JPS59177367A - 試料搬送機構を有する真空蒸着装置 - Google Patents

試料搬送機構を有する真空蒸着装置

Info

Publication number
JPS59177367A
JPS59177367A JP58051253A JP5125383A JPS59177367A JP S59177367 A JPS59177367 A JP S59177367A JP 58051253 A JP58051253 A JP 58051253A JP 5125383 A JP5125383 A JP 5125383A JP S59177367 A JPS59177367 A JP S59177367A
Authority
JP
Japan
Prior art keywords
vacuum
sample
holding
tank
vacuum chamber
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP58051253A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6224502B2 (enrdf_load_stackoverflow
Inventor
Hiroshi Saeki
宏 佐伯
Tanejiro Ikeda
池田　種次郎
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP58051253A priority Critical patent/JPS59177367A/ja
Publication of JPS59177367A publication Critical patent/JPS59177367A/ja
Publication of JPS6224502B2 publication Critical patent/JPS6224502B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
JP58051253A 1983-03-25 1983-03-25 試料搬送機構を有する真空蒸着装置 Granted JPS59177367A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58051253A JPS59177367A (ja) 1983-03-25 1983-03-25 試料搬送機構を有する真空蒸着装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58051253A JPS59177367A (ja) 1983-03-25 1983-03-25 試料搬送機構を有する真空蒸着装置

Publications (2)

Publication Number Publication Date
JPS59177367A true JPS59177367A (ja) 1984-10-08
JPS6224502B2 JPS6224502B2 (enrdf_load_stackoverflow) 1987-05-28

Family

ID=12881780

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58051253A Granted JPS59177367A (ja) 1983-03-25 1983-03-25 試料搬送機構を有する真空蒸着装置

Country Status (1)

Country Link
JP (1) JPS59177367A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2002053795A1 (fr) * 2000-12-27 2002-07-11 Advantest Corporation Procede et dispositif d'application, dispositif d'exposition a un faisceau electronique, dispositif deflecteur et procede de production du dispositif deflecteur

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03101011U (enrdf_load_stackoverflow) * 1990-02-01 1991-10-22

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5526047U (enrdf_load_stackoverflow) * 1978-08-07 1980-02-20
JPS5698478A (en) * 1980-01-08 1981-08-07 Toshiba Corp Vacuum treating device
JPS5763678A (en) * 1980-10-03 1982-04-17 Hitachi Ltd Sputtering device

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5526047U (enrdf_load_stackoverflow) * 1978-08-07 1980-02-20
JPS5698478A (en) * 1980-01-08 1981-08-07 Toshiba Corp Vacuum treating device
JPS5763678A (en) * 1980-10-03 1982-04-17 Hitachi Ltd Sputtering device

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2002053795A1 (fr) * 2000-12-27 2002-07-11 Advantest Corporation Procede et dispositif d'application, dispositif d'exposition a un faisceau electronique, dispositif deflecteur et procede de production du dispositif deflecteur
JP2002198300A (ja) * 2000-12-27 2002-07-12 Advantest Corp 蒸着装置、蒸着方法、電子ビーム露光装置、偏向装置及び偏向装置の製造方法

Also Published As

Publication number Publication date
JPS6224502B2 (enrdf_load_stackoverflow) 1987-05-28

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