JPS59191710A - 高分子量ノボラツク型置換フエノ−ル樹脂の製法 - Google Patents

高分子量ノボラツク型置換フエノ−ル樹脂の製法

Info

Publication number
JPS59191710A
JPS59191710A JP6527783A JP6527783A JPS59191710A JP S59191710 A JPS59191710 A JP S59191710A JP 6527783 A JP6527783 A JP 6527783A JP 6527783 A JP6527783 A JP 6527783A JP S59191710 A JPS59191710 A JP S59191710A
Authority
JP
Japan
Prior art keywords
molecular weight
range
phenol
phenols
high molecular
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP6527783A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0433803B2 (cg-RX-API-DMAC7.html
Inventor
Nobuyuki Takeda
信之 武田
Takayuki Nakano
貴幸 中野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsui Petrochemical Industries Ltd
Original Assignee
Mitsui Petrochemical Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsui Petrochemical Industries Ltd filed Critical Mitsui Petrochemical Industries Ltd
Priority to JP6527783A priority Critical patent/JPS59191710A/ja
Publication of JPS59191710A publication Critical patent/JPS59191710A/ja
Publication of JPH0433803B2 publication Critical patent/JPH0433803B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Phenolic Resins Or Amino Resins (AREA)
JP6527783A 1983-04-15 1983-04-15 高分子量ノボラツク型置換フエノ−ル樹脂の製法 Granted JPS59191710A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6527783A JPS59191710A (ja) 1983-04-15 1983-04-15 高分子量ノボラツク型置換フエノ−ル樹脂の製法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6527783A JPS59191710A (ja) 1983-04-15 1983-04-15 高分子量ノボラツク型置換フエノ−ル樹脂の製法

Publications (2)

Publication Number Publication Date
JPS59191710A true JPS59191710A (ja) 1984-10-30
JPH0433803B2 JPH0433803B2 (cg-RX-API-DMAC7.html) 1992-06-04

Family

ID=13282266

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6527783A Granted JPS59191710A (ja) 1983-04-15 1983-04-15 高分子量ノボラツク型置換フエノ−ル樹脂の製法

Country Status (1)

Country Link
JP (1) JPS59191710A (cg-RX-API-DMAC7.html)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62230816A (ja) * 1985-12-06 1987-10-09 Toray Ind Inc 放射線感応レジスト
JPS62270951A (ja) * 1986-05-19 1987-11-25 Sumitomo Chem Co Ltd ポジ型フォトレジスト用クレゾールノボラック樹脂
EP0902326A3 (en) * 1997-07-25 1999-09-29 Tokyo Ohka Kogyo Co., Ltd. Novolak resin precursor, novolak resin and positive photoresist composition containing the novolak resin

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS576444A (en) * 1980-06-16 1982-01-13 Olympus Optical Co Ltd Objective lens driving device

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS576444A (en) * 1980-06-16 1982-01-13 Olympus Optical Co Ltd Objective lens driving device

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62230816A (ja) * 1985-12-06 1987-10-09 Toray Ind Inc 放射線感応レジスト
JPS62270951A (ja) * 1986-05-19 1987-11-25 Sumitomo Chem Co Ltd ポジ型フォトレジスト用クレゾールノボラック樹脂
EP0902326A3 (en) * 1997-07-25 1999-09-29 Tokyo Ohka Kogyo Co., Ltd. Novolak resin precursor, novolak resin and positive photoresist composition containing the novolak resin

Also Published As

Publication number Publication date
JPH0433803B2 (cg-RX-API-DMAC7.html) 1992-06-04

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