JPS59208779A - 半導体装置の製造方法 - Google Patents
半導体装置の製造方法Info
- Publication number
- JPS59208779A JPS59208779A JP58083835A JP8383583A JPS59208779A JP S59208779 A JPS59208779 A JP S59208779A JP 58083835 A JP58083835 A JP 58083835A JP 8383583 A JP8383583 A JP 8383583A JP S59208779 A JPS59208779 A JP S59208779A
- Authority
- JP
- Japan
- Prior art keywords
- film
- region
- ion implantation
- base
- semiconductor device
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D48/00—Individual devices not covered by groups H10D1/00 - H10D44/00
- H10D48/30—Devices controlled by electric currents or voltages
- H10D48/32—Devices controlled by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H10D48/34—Bipolar devices
- H10D48/345—Bipolar transistors having ohmic electrodes on emitter-like, base-like, and collector-like regions
Landscapes
- Bipolar Transistors (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP58083835A JPS59208779A (ja) | 1983-05-12 | 1983-05-12 | 半導体装置の製造方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP58083835A JPS59208779A (ja) | 1983-05-12 | 1983-05-12 | 半導体装置の製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS59208779A true JPS59208779A (ja) | 1984-11-27 |
JPH0478008B2 JPH0478008B2 (enrdf_load_stackoverflow) | 1992-12-10 |
Family
ID=13813753
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP58083835A Granted JPS59208779A (ja) | 1983-05-12 | 1983-05-12 | 半導体装置の製造方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS59208779A (enrdf_load_stackoverflow) |
-
1983
- 1983-05-12 JP JP58083835A patent/JPS59208779A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPH0478008B2 (enrdf_load_stackoverflow) | 1992-12-10 |
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