JPS59195645A - 露光マスク洗浄装置 - Google Patents

露光マスク洗浄装置

Info

Publication number
JPS59195645A
JPS59195645A JP58070494A JP7049483A JPS59195645A JP S59195645 A JPS59195645 A JP S59195645A JP 58070494 A JP58070494 A JP 58070494A JP 7049483 A JP7049483 A JP 7049483A JP S59195645 A JPS59195645 A JP S59195645A
Authority
JP
Japan
Prior art keywords
mask
exposure mask
dust
washing
cleaning
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP58070494A
Other languages
English (en)
Japanese (ja)
Other versions
JPH045979B2 (enExample
Inventor
Hiromi Yamashita
裕己 山下
Toshio Wada
和田　俊男
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP58070494A priority Critical patent/JPS59195645A/ja
Priority to US06/602,519 priority patent/US4569695A/en
Publication of JPS59195645A publication Critical patent/JPS59195645A/ja
Publication of JPH045979B2 publication Critical patent/JPH045979B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0402—Apparatus for fluid treatment
    • H10P72/0406—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H10P72/0411—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H10P72/0414—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly spraying means, e.g. nozzles
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B11/00—Cleaning flexible or delicate articles by methods or apparatus specially adapted thereto
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0402—Apparatus for fluid treatment
    • H10P72/0406—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H10P72/0411—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0402—Apparatus for fluid treatment
    • H10P72/0406—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H10P72/0411—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H10P72/0412—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly scrubbing means, e.g. brushes

Landscapes

  • Cleaning By Liquid Or Steam (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
JP58070494A 1983-04-21 1983-04-21 露光マスク洗浄装置 Granted JPS59195645A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP58070494A JPS59195645A (ja) 1983-04-21 1983-04-21 露光マスク洗浄装置
US06/602,519 US4569695A (en) 1983-04-21 1984-04-20 Method of cleaning a photo-mask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58070494A JPS59195645A (ja) 1983-04-21 1983-04-21 露光マスク洗浄装置

Publications (2)

Publication Number Publication Date
JPS59195645A true JPS59195645A (ja) 1984-11-06
JPH045979B2 JPH045979B2 (enExample) 1992-02-04

Family

ID=13433126

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58070494A Granted JPS59195645A (ja) 1983-04-21 1983-04-21 露光マスク洗浄装置

Country Status (1)

Country Link
JP (1) JPS59195645A (enExample)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63228624A (ja) * 1987-03-17 1988-09-22 Nikon Corp 洗浄方法
JPH05241329A (ja) * 1992-03-03 1993-09-21 Nec Yamagata Ltd マスク洗浄機
JP2009182222A (ja) * 2008-01-31 2009-08-13 Tokyo Electron Ltd 基板洗浄装置、基板洗浄方法、プログラム及びコンピュータ記憶媒体
CN114101213A (zh) * 2020-09-01 2022-03-01 家登精密工业股份有限公司 光掩模盒洁净设备

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011257304A (ja) * 2010-06-10 2011-12-22 Hitachi High-Technologies Corp 基板検査方法及び装置

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5027181A (enExample) * 1973-07-14 1975-03-20
JPS55102233A (en) * 1979-01-30 1980-08-05 Matsushita Electric Ind Co Ltd Removing method of dust

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5027181A (enExample) * 1973-07-14 1975-03-20
JPS55102233A (en) * 1979-01-30 1980-08-05 Matsushita Electric Ind Co Ltd Removing method of dust

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63228624A (ja) * 1987-03-17 1988-09-22 Nikon Corp 洗浄方法
JPH05241329A (ja) * 1992-03-03 1993-09-21 Nec Yamagata Ltd マスク洗浄機
JP2009182222A (ja) * 2008-01-31 2009-08-13 Tokyo Electron Ltd 基板洗浄装置、基板洗浄方法、プログラム及びコンピュータ記憶媒体
CN114101213A (zh) * 2020-09-01 2022-03-01 家登精密工业股份有限公司 光掩模盒洁净设备
CN114101213B (zh) * 2020-09-01 2023-08-29 家登精密工业股份有限公司 光掩模盒洁净设备

Also Published As

Publication number Publication date
JPH045979B2 (enExample) 1992-02-04

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