JPS5928359A - Manufacture of integrated circuit device - Google Patents

Manufacture of integrated circuit device

Info

Publication number
JPS5928359A
JPS5928359A JP57139013A JP13901382A JPS5928359A JP S5928359 A JPS5928359 A JP S5928359A JP 57139013 A JP57139013 A JP 57139013A JP 13901382 A JP13901382 A JP 13901382A JP S5928359 A JPS5928359 A JP S5928359A
Authority
JP
Japan
Prior art keywords
chips
chip
integrated circuit
circuit device
wiring
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP57139013A
Other languages
Japanese (ja)
Inventor
Kiyoshi Takemori
竹森 清
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP57139013A priority Critical patent/JPS5928359A/en
Publication of JPS5928359A publication Critical patent/JPS5928359A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
    • H01L27/04Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body
    • H01L27/10Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a repetitive configuration
    • H01L27/118Masterslice integrated circuits
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/18High density interconnect [HDI] connectors; Manufacturing methods related thereto
    • H01L2224/23Structure, shape, material or disposition of the high density interconnect connectors after the connecting process
    • H01L2224/24Structure, shape, material or disposition of the high density interconnect connectors after the connecting process of an individual high density interconnect connector
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/10Details of semiconductor or other solid state devices to be connected
    • H01L2924/11Device type
    • H01L2924/14Integrated circuits

Landscapes

  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Design And Manufacture Of Integrated Circuits (AREA)
  • Semiconductor Integrated Circuits (AREA)

Abstract

PURPOSE:To obtain a master slice LSI by a method wherein a function is divided into separate chips and made adjacent on a substrate, and the chips are wired to be formed into a chip. CONSTITUTION:The chips 2-4 and 2-5 are arranged in adjacency on the base wafer of the same master slice, and connection is performed by so providing a wiring mask that adjacent wiring pads 3-4 and 3-5 can be connected, and the chips directly. It is cut by scribe lines 6-1-6-4 and treated as an integral chip without cutting between the chips 2-4 and 2-5, and accordingly an IC of one function can be constituted by containing the chip into a case. This constitution enables to obtain an LSI made one-functional in a chip.

Description

【発明の詳細な説明】 発明の属する技術分野の説明 本発明はマスタースライス方式の集積回路装置の製造方
法に関するものである。
DETAILED DESCRIPTION OF THE INVENTION Field of the Invention The present invention relates to a method for manufacturing a master slice type integrated circuit device.

従来技術の説明 従来マスタースライス方式の大規模集積回路装置は1ウ
エーハー上に同一回路の複数のセルを持った共通の下地
に品種各に異なる配線全行なって各々の種類の集積回路
装置を作っており1ウエーハー内には同一の配線処Rを
行ない同一のチップが作られていた。すなわち第1図に
示すように、ケース1−1内に同一のチップ3−1を設
け、配@4−1でパッド3−1と接続している。
Description of the Prior Art Conventionally, large-scale integrated circuit devices using the master slice method are made by performing different wiring for each product type on a common substrate with multiple cells of the same circuit on one wafer to create each type of integrated circuit device. In one wafer, the same wiring process R was performed and the same chips were manufactured. That is, as shown in FIG. 1, the same chip 3-1 is provided in the case 1-1 and connected to the pad 3-1 through the wiring @4-1.

しかし最近大規模集積回路化するにつれシステムの主要
機能はほとんど集積回路化されつつあシ、その中でも少
数多品種のものはマスタースライス方式で集積回路装置
を作る傾向にある。マスタースライス方式の利点は開発
期間が短かく安い開発費で大規模集積回路装置を作れる
ことにあります。
However, with the recent trend toward large-scale integrated circuits, most of the main functions of systems have been integrated into integrated circuits, and among these, there is a tendency to manufacture integrated circuit devices using the master slice method for a small number of high-mix products. The advantage of the master slice method is that it can produce large-scale integrated circuit devices with a short development period and low development costs.

しかし回路規模が大きくなると1チツプの中に収ま力き
れず、回路を分割するか専用に開発する方法がとられて
いた。回路を分割すれば複数で1機能分のものとなシ専
用に開発すれば開発期間が長くなり、いずれに於ても開
発費のみならず製品単価も割高とならざるをえなかった
However, as the scale of the circuit increased, it could not be accommodated on a single chip, so the approach was to divide the circuit or develop a dedicated circuit. If the circuit is divided into multiple circuits, one function will be divided into multiple circuits.If the circuit is developed exclusively for one function, the development period will be longer, and in both cases, not only the development cost but also the unit price of the product must be relatively high.

発明の目的・構成の説明 本発明の目的は従来技術の欠点を除去することで、その
特徴は上記回路規模が大きく1チツプに入らないものを
別チップに分割して構成した機能を、同一マスタースラ
イスの下地のウェーハー上にとなシ合わて配置し、各々
のチップ内の配線と各チップ間の配線を行なうことによ
シ、実質的に1チツプ化とした大規模集積回路装置にあ
る。
Description of Purpose and Structure of the Invention The purpose of the present invention is to eliminate the drawbacks of the prior art, and its feature is that the above-mentioned circuits that are too large to fit on one chip can be divided into separate chips, and the functions can be integrated into the same master. By arranging the circuits side by side on a wafer underlying the slice and performing wiring within each chip and wiring between each chip, the large-scale integrated circuit device is substantially integrated into one chip.

発明の効果 本発明のマスタースライス方式の大規模集積回路の効果
は、早く安く開発できることにある。従ってンステムの
規模が大きく集積回路化する回路構成が大きくて1チツ
プ内に入らないものを実質1チツプ化して1個のケース
に収めて製品化するため従来同一ウェーハー上には同一
回路の配線処理よシなされなかったものをとなり合うチ
ップ同しで異なる配線処理を行ない、各々のチップ同じ
の接続も同一配線処理で行なうことによシ、実質的に1
機能1チップ化の大規模集積回路装置を構成することが
できる。
Effects of the Invention The advantage of the master slice type large-scale integrated circuit of the present invention is that it can be developed quickly and inexpensively. Therefore, if the scale of the system is large and the circuit structure to be integrated into an integrated circuit is too large to fit on one chip, it is essentially integrated into one chip and housed in one case for commercialization. By using the same wiring process to connect the same chips to each other, and using the same wiring process to connect the same chips to each other, it is possible to effectively
A large-scale integrated circuit device with a single functional chip can be constructed.

この発明の詳細な説明 次に本発明の実施例を図面を参照して説明する。Detailed description of this invention Next, embodiments of the present invention will be described with reference to the drawings.

第1図は従来方法で製造された大規模集積回路装置を示
しチップと配線の関係がわかるように蓋を外した状態を
表わしている。
FIG. 1 shows a large-scale integrated circuit device manufactured by a conventional method, with the lid removed so that the relationship between chips and wiring can be seen.

第2図は本発明によシ組立てられたものの例を示し、第
3図は本発明によるウェーハー上のとなシ合う同一機能
を2分割して配置配線をした2チツプ分の拡大図を示す
。第1図の方法では集積度を大きくして1機能1チップ
化するか分割して複数構成にするしかないが、第2図の
ように1個のケースに2チツプ収容し1機能分を2チツ
プに分割して配置すれば、実質1チツプ化と同等の機能
が得られる。第2図に示す2−2と2−3のチップを電
気的に接続する配線5を作る方法として第3図に示すよ
うに、同一マスタースライスの下地のウェーハー上のと
なシ同しに2−2と2−3に対シて2−4と2−5のチ
ップを配置し、チップの外との配線用パラ)3−1〜3
−5のうち、2−4と2−5のとなシ合った側の3−4
と3−5のバット同しで配線する5−2の接続方法や、
それぞれのセルから直接接続する5−3の接続方法によ
り、2−4と2−5同じを接続できるように配線用マス
クを作ることによシ、両チップ同じを直接電気的に接続
できる。
FIG. 2 shows an example of a chip assembled according to the present invention, and FIG. 3 is an enlarged view of two chips in which identical functions on a wafer are divided into two and placed and routed according to the present invention. . In the method shown in Figure 1, the only option is to increase the degree of integration and make one chip for each function, or to divide it into multiple configurations, but as shown in Figure 2, two chips for one function can be accommodated in one case. By dividing it into chips and arranging it, you can essentially obtain the same functionality as a single chip. As shown in FIG. 3, a method for making the wiring 5 that electrically connects the chips 2-2 and 2-3 shown in FIG. Place the chips 2-4 and 2-5 against the chips 2 and 2-3, and connect the chips to the outside of the chip using the parallax 3-1 to 3.
-5, 3-4 on the side of 2-4 and 2-5
5-2 connection method of wiring with the same bat as 3-5,
By the connection method 5-3, which connects directly from each cell, by making a wiring mask so that the same chips 2-4 and 2-5 can be connected, both chips can be directly electrically connected.

配線されたチップを1個ずつに切離すときは第3図に示
すスクライプlfM6−1〜6−4で切シ、チップ2−
4と2−5間の6−5は切らないで2゛−4と2−5は
1体のチップとして扱うことによシ、実質的に第2図に
示すように1個のケース内に1機能の集積回路を構成す
ることができる。
When cutting the wired chips one by one, use the scribers lfM6-1 to 6-4 shown in Figure 3 to cut the chips 2-
By not cutting 6-5 between 4 and 2-5 and treating 2-4 and 2-5 as one chip, they are essentially placed in one case as shown in Figure 2. A single-function integrated circuit can be constructed.

本発明は以上説明したように同一ウェーハーに1機能を
分割して別々のチップにそれぞれの配線を施したとなシ
合うチップf、1体として処理することによシlチップ
に入らない大規模回路の実質1チツプ化構成のマスター
スライズ方式大規模集積回路装置とする効果がある。
As explained above, the present invention is capable of processing large-scale chips that do not fit into a single chip by dividing one function on the same wafer and wiring each chip on separate chips. This has the effect of creating a master slide type large-scale integrated circuit device in which the circuit is substantially integrated into one chip.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は1ケース1チツプ収容の従来方式の集積回路装
置を示す図、第2図は1機能2チップに分割されたもの
を1ケース内に収容した例の集積回路装置を示す図、第
3図は本発明による同一ウェーハー内のとなりあうチッ
プに1機能を分割して配置した場合の2チツプの拡大図
を示す。 尚、図において、l−1,1−2・・・・・集積回路装
置のケース、2−1〜2−5・・・・・・集積回路のチ
ップ、3−1〜3−5・・・・・・チップの外との接続
のためのバット、4−1〜4−3・・・・・・チップと
ケース端子間を電気的に接続する配線、5−1〜5−3
となり合うチップ回し全電気的に接続するための配線パ
ターン、6−1〜6−4・・・・・・ウェーハーをチッ
プ各に切離すための切断線、6−5・・・・・・1対と
なる両チップ間の仕切線を示す。
Fig. 1 shows a conventional integrated circuit device in which one chip is housed in one case, and Fig. 2 shows an example integrated circuit device in which two chips per function are housed in one case. FIG. 3 shows an enlarged view of two chips in which one function is divided and placed on adjacent chips in the same wafer according to the present invention. In the figure, l-1, 1-2...case of integrated circuit device, 2-1 to 2-5... chip of integrated circuit, 3-1 to 3-5... ... Bats for connecting the chip to the outside, 4-1 to 4-3 ... Wiring for electrically connecting the chip and case terminals, 5-1 to 5-3
Turning adjacent chips Wiring pattern for electrical connection, 6-1 to 6-4... Cutting line for separating the wafer into chips, 6-5...1 The partition line between the two chips forming a pair is shown.

Claims (2)

【特許請求の範囲】[Claims] (1)予め用意された下地に配線処理工程を施して作る
マスタースライス方式の大規模集積回路装置において、
同一ウェーハー上に異なる配線のチップを構成すること
を特徴とする集積回路装置の製造方法。
(1) In a large-scale integrated circuit device using the master slice method, which is manufactured by performing a wiring processing process on a pre-prepared base,
A method for manufacturing an integrated circuit device, characterized by configuring chips with different wiring on the same wafer.
(2)  前記チップの配列は、同一機能を分割して別
チップとして配線されたチップ同しをとなり合わせて配
置し、チップ同じ間の接続をウェーハー上の配線処置で
接続することを特徴とする特許請求の範囲第(1)項記
載の集積回路装置の製造方法。
(2) The arrangement of the chips is characterized in that chips having the same function divided and wired as separate chips are arranged next to each other, and connections between the chips are connected by wiring on the wafer. A method for manufacturing an integrated circuit device according to claim (1).
JP57139013A 1982-08-10 1982-08-10 Manufacture of integrated circuit device Pending JPS5928359A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57139013A JPS5928359A (en) 1982-08-10 1982-08-10 Manufacture of integrated circuit device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57139013A JPS5928359A (en) 1982-08-10 1982-08-10 Manufacture of integrated circuit device

Publications (1)

Publication Number Publication Date
JPS5928359A true JPS5928359A (en) 1984-02-15

Family

ID=15235435

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57139013A Pending JPS5928359A (en) 1982-08-10 1982-08-10 Manufacture of integrated circuit device

Country Status (1)

Country Link
JP (1) JPS5928359A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6151939A (en) * 1984-08-22 1986-03-14 Nec Corp Semiconductor wafer
JPS6163842U (en) * 1984-09-29 1986-04-30
JPS63258042A (en) * 1987-04-15 1988-10-25 Nec Kyushu Ltd Semiconductor device
US4930000A (en) * 1985-05-31 1990-05-29 Siemens Aktiengesellschaft Terminal assembly for an integrated semiconductor circuit

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6151939A (en) * 1984-08-22 1986-03-14 Nec Corp Semiconductor wafer
JPS6163842U (en) * 1984-09-29 1986-04-30
US4930000A (en) * 1985-05-31 1990-05-29 Siemens Aktiengesellschaft Terminal assembly for an integrated semiconductor circuit
JPS63258042A (en) * 1987-04-15 1988-10-25 Nec Kyushu Ltd Semiconductor device

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