JPS59197151A - Semiconductor integrated circuit device - Google Patents

Semiconductor integrated circuit device

Info

Publication number
JPS59197151A
JPS59197151A JP6997283A JP6997283A JPS59197151A JP S59197151 A JPS59197151 A JP S59197151A JP 6997283 A JP6997283 A JP 6997283A JP 6997283 A JP6997283 A JP 6997283A JP S59197151 A JPS59197151 A JP S59197151A
Authority
JP
Japan
Prior art keywords
chips
basic
fundamental
integrated circuit
chip
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP6997283A
Other languages
Japanese (ja)
Inventor
Hiroyuki Akiba
秋葉 裕之
Yukihiro Ushiku
幸広 牛久
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Priority to JP6997283A priority Critical patent/JPS59197151A/en
Publication of JPS59197151A publication Critical patent/JPS59197151A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier
    • H01L27/04Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body
    • H01L27/10Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body including a plurality of individual components in a repetitive configuration
    • H01L27/118Masterslice integrated circuits

Abstract

PURPOSE:To control an IC device easily by previously preparing a wafer, to which a master process is completed beforehand, and using one or plural fundamental chips in response to the scale of an IC to be prepared when single or plural kinds of fundamental unit elements are formed on the wafer. CONSTITUTION:Fundamental chips 5 to which active elements 2 and circuit elements 3 for inputs/outputs are formed are shaped previously through a chip isolation region 4. On the other hand, regions in which one chips 5 are mounted are formed surrounded by scribing lines 6 and a plurality of pads 1 are shaped previously to the peripheral sections of the regions in a master wafer loading these chips 5. Accordingly, the number of the fundamental chips is selected in response to the scale of an IC circuit to be prepared, and the chips are fixed onto loading regions, and mutually connected desirably by using the pads 1. That is, wirings in the fundamental chips and wirings in the isolation region are formed separately, and the burden of a computer system for the wirings is lightened.

Description

【発明の詳細な説明】 〔発明の属する技術分野〕 本発明は、マスタースライス方式を用いた集積回路装置
の構成方法に関するものである。
DETAILED DESCRIPTION OF THE INVENTION [Field of the Invention] The present invention relates to a method for configuring an integrated circuit device using a master slice method.

〔従来技術とその問題点〕[Prior art and its problems]

最近の泉tJz回路の開発では、設計から製品化丑での
時間の短、縮が必要条件の1つになっており、その1手
法として、マスク−スライス方式があるQこの方法は、
あらかじめ、シリコンウエノ・上に、能受動素子を作成
しておくマスタ一工程と、集積回路装置を実現するため
にそれらの能動及び受動素子に金属配線をほどこす配線
工程とに、分離するものであり、マスタ工程で製作した
汎用のマスタウェハを配線工程で、個々の目的に応じた
集積回路を作る方式である。
In the recent development of Izumi tJz circuits, one of the requirements is to shorten the time from design to commercialization, and one method is the mask-slice method.QThis method is
The process is divided into a master process in which active and passive elements are created in advance on silicon substrate, and a wiring process in which metal wiring is applied to those active and passive elements to realize an integrated circuit device. This method uses a general-purpose master wafer manufactured in the master process to create integrated circuits for individual purposes in the wiring process.

このマスタースライス方式を用した集積回路装置に、ゲ
ートアレイがあり、これはチップ上に、基本単位素子が
、アレイ状に並んだ構成で、それらを計算機システム及
び入手により、配線設計を行うことで結合し、回路全実
現している。
An integrated circuit device that uses this master slice method is a gate array, which is a structure in which basic unit elements are arranged in an array on a chip, and these can be designed by wiring using a computer system and acquisition. Combined, the entire circuit is realized.

今まで、ゲートアレイを設計、製作する際には第1図に
示した様に、基本単位素子がアレイ状にならんだ基本素
子列3、入出力回路用素子2、が形成されているマスタ
一工程まで終了したチップの上に、金属配線を行い回路
を構成している◇このようなマスターチップの構成でに
、設計される集積回路装置の規模に応じて各種のマスタ
ーウェハを用意しなければ、ならないし、かつ大規模な
集積回路を実現する場合に、基本単位素子αの多いマス
ターチップを用いると計算機システム負担が大きくなっ
てし貰う。
Until now, when designing and manufacturing a gate array, as shown in Fig. 1, a master unit is used, in which a basic element row 3 in which basic unit elements are arranged in an array, and an input/output circuit element 2 are formed. Metal wiring is placed on the chip that has completed the process to configure the circuit. ◇With this type of master chip configuration, it is necessary to prepare various master wafers depending on the scale of the integrated circuit device being designed. , and when realizing a large-scale integrated circuit, using a master chip with many basic unit elements α will increase the burden on the computer system.

〔発明の目的〕[Purpose of the invention]

本発明は、以上のような不都合を解決するために、従来
技術を改良したもので、あらかじめ準備しておくマスタ
一工程を終了したウェハば、1種の〃で、作ろうとする
集積回路の規模に応じて、1つあるいは複数の基本チッ
プ全周いることで集積回路を実現する。
The present invention is an improvement on the conventional technology in order to solve the above-mentioned disadvantages, and the scale of the integrated circuit to be manufactured can be adjusted by using one type of wafer that has completed the master process prepared in advance. Depending on the situation, an integrated circuit is realized by having one or more basic chips all around.

また、複数の基本チップを用いる大規模な集積回路を構
成する際には、階層的な配線方法を用いて計算機システ
ムの負担を軽減できることを目的と17でいる。
Another objective is to reduce the burden on a computer system by using a hierarchical wiring method when constructing a large-scale integrated circuit using a plurality of basic chips.

〔発明の概−汐〕[Summary of the invention - Ushio]

本発明は、第2図に示したようVC: 1、基本単位素子列、3や人出回路用素子、2等の能動
素子と、そのチップ内での配線エリアのみを含んだ基本
チップ、5と 2バツド自己i筺エリア及びスクライブラインあるいは
基本チップ間の配線エリアになりつる基本チップ分離領
域、4 との2つよりなるマスターウェハの構成方法である。
The present invention, as shown in FIG. 2, consists of a VC: 1, a basic unit element array, 3, an element for a circuit circuit, 2, and other active elements, and a basic chip that includes only a wiring area within the chip; This is a method of configuring a master wafer consisting of two basic chip isolation regions, which serve as a 2-butt self-chamber area and a scribe line or a wiring area between basic chips.

したがって、1つの基本チップ内の素子数で充分な小規
模な集積回路を実現する時にに、配線工程の設計時に、
チップ分離領域に、パッドとスクライプラインを配置す
る。また、複数の基本チップにわたる大規模集瑣回路を
構成する場合には、チップ分離領域の一部を配線エリア
として使用しそれぞれの基本チップ上に実現された回路
の結合に利用でき、一番外側の分離領域のみパッドとス
クライプラインが配置される。
Therefore, when designing a wiring process, when realizing a small-scale integrated circuit with a sufficient number of elements in one basic chip,
Place pads and scribe lines in the chip isolation area. In addition, when configuring a large-scale integrated circuit that spans multiple basic chips, a part of the chip separation area can be used as a wiring area to connect the circuits realized on each basic chip. Pads and scribe lines are placed only in the isolated areas.

〔発明の効果〕〔Effect of the invention〕

本発明のマスターウェハーの構成方法音用いると従来基
本素子数の違いによって、あらかじめ準備されていた数
種類のマスターウェハーを、一種のみにでき、管理が容
易になる。
By using the master wafer construction method of the present invention, several types of master wafers, which were conventionally prepared in advance due to differences in the number of basic elements, can be reduced to only one type, making management easier.

甘た、大規模な集積回路を実現する際に、従来の基本素
子数の大きいマスターを用いると、回路規模の増大に伴
い、配線のための計算機システムの負担が大きくなる。
If a conventional master with a large number of basic elements is used to realize a large-scale integrated circuit, the burden on the computer system for wiring increases as the circuit scale increases.

しかしながら、本発明では基本チップ内の配線と分離領
域内の配線を分けて言19機システムを用いる事により
、負担を軽くすることが可能となる□ 〔発明の実施例〕 第2図に示した様な基本チップと、その分離領域とから
成るマスターウェハを用いて集積回路を構成する際IC
,設計する集積回路装置の規模によって、基本チップ全
1個あるいは複数個使用し、回路システム全作りあげる
事が可能である。
However, in the present invention, by separating the wiring within the basic chip and the wiring within the isolation area and using a 19-machine system, it is possible to lighten the burden. When constructing an integrated circuit using a master wafer consisting of various basic chips and their isolation regions,
Depending on the scale of the integrated circuit device being designed, it is possible to use one or more basic chips to create an entire circuit system.

まず比較的小規模で、1つの基本チップ内に実現可能な
システムの場合は、計算機を用いる配線工程において基
本チップ内に、基本単位素子を結線(−8設計、した回
路を構成し、それと同時に分離領域内に、パッド1とス
クライブライン6、を配置ζtし、基本チップ1個で、
集積回路を作成でき、第3図に示しである。
First, in the case of a system that is relatively small-scale and can be realized within one basic chip, a circuit with basic unit elements connected (-8 design) is constructed within the basic chip in the wiring process using a computer, and at the same time A pad 1 and a scribe line 6 are placed in the isolation region, and one basic chip is used.
An integrated circuit can be created and is shown in FIG.

次に、大規模な回路システムを、本発明の方法により、
実現した例全第4図に示しである。規模の大きな集積回
路では、1つの基本チップ内では設L1′できない。第
4図の場合は、4つの基本チップを用いており、さらに
囲まれた分離領域全基本チップ間の配線領域、7として
使用し、外側の分離領域のみをパッド、1及びスクライ
ブライン、6に使用する。計算機による配線工程の際に
基本チップ内と基本チップ間の配置k別々に扱う事によ
り、計算機の負担が小さくて、大規模な集積回路装置を
構成できる。
Next, a large-scale circuit system is constructed using the method of the present invention.
A complete example of the implementation is shown in FIG. In a large-scale integrated circuit, L1' cannot be established within one basic chip. In the case of Figure 4, four basic chips are used, and the enclosed isolation area is used as the wiring area 7 between all the basic chips, and only the outer isolation area is used as the pad 1 and scribe line 6. use. By handling the layouts within the basic chip and between the basic chips separately during the wiring process using a computer, a large-scale integrated circuit device can be constructed with a small burden on the computer.

なお、この例では、4つの基本チップを用いたが任意の
固数のチップを用いることが出きるのは当然である。
In this example, four basic chips are used, but it goes without saying that any fixed number of chips can be used.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は従来のゲートアレイのマスターチップの構造の
平面図、第2図は、本発明によるマスターチップの構造
を示す平面図、第3図は小規模の集積回路全実現した場
合で、それぞれの基本チップが1つの完成された回路シ
ステムとした平面図、第4図は複数の基本チップで、実
現した大規模な集積回路システムの場合の平面図である
。 図において、 1・・・パッド、2・・・入出力回路用素子、3・・・
基本単位素子、4・・・基本チップ分離領域、5・・・
基本チップ、6・スクライブライン、7・・・基本チッ
プ間の配線エリア、8・・・基本チップ間の金属配線。 代理人 弁理士 則近憲佑他1名 @2図 第8図 第4図
Fig. 1 is a plan view of the structure of a master chip of a conventional gate array, Fig. 2 is a plan view of the structure of a master chip according to the present invention, and Fig. 3 is a plan view of the structure of a master chip of a conventional gate array. FIG. 4 is a plan view of a completed circuit system made up of basic chips, and FIG. 4 is a plan view of a large-scale integrated circuit system realized using a plurality of basic chips. In the figure, 1... Pad, 2... Input/output circuit element, 3...
Basic unit element, 4... Basic chip isolation region, 5...
Basic chip, 6. Scribe line, 7... Wiring area between basic chips, 8... Metal wiring between basic chips. Agent: Patent attorney Kensuke Norichika and 1 other person @2 Figure 8 Figure 4

Claims (1)

【特許請求の範囲】[Claims] 単数も1.〈は複数の種類の基本単位素子のみから構成
される同一形状の基本チップ領域と、配線工程によって
パッドとスクライプラインあるいは基本チップ間の配線
エリアのどちらか一方に決定坏れるチップ分離領域の2
つの領域より成ること全特徴とする半導体集積回路装置
Singular is also 1. 〈〉 consists of a basic chip area of the same shape consisting only of multiple types of basic unit elements, and a chip separation area that is determined by the wiring process to be either a pad and scribe line or a wiring area between basic chips.
A semiconductor integrated circuit device characterized in that it consists of two areas.
JP6997283A 1983-04-22 1983-04-22 Semiconductor integrated circuit device Pending JPS59197151A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6997283A JPS59197151A (en) 1983-04-22 1983-04-22 Semiconductor integrated circuit device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6997283A JPS59197151A (en) 1983-04-22 1983-04-22 Semiconductor integrated circuit device

Publications (1)

Publication Number Publication Date
JPS59197151A true JPS59197151A (en) 1984-11-08

Family

ID=13418078

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6997283A Pending JPS59197151A (en) 1983-04-22 1983-04-22 Semiconductor integrated circuit device

Country Status (1)

Country Link
JP (1) JPS59197151A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4746966A (en) * 1985-10-21 1988-05-24 International Business Machines Corporation Logic-circuit layout for large-scale integrated circuits
JPH022164A (en) * 1988-06-13 1990-01-08 Nec Corp Integrated circuit
US5016080A (en) * 1988-10-07 1991-05-14 Exar Corporation Programmable die size continuous array
JPH03136368A (en) * 1989-10-23 1991-06-11 Nec Corp Master slice system in semiconductor integrated circuit
US5138419A (en) * 1988-06-01 1992-08-11 Fujitsu Limited Wafer scale integration device with dummy chips and relay pads

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4746966A (en) * 1985-10-21 1988-05-24 International Business Machines Corporation Logic-circuit layout for large-scale integrated circuits
US5138419A (en) * 1988-06-01 1992-08-11 Fujitsu Limited Wafer scale integration device with dummy chips and relay pads
JPH022164A (en) * 1988-06-13 1990-01-08 Nec Corp Integrated circuit
US5016080A (en) * 1988-10-07 1991-05-14 Exar Corporation Programmable die size continuous array
JPH03136368A (en) * 1989-10-23 1991-06-11 Nec Corp Master slice system in semiconductor integrated circuit

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