JPS5918867B2 - 半導体装置 - Google Patents
半導体装置Info
- Publication number
- JPS5918867B2 JPS5918867B2 JP48092007A JP9200773A JPS5918867B2 JP S5918867 B2 JPS5918867 B2 JP S5918867B2 JP 48092007 A JP48092007 A JP 48092007A JP 9200773 A JP9200773 A JP 9200773A JP S5918867 B2 JPS5918867 B2 JP S5918867B2
- Authority
- JP
- Japan
- Prior art keywords
- plane
- channel
- diffusion
- channel stopper
- film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Element Separation (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP48092007A JPS5918867B2 (ja) | 1973-08-15 | 1973-08-15 | 半導体装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP48092007A JPS5918867B2 (ja) | 1973-08-15 | 1973-08-15 | 半導体装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5040289A JPS5040289A (enrdf_load_stackoverflow) | 1975-04-12 |
JPS5918867B2 true JPS5918867B2 (ja) | 1984-05-01 |
Family
ID=14042387
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP48092007A Expired JPS5918867B2 (ja) | 1973-08-15 | 1973-08-15 | 半導体装置 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5918867B2 (enrdf_load_stackoverflow) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5544706A (en) * | 1978-09-25 | 1980-03-29 | Hitachi Ltd | Semiconductor device |
JPS59165434A (ja) * | 1983-03-11 | 1984-09-18 | Toshiba Corp | 半導体装置の製造方法 |
US5650820A (en) * | 1987-03-19 | 1997-07-22 | Canon Kabushiki Kaisha | Hand recording apparatus and movement guide therefor |
US4999016A (en) * | 1987-06-08 | 1991-03-12 | Canon Kabushiki Kaisha | Hand recording apparatus |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
NL170348C (nl) * | 1970-07-10 | 1982-10-18 | Philips Nv | Werkwijze voor het vervaardigen van een halfgeleiderinrichting, waarbij op een oppervlak van een halfgeleiderlichaam een tegen dotering en tegen thermische oxydatie maskerend masker wordt aangebracht, de door de vensters in het masker vrijgelaten delen van het oppervlak worden onderworpen aan een etsbehandeling voor het vormen van verdiepingen en het halfgeleiderlichaam met het masker wordt onderworpen aan een thermische oxydatiebehandeling voor het vormen van een oxydepatroon dat de verdiepingen althans ten dele opvult. |
US3796612A (en) * | 1971-08-05 | 1974-03-12 | Scient Micro Syst Inc | Semiconductor isolation method utilizing anisotropic etching and differential thermal oxidation |
-
1973
- 1973-08-15 JP JP48092007A patent/JPS5918867B2/ja not_active Expired
Also Published As
Publication number | Publication date |
---|---|
JPS5040289A (enrdf_load_stackoverflow) | 1975-04-12 |
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