JPS5918656A - 集積回路用基板の製造方法 - Google Patents

集積回路用基板の製造方法

Info

Publication number
JPS5918656A
JPS5918656A JP57127226A JP12722682A JPS5918656A JP S5918656 A JPS5918656 A JP S5918656A JP 57127226 A JP57127226 A JP 57127226A JP 12722682 A JP12722682 A JP 12722682A JP S5918656 A JPS5918656 A JP S5918656A
Authority
JP
Japan
Prior art keywords
substrate
nitride film
silicon
crystal silicon
single crystal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP57127226A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6244414B2 (cg-RX-API-DMAC10.html
Inventor
Akinobu Satou
佐藤　倬暢
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JIDO KEISOKU GIJUTSU KENKIYUUKUMIAI
Original Assignee
JIDO KEISOKU GIJUTSU KENKIYUUKUMIAI
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by JIDO KEISOKU GIJUTSU KENKIYUUKUMIAI filed Critical JIDO KEISOKU GIJUTSU KENKIYUUKUMIAI
Priority to JP57127226A priority Critical patent/JPS5918656A/ja
Publication of JPS5918656A publication Critical patent/JPS5918656A/ja
Publication of JPS6244414B2 publication Critical patent/JPS6244414B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H10P90/1906—
    • H10W10/061—
    • H10W10/181—
    • H10P90/191—

Landscapes

  • Local Oxidation Of Silicon (AREA)
  • Element Separation (AREA)
JP57127226A 1982-07-21 1982-07-21 集積回路用基板の製造方法 Granted JPS5918656A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57127226A JPS5918656A (ja) 1982-07-21 1982-07-21 集積回路用基板の製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57127226A JPS5918656A (ja) 1982-07-21 1982-07-21 集積回路用基板の製造方法

Publications (2)

Publication Number Publication Date
JPS5918656A true JPS5918656A (ja) 1984-01-31
JPS6244414B2 JPS6244414B2 (cg-RX-API-DMAC10.html) 1987-09-21

Family

ID=14954846

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57127226A Granted JPS5918656A (ja) 1982-07-21 1982-07-21 集積回路用基板の製造方法

Country Status (1)

Country Link
JP (1) JPS5918656A (cg-RX-API-DMAC10.html)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5439843A (en) * 1992-01-31 1995-08-08 Canon Kabushiki Kaisha Method for preparing a semiconductor substrate using porous silicon

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5439843A (en) * 1992-01-31 1995-08-08 Canon Kabushiki Kaisha Method for preparing a semiconductor substrate using porous silicon

Also Published As

Publication number Publication date
JPS6244414B2 (cg-RX-API-DMAC10.html) 1987-09-21

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