JPS59197151A - Semiconductor integrated circuit device - Google Patents
Semiconductor integrated circuit deviceInfo
- Publication number
- JPS59197151A JPS59197151A JP6997283A JP6997283A JPS59197151A JP S59197151 A JPS59197151 A JP S59197151A JP 6997283 A JP6997283 A JP 6997283A JP 6997283 A JP6997283 A JP 6997283A JP S59197151 A JPS59197151 A JP S59197151A
- Authority
- JP
- Japan
- Prior art keywords
- chips
- basic
- fundamental
- integrated circuit
- chip
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier
- H01L27/04—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body
- H01L27/10—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body including a plurality of individual components in a repetitive configuration
- H01L27/118—Masterslice integrated circuits
Abstract
Description
【発明の詳細な説明】
〔発明の属する技術分野〕
本発明は、マスタースライス方式を用いた集積回路装置
の構成方法に関するものである。DETAILED DESCRIPTION OF THE INVENTION [Field of the Invention] The present invention relates to a method for configuring an integrated circuit device using a master slice method.
最近の泉tJz回路の開発では、設計から製品化丑での
時間の短、縮が必要条件の1つになっており、その1手
法として、マスク−スライス方式があるQこの方法は、
あらかじめ、シリコンウエノ・上に、能受動素子を作成
しておくマスタ一工程と、集積回路装置を実現するため
にそれらの能動及び受動素子に金属配線をほどこす配線
工程とに、分離するものであり、マスタ工程で製作した
汎用のマスタウェハを配線工程で、個々の目的に応じた
集積回路を作る方式である。In the recent development of Izumi tJz circuits, one of the requirements is to shorten the time from design to commercialization, and one method is the mask-slice method.QThis method is
The process is divided into a master process in which active and passive elements are created in advance on silicon substrate, and a wiring process in which metal wiring is applied to those active and passive elements to realize an integrated circuit device. This method uses a general-purpose master wafer manufactured in the master process to create integrated circuits for individual purposes in the wiring process.
このマスタースライス方式を用した集積回路装置に、ゲ
ートアレイがあり、これはチップ上に、基本単位素子が
、アレイ状に並んだ構成で、それらを計算機システム及
び入手により、配線設計を行うことで結合し、回路全実
現している。An integrated circuit device that uses this master slice method is a gate array, which is a structure in which basic unit elements are arranged in an array on a chip, and these can be designed by wiring using a computer system and acquisition. Combined, the entire circuit is realized.
今まで、ゲートアレイを設計、製作する際には第1図に
示した様に、基本単位素子がアレイ状にならんだ基本素
子列3、入出力回路用素子2、が形成されているマスタ
一工程まで終了したチップの上に、金属配線を行い回路
を構成している◇このようなマスターチップの構成でに
、設計される集積回路装置の規模に応じて各種のマスタ
ーウェハを用意しなければ、ならないし、かつ大規模な
集積回路を実現する場合に、基本単位素子αの多いマス
ターチップを用いると計算機システム負担が大きくなっ
てし貰う。Until now, when designing and manufacturing a gate array, as shown in Fig. 1, a master unit is used, in which a basic element row 3 in which basic unit elements are arranged in an array, and an input/output circuit element 2 are formed. Metal wiring is placed on the chip that has completed the process to configure the circuit. ◇With this type of master chip configuration, it is necessary to prepare various master wafers depending on the scale of the integrated circuit device being designed. , and when realizing a large-scale integrated circuit, using a master chip with many basic unit elements α will increase the burden on the computer system.
本発明は、以上のような不都合を解決するために、従来
技術を改良したもので、あらかじめ準備しておくマスタ
一工程を終了したウェハば、1種の〃で、作ろうとする
集積回路の規模に応じて、1つあるいは複数の基本チッ
プ全周いることで集積回路を実現する。The present invention is an improvement on the conventional technology in order to solve the above-mentioned disadvantages, and the scale of the integrated circuit to be manufactured can be adjusted by using one type of wafer that has completed the master process prepared in advance. Depending on the situation, an integrated circuit is realized by having one or more basic chips all around.
また、複数の基本チップを用いる大規模な集積回路を構
成する際には、階層的な配線方法を用いて計算機システ
ムの負担を軽減できることを目的と17でいる。Another objective is to reduce the burden on a computer system by using a hierarchical wiring method when constructing a large-scale integrated circuit using a plurality of basic chips.
本発明は、第2図に示したようVC:
1、基本単位素子列、3や人出回路用素子、2等の能動
素子と、そのチップ内での配線エリアのみを含んだ基本
チップ、5と
2バツド自己i筺エリア及びスクライブラインあるいは
基本チップ間の配線エリアになりつる基本チップ分離領
域、4
との2つよりなるマスターウェハの構成方法である。The present invention, as shown in FIG. 2, consists of a VC: 1, a basic unit element array, 3, an element for a circuit circuit, 2, and other active elements, and a basic chip that includes only a wiring area within the chip; This is a method of configuring a master wafer consisting of two basic chip isolation regions, which serve as a 2-butt self-chamber area and a scribe line or a wiring area between basic chips.
したがって、1つの基本チップ内の素子数で充分な小規
模な集積回路を実現する時にに、配線工程の設計時に、
チップ分離領域に、パッドとスクライプラインを配置す
る。また、複数の基本チップにわたる大規模集瑣回路を
構成する場合には、チップ分離領域の一部を配線エリア
として使用しそれぞれの基本チップ上に実現された回路
の結合に利用でき、一番外側の分離領域のみパッドとス
クライプラインが配置される。Therefore, when designing a wiring process, when realizing a small-scale integrated circuit with a sufficient number of elements in one basic chip,
Place pads and scribe lines in the chip isolation area. In addition, when configuring a large-scale integrated circuit that spans multiple basic chips, a part of the chip separation area can be used as a wiring area to connect the circuits realized on each basic chip. Pads and scribe lines are placed only in the isolated areas.
本発明のマスターウェハーの構成方法音用いると従来基
本素子数の違いによって、あらかじめ準備されていた数
種類のマスターウェハーを、一種のみにでき、管理が容
易になる。By using the master wafer construction method of the present invention, several types of master wafers, which were conventionally prepared in advance due to differences in the number of basic elements, can be reduced to only one type, making management easier.
甘た、大規模な集積回路を実現する際に、従来の基本素
子数の大きいマスターを用いると、回路規模の増大に伴
い、配線のための計算機システムの負担が大きくなる。If a conventional master with a large number of basic elements is used to realize a large-scale integrated circuit, the burden on the computer system for wiring increases as the circuit scale increases.
しかしながら、本発明では基本チップ内の配線と分離領
域内の配線を分けて言19機システムを用いる事により
、負担を軽くすることが可能となる□
〔発明の実施例〕
第2図に示した様な基本チップと、その分離領域とから
成るマスターウェハを用いて集積回路を構成する際IC
,設計する集積回路装置の規模によって、基本チップ全
1個あるいは複数個使用し、回路システム全作りあげる
事が可能である。However, in the present invention, by separating the wiring within the basic chip and the wiring within the isolation area and using a 19-machine system, it is possible to lighten the burden. When constructing an integrated circuit using a master wafer consisting of various basic chips and their isolation regions,
Depending on the scale of the integrated circuit device being designed, it is possible to use one or more basic chips to create an entire circuit system.
まず比較的小規模で、1つの基本チップ内に実現可能な
システムの場合は、計算機を用いる配線工程において基
本チップ内に、基本単位素子を結線(−8設計、した回
路を構成し、それと同時に分離領域内に、パッド1とス
クライブライン6、を配置ζtし、基本チップ1個で、
集積回路を作成でき、第3図に示しである。First, in the case of a system that is relatively small-scale and can be realized within one basic chip, a circuit with basic unit elements connected (-8 design) is constructed within the basic chip in the wiring process using a computer, and at the same time A pad 1 and a scribe line 6 are placed in the isolation region, and one basic chip is used.
An integrated circuit can be created and is shown in FIG.
次に、大規模な回路システムを、本発明の方法により、
実現した例全第4図に示しである。規模の大きな集積回
路では、1つの基本チップ内では設L1′できない。第
4図の場合は、4つの基本チップを用いており、さらに
囲まれた分離領域全基本チップ間の配線領域、7として
使用し、外側の分離領域のみをパッド、1及びスクライ
ブライン、6に使用する。計算機による配線工程の際に
基本チップ内と基本チップ間の配置k別々に扱う事によ
り、計算機の負担が小さくて、大規模な集積回路装置を
構成できる。Next, a large-scale circuit system is constructed using the method of the present invention.
A complete example of the implementation is shown in FIG. In a large-scale integrated circuit, L1' cannot be established within one basic chip. In the case of Figure 4, four basic chips are used, and the enclosed isolation area is used as the wiring area 7 between all the basic chips, and only the outer isolation area is used as the pad 1 and scribe line 6. use. By handling the layouts within the basic chip and between the basic chips separately during the wiring process using a computer, a large-scale integrated circuit device can be constructed with a small burden on the computer.
なお、この例では、4つの基本チップを用いたが任意の
固数のチップを用いることが出きるのは当然である。In this example, four basic chips are used, but it goes without saying that any fixed number of chips can be used.
第1図は従来のゲートアレイのマスターチップの構造の
平面図、第2図は、本発明によるマスターチップの構造
を示す平面図、第3図は小規模の集積回路全実現した場
合で、それぞれの基本チップが1つの完成された回路シ
ステムとした平面図、第4図は複数の基本チップで、実
現した大規模な集積回路システムの場合の平面図である
。
図において、
1・・・パッド、2・・・入出力回路用素子、3・・・
基本単位素子、4・・・基本チップ分離領域、5・・・
基本チップ、6・スクライブライン、7・・・基本チッ
プ間の配線エリア、8・・・基本チップ間の金属配線。
代理人 弁理士 則近憲佑他1名
@2図
第8図
第4図Fig. 1 is a plan view of the structure of a master chip of a conventional gate array, Fig. 2 is a plan view of the structure of a master chip according to the present invention, and Fig. 3 is a plan view of the structure of a master chip of a conventional gate array. FIG. 4 is a plan view of a completed circuit system made up of basic chips, and FIG. 4 is a plan view of a large-scale integrated circuit system realized using a plurality of basic chips. In the figure, 1... Pad, 2... Input/output circuit element, 3...
Basic unit element, 4... Basic chip isolation region, 5...
Basic chip, 6. Scribe line, 7... Wiring area between basic chips, 8... Metal wiring between basic chips. Agent: Patent attorney Kensuke Norichika and 1 other person @2 Figure 8 Figure 4
Claims (1)
される同一形状の基本チップ領域と、配線工程によって
パッドとスクライプラインあるいは基本チップ間の配線
エリアのどちらか一方に決定坏れるチップ分離領域の2
つの領域より成ること全特徴とする半導体集積回路装置
。Singular is also 1. 〈〉 consists of a basic chip area of the same shape consisting only of multiple types of basic unit elements, and a chip separation area that is determined by the wiring process to be either a pad and scribe line or a wiring area between basic chips.
A semiconductor integrated circuit device characterized in that it consists of two areas.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6997283A JPS59197151A (en) | 1983-04-22 | 1983-04-22 | Semiconductor integrated circuit device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6997283A JPS59197151A (en) | 1983-04-22 | 1983-04-22 | Semiconductor integrated circuit device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS59197151A true JPS59197151A (en) | 1984-11-08 |
Family
ID=13418078
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP6997283A Pending JPS59197151A (en) | 1983-04-22 | 1983-04-22 | Semiconductor integrated circuit device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS59197151A (en) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4746966A (en) * | 1985-10-21 | 1988-05-24 | International Business Machines Corporation | Logic-circuit layout for large-scale integrated circuits |
JPH022164A (en) * | 1988-06-13 | 1990-01-08 | Nec Corp | Integrated circuit |
US5016080A (en) * | 1988-10-07 | 1991-05-14 | Exar Corporation | Programmable die size continuous array |
JPH03136368A (en) * | 1989-10-23 | 1991-06-11 | Nec Corp | Master slice system in semiconductor integrated circuit |
US5138419A (en) * | 1988-06-01 | 1992-08-11 | Fujitsu Limited | Wafer scale integration device with dummy chips and relay pads |
-
1983
- 1983-04-22 JP JP6997283A patent/JPS59197151A/en active Pending
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4746966A (en) * | 1985-10-21 | 1988-05-24 | International Business Machines Corporation | Logic-circuit layout for large-scale integrated circuits |
US5138419A (en) * | 1988-06-01 | 1992-08-11 | Fujitsu Limited | Wafer scale integration device with dummy chips and relay pads |
JPH022164A (en) * | 1988-06-13 | 1990-01-08 | Nec Corp | Integrated circuit |
US5016080A (en) * | 1988-10-07 | 1991-05-14 | Exar Corporation | Programmable die size continuous array |
JPH03136368A (en) * | 1989-10-23 | 1991-06-11 | Nec Corp | Master slice system in semiconductor integrated circuit |
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