JPS59192917A - 位置合わせ方法 - Google Patents

位置合わせ方法

Info

Publication number
JPS59192917A
JPS59192917A JP6732983A JP6732983A JPS59192917A JP S59192917 A JPS59192917 A JP S59192917A JP 6732983 A JP6732983 A JP 6732983A JP 6732983 A JP6732983 A JP 6732983A JP S59192917 A JPS59192917 A JP S59192917A
Authority
JP
Japan
Prior art keywords
light
grating
detection means
interference
position detection
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP6732983A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0441285B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html
Inventor
Noboru Nomura
登 野村
Koichi Kugimiya
公一 釘宮
Taketoshi Yonezawa
米澤　武敏
Ryukichi Matsumura
松村　隆吉
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP6732983A priority Critical patent/JPS59192917A/ja
Priority to US06/599,734 priority patent/US4636077A/en
Publication of JPS59192917A publication Critical patent/JPS59192917A/ja
Priority to US07/296,721 priority patent/USRE33669E/en
Publication of JPH0441285B2 publication Critical patent/JPH0441285B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7049—Technique, e.g. interferometric
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70408—Interferometric lithography; Holographic lithography; Self-imaging lithography, e.g. utilizing the Talbot effect
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7073—Alignment marks and their environment
    • G03F9/7076—Mark details, e.g. phase grating mark, temporary mark

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optical Transform (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)
JP6732983A 1983-04-15 1983-04-15 位置合わせ方法 Granted JPS59192917A (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP6732983A JPS59192917A (ja) 1983-04-15 1983-04-15 位置合わせ方法
US06/599,734 US4636077A (en) 1983-04-15 1984-04-12 Aligning exposure method
US07/296,721 USRE33669E (en) 1983-04-15 1989-01-12 Aligning exposure method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6732983A JPS59192917A (ja) 1983-04-15 1983-04-15 位置合わせ方法

Publications (2)

Publication Number Publication Date
JPS59192917A true JPS59192917A (ja) 1984-11-01
JPH0441285B2 JPH0441285B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1992-07-07

Family

ID=13341870

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6732983A Granted JPS59192917A (ja) 1983-04-15 1983-04-15 位置合わせ方法

Country Status (1)

Country Link
JP (1) JPS59192917A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63309815A (ja) * 1987-06-12 1988-12-16 Tokyo Seimitsu Co Ltd 光学干渉装置
JPH01185415A (ja) * 1988-01-21 1989-07-25 Mitsutoyo Corp 格子干渉型変位検出装置

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5023617A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * 1973-06-29 1975-03-13

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5023617A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * 1973-06-29 1975-03-13

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63309815A (ja) * 1987-06-12 1988-12-16 Tokyo Seimitsu Co Ltd 光学干渉装置
JPH01185415A (ja) * 1988-01-21 1989-07-25 Mitsutoyo Corp 格子干渉型変位検出装置

Also Published As

Publication number Publication date
JPH0441285B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1992-07-07

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