JPS59201418A - 露光装置 - Google Patents

露光装置

Info

Publication number
JPS59201418A
JPS59201418A JP58076429A JP7642983A JPS59201418A JP S59201418 A JPS59201418 A JP S59201418A JP 58076429 A JP58076429 A JP 58076429A JP 7642983 A JP7642983 A JP 7642983A JP S59201418 A JPS59201418 A JP S59201418A
Authority
JP
Japan
Prior art keywords
mask
dimensions
exposure time
photoresist
exposure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP58076429A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0141246B2 (enrdf_load_stackoverflow
Inventor
Hatsuo Nakamura
中村　初雄
Chiharu Kato
千晴 加藤
Toshio Yonezawa
敏夫 米沢
Kenichi Nitta
新田　賢市
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Priority to JP58076429A priority Critical patent/JPS59201418A/ja
Publication of JPS59201418A publication Critical patent/JPS59201418A/ja
Publication of JPH0141246B2 publication Critical patent/JPH0141246B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70558—Dose control, i.e. achievement of a desired dose
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP58076429A 1983-04-30 1983-04-30 露光装置 Granted JPS59201418A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58076429A JPS59201418A (ja) 1983-04-30 1983-04-30 露光装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58076429A JPS59201418A (ja) 1983-04-30 1983-04-30 露光装置

Publications (2)

Publication Number Publication Date
JPS59201418A true JPS59201418A (ja) 1984-11-15
JPH0141246B2 JPH0141246B2 (enrdf_load_stackoverflow) 1989-09-04

Family

ID=13604917

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58076429A Granted JPS59201418A (ja) 1983-04-30 1983-04-30 露光装置

Country Status (1)

Country Link
JP (1) JPS59201418A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03246920A (ja) * 1990-02-26 1991-11-05 Fujitsu Ltd 半導体装置の製造方法

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5277725A (en) * 1975-12-24 1977-06-30 Hitachi Ltd Automatic exposure circuit
JPS5453864A (en) * 1977-10-05 1979-04-27 Sanyo Electric Co Ltd Monitoring method of line widths
JPS57118639A (en) * 1981-01-16 1982-07-23 Toshiba Corp Process control of semiconductor photo-etching

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5277725A (en) * 1975-12-24 1977-06-30 Hitachi Ltd Automatic exposure circuit
JPS5453864A (en) * 1977-10-05 1979-04-27 Sanyo Electric Co Ltd Monitoring method of line widths
JPS57118639A (en) * 1981-01-16 1982-07-23 Toshiba Corp Process control of semiconductor photo-etching

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03246920A (ja) * 1990-02-26 1991-11-05 Fujitsu Ltd 半導体装置の製造方法

Also Published As

Publication number Publication date
JPH0141246B2 (enrdf_load_stackoverflow) 1989-09-04

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