JPS59192917A - 位置合わせ方法 - Google Patents
位置合わせ方法Info
- Publication number
- JPS59192917A JPS59192917A JP6732983A JP6732983A JPS59192917A JP S59192917 A JPS59192917 A JP S59192917A JP 6732983 A JP6732983 A JP 6732983A JP 6732983 A JP6732983 A JP 6732983A JP S59192917 A JPS59192917 A JP S59192917A
- Authority
- JP
- Japan
- Prior art keywords
- light
- grating
- detection means
- interference
- position detection
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000034 method Methods 0.000 title claims description 15
- 230000001427 coherent effect Effects 0.000 claims abstract description 6
- 238000001514 detection method Methods 0.000 claims description 27
- 230000003287 optical effect Effects 0.000 claims description 9
- 238000006073 displacement reaction Methods 0.000 claims 3
- 230000004907 flux Effects 0.000 abstract description 7
- 241000257465 Echinoidea Species 0.000 description 8
- 238000010586 diagram Methods 0.000 description 6
- 239000004065 semiconductor Substances 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 2
- 230000035945 sensitivity Effects 0.000 description 2
- 241000251468 Actinopterygii Species 0.000 description 1
- 238000001093 holography Methods 0.000 description 1
- 230000002452 interceptive effect Effects 0.000 description 1
- 238000005305 interferometry Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7049—Technique, e.g. interferometric
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70408—Interferometric lithography; Holographic lithography; Self-imaging lithography, e.g. utilizing the Talbot effect
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7073—Alignment marks and their environment
- G03F9/7076—Mark details, e.g. phase grating mark, temporary mark
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optical Transform (AREA)
- Diffracting Gratings Or Hologram Optical Elements (AREA)
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6732983A JPS59192917A (ja) | 1983-04-15 | 1983-04-15 | 位置合わせ方法 |
| US06/599,734 US4636077A (en) | 1983-04-15 | 1984-04-12 | Aligning exposure method |
| US07/296,721 USRE33669E (en) | 1983-04-15 | 1989-01-12 | Aligning exposure method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6732983A JPS59192917A (ja) | 1983-04-15 | 1983-04-15 | 位置合わせ方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS59192917A true JPS59192917A (ja) | 1984-11-01 |
| JPH0441285B2 JPH0441285B2 (enrdf_load_stackoverflow) | 1992-07-07 |
Family
ID=13341870
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP6732983A Granted JPS59192917A (ja) | 1983-04-15 | 1983-04-15 | 位置合わせ方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS59192917A (enrdf_load_stackoverflow) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63309815A (ja) * | 1987-06-12 | 1988-12-16 | Tokyo Seimitsu Co Ltd | 光学干渉装置 |
| JPH01185415A (ja) * | 1988-01-21 | 1989-07-25 | Mitsutoyo Corp | 格子干渉型変位検出装置 |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5023617A (enrdf_load_stackoverflow) * | 1973-06-29 | 1975-03-13 |
-
1983
- 1983-04-15 JP JP6732983A patent/JPS59192917A/ja active Granted
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5023617A (enrdf_load_stackoverflow) * | 1973-06-29 | 1975-03-13 |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63309815A (ja) * | 1987-06-12 | 1988-12-16 | Tokyo Seimitsu Co Ltd | 光学干渉装置 |
| JPH01185415A (ja) * | 1988-01-21 | 1989-07-25 | Mitsutoyo Corp | 格子干渉型変位検出装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0441285B2 (enrdf_load_stackoverflow) | 1992-07-07 |
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