JPS59200908A - ウエハの照明方法およびその装置 - Google Patents

ウエハの照明方法およびその装置

Info

Publication number
JPS59200908A
JPS59200908A JP7372783A JP7372783A JPS59200908A JP S59200908 A JPS59200908 A JP S59200908A JP 7372783 A JP7372783 A JP 7372783A JP 7372783 A JP7372783 A JP 7372783A JP S59200908 A JPS59200908 A JP S59200908A
Authority
JP
Japan
Prior art keywords
illumination
dark
epi
light
wafer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP7372783A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0151121B2 (enExample
Inventor
Yasuhiko Hara
靖彦 原
Yoshimasa Oshima
良正 大島
Satoshi Fushimi
智 伏見
Hiroshi Makihira
牧平　坦
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP7372783A priority Critical patent/JPS59200908A/ja
Priority to US06/604,998 priority patent/US4614430A/en
Priority to EP84104785A priority patent/EP0124113B1/en
Priority to DE8484104785T priority patent/DE3476916D1/de
Publication of JPS59200908A publication Critical patent/JPS59200908A/ja
Publication of JPH0151121B2 publication Critical patent/JPH0151121B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T7/00—Image analysis
    • G06T7/0002—Inspection of images, e.g. flaw detection
    • G06T7/0004—Industrial image inspection
    • G06T7/001—Industrial image inspection using an image reference approach
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/956—Inspecting patterns on the surface of objects
    • G01N21/95607—Inspecting patterns on the surface of objects using a comparative method
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T2207/00—Indexing scheme for image analysis or image enhancement
    • G06T2207/10—Image acquisition modality
    • G06T2207/10056—Microscopic image
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T2207/00—Indexing scheme for image analysis or image enhancement
    • G06T2207/30—Subject of image; Context of image processing
    • G06T2207/30108—Industrial image inspection
    • G06T2207/30148—Semiconductor; IC; Wafer

Landscapes

  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Pathology (AREA)
  • Health & Medical Sciences (AREA)
  • Quality & Reliability (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • Theoretical Computer Science (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
JP7372783A 1983-04-28 1983-04-28 ウエハの照明方法およびその装置 Granted JPS59200908A (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP7372783A JPS59200908A (ja) 1983-04-28 1983-04-28 ウエハの照明方法およびその装置
US06/604,998 US4614430A (en) 1983-04-28 1984-04-27 Method of detecting pattern defect and its apparatus
EP84104785A EP0124113B1 (en) 1983-04-28 1984-04-27 Method of detecting pattern defect and its apparatus
DE8484104785T DE3476916D1 (en) 1983-04-28 1984-04-27 Method of detecting pattern defect and its apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7372783A JPS59200908A (ja) 1983-04-28 1983-04-28 ウエハの照明方法およびその装置

Publications (2)

Publication Number Publication Date
JPS59200908A true JPS59200908A (ja) 1984-11-14
JPH0151121B2 JPH0151121B2 (enExample) 1989-11-01

Family

ID=13526546

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7372783A Granted JPS59200908A (ja) 1983-04-28 1983-04-28 ウエハの照明方法およびその装置

Country Status (1)

Country Link
JP (1) JPS59200908A (enExample)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61169708A (ja) * 1985-01-22 1986-07-31 Fujitsu Ltd パタ−ン検知方法とその装置
JPS6285809A (ja) * 1985-10-11 1987-04-20 Mitsubishi Electric Corp パタ−ン認識用照明装置
JPS62156507A (ja) * 1985-12-04 1987-07-11 ケイエルエイ・インストラメンツ・コ−ポレ−シヨン 三次元物体の表面を検査する光学的検査装置

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5719647A (en) * 1980-07-11 1982-02-01 Hitachi Ltd Inspecting device for sample of face plate
JPS5767844A (en) * 1980-10-15 1982-04-24 Nippon Kogaku Kk <Nikon> Surface inspecting device
JPS57208153A (en) * 1981-06-17 1982-12-21 Hitachi Ltd Inspecting method for defective aluminum pattern of semiconductor or the like

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5719647A (en) * 1980-07-11 1982-02-01 Hitachi Ltd Inspecting device for sample of face plate
JPS5767844A (en) * 1980-10-15 1982-04-24 Nippon Kogaku Kk <Nikon> Surface inspecting device
JPS57208153A (en) * 1981-06-17 1982-12-21 Hitachi Ltd Inspecting method for defective aluminum pattern of semiconductor or the like

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61169708A (ja) * 1985-01-22 1986-07-31 Fujitsu Ltd パタ−ン検知方法とその装置
JPS6285809A (ja) * 1985-10-11 1987-04-20 Mitsubishi Electric Corp パタ−ン認識用照明装置
JPS62156507A (ja) * 1985-12-04 1987-07-11 ケイエルエイ・インストラメンツ・コ−ポレ−シヨン 三次元物体の表面を検査する光学的検査装置

Also Published As

Publication number Publication date
JPH0151121B2 (enExample) 1989-11-01

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