JPS59200236A - 座標デ−タの区分けフアイル方法 - Google Patents

座標デ−タの区分けフアイル方法

Info

Publication number
JPS59200236A
JPS59200236A JP58075127A JP7512783A JPS59200236A JP S59200236 A JPS59200236 A JP S59200236A JP 58075127 A JP58075127 A JP 58075127A JP 7512783 A JP7512783 A JP 7512783A JP S59200236 A JPS59200236 A JP S59200236A
Authority
JP
Japan
Prior art keywords
data
file
hole
mark
hole mark
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP58075127A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6363895B2 (enExample
Inventor
Yasuo Yamaguchi
康夫 山口
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mutoh Industries Ltd
Original Assignee
Mutoh Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mutoh Industries Ltd filed Critical Mutoh Industries Ltd
Priority to JP58075127A priority Critical patent/JPS59200236A/ja
Publication of JPS59200236A publication Critical patent/JPS59200236A/ja
Publication of JPS6363895B2 publication Critical patent/JPS6363895B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
JP58075127A 1983-04-28 1983-04-28 座標デ−タの区分けフアイル方法 Granted JPS59200236A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58075127A JPS59200236A (ja) 1983-04-28 1983-04-28 座標デ−タの区分けフアイル方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58075127A JPS59200236A (ja) 1983-04-28 1983-04-28 座標デ−タの区分けフアイル方法

Publications (2)

Publication Number Publication Date
JPS59200236A true JPS59200236A (ja) 1984-11-13
JPS6363895B2 JPS6363895B2 (enExample) 1988-12-08

Family

ID=13567217

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58075127A Granted JPS59200236A (ja) 1983-04-28 1983-04-28 座標デ−タの区分けフアイル方法

Country Status (1)

Country Link
JP (1) JPS59200236A (enExample)

Also Published As

Publication number Publication date
JPS6363895B2 (enExample) 1988-12-08

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