JPS59219931A - ウエハの位置決め装置 - Google Patents

ウエハの位置決め装置

Info

Publication number
JPS59219931A
JPS59219931A JP58095190A JP9519083A JPS59219931A JP S59219931 A JPS59219931 A JP S59219931A JP 58095190 A JP58095190 A JP 58095190A JP 9519083 A JP9519083 A JP 9519083A JP S59219931 A JPS59219931 A JP S59219931A
Authority
JP
Japan
Prior art keywords
wafer
center
contact
positioning
flat
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP58095190A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0330990B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html
Inventor
Takeshi Naraki
剛 楢木
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Nippon Kogaku KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp, Nippon Kogaku KK filed Critical Nikon Corp
Priority to JP58095190A priority Critical patent/JPS59219931A/ja
Publication of JPS59219931A publication Critical patent/JPS59219931A/ja
Publication of JPH0330990B2 publication Critical patent/JPH0330990B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
    • G03F7/7075—Handling workpieces outside exposure position, e.g. SMIF box
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP58095190A 1983-05-30 1983-05-30 ウエハの位置決め装置 Granted JPS59219931A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58095190A JPS59219931A (ja) 1983-05-30 1983-05-30 ウエハの位置決め装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58095190A JPS59219931A (ja) 1983-05-30 1983-05-30 ウエハの位置決め装置

Publications (2)

Publication Number Publication Date
JPS59219931A true JPS59219931A (ja) 1984-12-11
JPH0330990B2 JPH0330990B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1991-05-01

Family

ID=14130832

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58095190A Granted JPS59219931A (ja) 1983-05-30 1983-05-30 ウエハの位置決め装置

Country Status (1)

Country Link
JP (1) JPS59219931A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6323322A (ja) * 1986-07-16 1988-01-30 Kyushu Denshi Kinzoku Kk 半導体ウエハ−の保護膜除去装置
US6094255A (en) * 1997-02-04 2000-07-25 Nikon Corporation Projection exposure apparatus and method that floats a plate
KR100558774B1 (ko) * 1997-07-15 2007-04-25 동경 엘렉트론 주식회사 위치결정장치및위치결정방법

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6323322A (ja) * 1986-07-16 1988-01-30 Kyushu Denshi Kinzoku Kk 半導体ウエハ−の保護膜除去装置
US6094255A (en) * 1997-02-04 2000-07-25 Nikon Corporation Projection exposure apparatus and method that floats a plate
KR100558774B1 (ko) * 1997-07-15 2007-04-25 동경 엘렉트론 주식회사 위치결정장치및위치결정방법

Also Published As

Publication number Publication date
JPH0330990B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1991-05-01

Similar Documents

Publication Publication Date Title
EP0325930B1 (en) Method of exposing a peripheral part of wafer
JP2591776B2 (ja) ウェハー位置決め方法、ウェハー位置決め装置及びウェハー操作装置
US4024944A (en) Semiconductor slice prealignment system
JPS61134814A (ja) 円形基板の位置決め装置
US4973217A (en) Wafer handling system
JPH088328A (ja) ウェーハ位置決め装置
JPS59219931A (ja) ウエハの位置決め装置
JPH05343294A (ja) 縮小投影露光装置
US5193972A (en) Wafer handling system
JPH053153A (ja) ウエハ上の不要レジスト露光装置
JPH0795516B2 (ja) ウエハ周辺露光方法及び装置
JP2610481B2 (ja) 露光装置及び処理装置及び処理方法
JPH085546Y2 (ja) ウエハ周辺露光装置
JPH01295421A (ja) 周辺露光装置
JPH04291938A (ja) ウエハ上の不要レジスト露光装置および露光方法
JPH03289662A (ja) フィルム露光装置およびフィルム露光方法
JPS63266850A (ja) 円形基板の位置決め装置
JPH02114630A (ja) ウエハ周辺露光ユニット
JPH0817897A (ja) ウエハの位置合わせ及び半導体装置の製造方法
JPH04299332A (ja) フィルム露光方法
JPH02114629A (ja) ウエハ周辺露光方法
JP2541552B2 (ja) ウエハ・アライメント装置
KR200249359Y1 (ko) 스텝퍼의 웨이퍼 홀더
JPH02101734A (ja) ウェハー周辺の露光方法
JPH02114628A (ja) ウエハ周辺露光装置