JPS59181535A - ネガレジストのパタ−ン形成方法 - Google Patents

ネガレジストのパタ−ン形成方法

Info

Publication number
JPS59181535A
JPS59181535A JP58053673A JP5367383A JPS59181535A JP S59181535 A JPS59181535 A JP S59181535A JP 58053673 A JP58053673 A JP 58053673A JP 5367383 A JP5367383 A JP 5367383A JP S59181535 A JPS59181535 A JP S59181535A
Authority
JP
Japan
Prior art keywords
ultraviolet rays
pattern
resist
lmr
dry etching
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP58053673A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0334053B2 (Sortimente
Inventor
Yoshio Yamashita
山下　吉雄
Takaharu Kawazu
河津　隆治
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Oki Electric Industry Co Ltd
Original Assignee
Oki Electric Industry Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Oki Electric Industry Co Ltd filed Critical Oki Electric Industry Co Ltd
Priority to JP58053673A priority Critical patent/JPS59181535A/ja
Priority to US06/594,481 priority patent/US4609615A/en
Priority to DE8484302145T priority patent/DE3466741D1/de
Priority to EP84302145A priority patent/EP0124265B1/en
Priority to CA000450963A priority patent/CA1214679A/en
Publication of JPS59181535A publication Critical patent/JPS59181535A/ja
Publication of JPH0334053B2 publication Critical patent/JPH0334053B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP58053673A 1983-03-31 1983-03-31 ネガレジストのパタ−ン形成方法 Granted JPS59181535A (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP58053673A JPS59181535A (ja) 1983-03-31 1983-03-31 ネガレジストのパタ−ン形成方法
US06/594,481 US4609615A (en) 1983-03-31 1984-03-27 Process for forming pattern with negative resist using quinone diazide compound
DE8484302145T DE3466741D1 (en) 1983-03-31 1984-03-29 Process for forming pattern with negative resist
EP84302145A EP0124265B1 (en) 1983-03-31 1984-03-29 Process for forming pattern with negative resist
CA000450963A CA1214679A (en) 1983-03-31 1984-03-30 Process for forming pattern with negative resist

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58053673A JPS59181535A (ja) 1983-03-31 1983-03-31 ネガレジストのパタ−ン形成方法

Publications (2)

Publication Number Publication Date
JPS59181535A true JPS59181535A (ja) 1984-10-16
JPH0334053B2 JPH0334053B2 (Sortimente) 1991-05-21

Family

ID=12949343

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58053673A Granted JPS59181535A (ja) 1983-03-31 1983-03-31 ネガレジストのパタ−ン形成方法

Country Status (1)

Country Link
JP (1) JPS59181535A (Sortimente)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6045243A (ja) * 1983-08-23 1985-03-11 Oki Electric Ind Co Ltd レジストパタ−ンの形成方法
JPS6045244A (ja) * 1983-08-23 1985-03-11 Oki Electric Ind Co Ltd レジストパタ−ンの形成方法
JPS6230322A (ja) * 1985-07-31 1987-02-09 Oki Electric Ind Co Ltd フオトレジストパタ−ンの形成方法
WO2011149035A1 (en) * 2010-05-25 2011-12-01 Fujifilm Corporation Pattern forming method and actinic-ray- or radiation-sensitive resin composition
WO2012114963A1 (ja) * 2011-02-23 2012-08-30 Jsr株式会社 ネガ型パターン形成方法及びフォトレジスト組成物

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5151939A (en) * 1974-10-31 1976-05-07 Canon Kk Saisenpataanyohotorejisutogenzoeki
JPS548304A (en) * 1977-06-20 1979-01-22 Toyo Tire & Rubber Co Ltd Radial tire
JPS5692536A (en) * 1979-12-27 1981-07-27 Fujitsu Ltd Pattern formation method

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5151939A (en) * 1974-10-31 1976-05-07 Canon Kk Saisenpataanyohotorejisutogenzoeki
JPS548304A (en) * 1977-06-20 1979-01-22 Toyo Tire & Rubber Co Ltd Radial tire
JPS5692536A (en) * 1979-12-27 1981-07-27 Fujitsu Ltd Pattern formation method

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6045243A (ja) * 1983-08-23 1985-03-11 Oki Electric Ind Co Ltd レジストパタ−ンの形成方法
JPS6045244A (ja) * 1983-08-23 1985-03-11 Oki Electric Ind Co Ltd レジストパタ−ンの形成方法
JPS6230322A (ja) * 1985-07-31 1987-02-09 Oki Electric Ind Co Ltd フオトレジストパタ−ンの形成方法
WO2011149035A1 (en) * 2010-05-25 2011-12-01 Fujifilm Corporation Pattern forming method and actinic-ray- or radiation-sensitive resin composition
JP2011248019A (ja) * 2010-05-25 2011-12-08 Fujifilm Corp パターン形成方法及び感活性光線性又は感放射線性樹脂組成物
US9760003B2 (en) 2010-05-25 2017-09-12 Fujifilm Corporation Pattern forming method and actinic-ray- or radiation-sensitive resin composition
WO2012114963A1 (ja) * 2011-02-23 2012-08-30 Jsr株式会社 ネガ型パターン形成方法及びフォトレジスト組成物
JPWO2012114963A1 (ja) * 2011-02-23 2014-07-07 Jsr株式会社 ネガ型パターン形成方法及びフォトレジスト組成物

Also Published As

Publication number Publication date
JPH0334053B2 (Sortimente) 1991-05-21

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