flow rate regulator at the outlet. In this way, the purified posphine gas flowing out from the column packed with beef charcoal was collected at regular intervals,
In the same manner as in Example 1, the arsenic content in purified phosphine gas was analyzed. As a result, Asl+, 0.3-0
.. It was 7 ppm.

この様にして処理した使用済活性炭を100〜+ 30
 ”Cに加熱[7て吸着したホスフィンおよび水素化砒
素化合物を排気したのら、その温度下で更に′う時間東
学脱気1〜て実施例4((供した。
The used activated carbon treated in this way is 100~+30
The mixture was heated to 7° C. to evacuate the adsorbed phosphine and arsenic hydride compounds, and then subjected to Togaku degassing for an additional hour at that temperature.

実施例4〜6 実施例:うで11生した活性炭カラムを月見・て、処理
:計および流速を変えてホスフィンの精製−再生を繰り
返しそれらの結果を第1表に示した。
Examples 4 to 6 Example: The activated carbon column that had been formed was monitored every month, and the purification and regeneration of phosphine was repeated by changing the treatment meter and flow rate, and the results are shown in Table 1.

第  1  表 代理人  豊  1) 善  雄 千  わC袖  正  、1: 11I′1和57年IO月 611 特許庁長官 若 杉 和 夫 殿 1、事件の表示 特願昭57−154003号 2、発明の名称 ホスフィンの精製方法 3、補正をする渚 事件との関係・特訂出阿1人 東京都江東区亀戸9丁目15filiじI」本化学工業
株式会社 代表者   棚  橋  φ↑ 4、代理人 東京都千代田区有楽町1丁114番1づゴ信ビル204
号室 電話501−21385 補正の対象 明細書の「発明の詳細な説明」の欄 6、補正の内容 発明のt′1細な説明を下記の通り訂正する。
No. 1 Representative Yutaka 1) Yuchi Yoshiwa C Sode Tadashi, 1: 11I'1 IO month, 1957 611 Commissioner of the Japan Patent Office Kazuo Wakasugi 1, Indication of Case Patent Application No. 154003 1982, Invention Name of Phosphine Purification Method 3, Relation to the Nagisa Incident to be amended, Special Edition 9-15 Kameido, Koto-ku, Tokyo, Japan Representative Hon Kagaku Kogyo Co., Ltd. Tanahashi φ↑ 4, Agent Tokyo 204, 1 Zugoshin Building, 1-114 Yurakucho, Chiyoda-ku, Miyako
Room No. 501-21385 Column 6 of "Detailed Description of the Invention" of the specification to be amended, contents of the amendment t'1 detailed description of the invention is corrected as follows.

1)明細書力3頁7行目 rmo文Jを「m文」に訂正する。1) Specification power, page 3, line 7 Correct rmo sentence J to "m sentence".

2)//  第3頁10行目 rmo文」を「m文」に訂正する。2) // Page 3, line 10 Correct "rmo sentence" to "m sentence".

Claims (1)

【特許請求の範囲】 ■)実質的に無酸素状態において、不純物として水素化
砒素化合物を含有する粗製ホスフィンを活性炭と、活性
炭単位重量当り等重量以下の割合で接触させ、該水素化
砒素化合物を吸着させ除去することを特徴とするホスフ
ィンの精製方法。 2)活性炭として、使用済み活性炭を加熱下真空脱気し
て再生し、繰返し使用する特許請求の範囲第1項記載の
ホスフィンの精製方法。
[Scope of Claims] ■) In a substantially oxygen-free state, crude phosphine containing an arsenic hydride compound as an impurity is brought into contact with activated carbon in an equal weight or less ratio per unit weight of activated carbon, and the arsenic hydride compound is A method for purifying phosphine, characterized by adsorption and removal. 2) The method for purifying phosphine according to claim 1, wherein used activated carbon is regenerated by vacuum degassing under heating and used repeatedly as the activated carbon.
JP15400382A 1982-09-06 1982-09-06 Purification of phosphine Granted JPS5945913A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15400382A JPS5945913A (en) 1982-09-06 1982-09-06 Purification of phosphine

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15400382A JPS5945913A (en) 1982-09-06 1982-09-06 Purification of phosphine

Publications (2)

Publication Number Publication Date
JPS5945913A true JPS5945913A (en) 1984-03-15
JPS623762B2 JPS623762B2 (en) 1987-01-27

Family

ID=15574784

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15400382A Granted JPS5945913A (en) 1982-09-06 1982-09-06 Purification of phosphine

Country Status (1)

Country Link
JP (1) JPS5945913A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2019188680A1 (en) 2018-03-27 2019-10-03 日本化学工業株式会社 SILYL PHOSPHINE COMPOUND, METHOD FOR PRODUCING SILYL PHOSPHINE COMPOUND AND METHOD FOR FORMING InP QUANTUM DOT

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2019188680A1 (en) 2018-03-27 2019-10-03 日本化学工業株式会社 SILYL PHOSPHINE COMPOUND, METHOD FOR PRODUCING SILYL PHOSPHINE COMPOUND AND METHOD FOR FORMING InP QUANTUM DOT
KR20200136376A (en) 2018-03-27 2020-12-07 니폰 가가쿠 고교 가부시키가이샤 Silylphosphine compound, silylphosphine compound manufacturing method, and InP quantum dot manufacturing method
US11578266B2 (en) 2018-03-27 2023-02-14 Nippon Chemical Industrial Co., Ltd. Silyl phosphine compound, process for producing silyl phosphine compound and process for producing InP quantum dots
US20230167359A1 (en) * 2018-03-27 2023-06-01 Nippon Chemical Industrial Co., Ltd. SILYL PHOSPHINE COMPOUND, PROCESS FOR PRODUCING SILYL PHOSPHINE COMPOUND AND PROCESS FOR PRODUCING InP QUANTUM DOTS

Also Published As

Publication number Publication date
JPS623762B2 (en) 1987-01-27

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