JPS59231536A - 現像液組成物 - Google Patents

現像液組成物

Info

Publication number
JPS59231536A
JPS59231536A JP10646383A JP10646383A JPS59231536A JP S59231536 A JPS59231536 A JP S59231536A JP 10646383 A JP10646383 A JP 10646383A JP 10646383 A JP10646383 A JP 10646383A JP S59231536 A JPS59231536 A JP S59231536A
Authority
JP
Japan
Prior art keywords
water
acid
salt
photosensitive layer
sodium
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP10646383A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0354338B2 (enrdf_load_stackoverflow
Inventor
Masanori Imai
今井 昌則
Nobuyuki Kita
喜多 信行
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Holdings Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Priority to JP10646383A priority Critical patent/JPS59231536A/ja
Publication of JPS59231536A publication Critical patent/JPS59231536A/ja
Publication of JPH0354338B2 publication Critical patent/JPH0354338B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26Processing photosensitive materials; Apparatus therefor
    • G03F7/30Imagewise removal using liquid means
    • G03F7/32Liquid compositions therefor, e.g. developers
    • G03F7/322Aqueous alkaline compositions

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP10646383A 1983-06-14 1983-06-14 現像液組成物 Granted JPS59231536A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10646383A JPS59231536A (ja) 1983-06-14 1983-06-14 現像液組成物

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10646383A JPS59231536A (ja) 1983-06-14 1983-06-14 現像液組成物

Publications (2)

Publication Number Publication Date
JPS59231536A true JPS59231536A (ja) 1984-12-26
JPH0354338B2 JPH0354338B2 (enrdf_load_stackoverflow) 1991-08-19

Family

ID=14434258

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10646383A Granted JPS59231536A (ja) 1983-06-14 1983-06-14 現像液組成物

Country Status (1)

Country Link
JP (1) JPS59231536A (enrdf_load_stackoverflow)

Also Published As

Publication number Publication date
JPH0354338B2 (enrdf_load_stackoverflow) 1991-08-19

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