JPS59172742A - Manufacture of semiconductor logic circuit - Google Patents

Manufacture of semiconductor logic circuit

Info

Publication number
JPS59172742A
JPS59172742A JP4714683A JP4714683A JPS59172742A JP S59172742 A JPS59172742 A JP S59172742A JP 4714683 A JP4714683 A JP 4714683A JP 4714683 A JP4714683 A JP 4714683A JP S59172742 A JPS59172742 A JP S59172742A
Authority
JP
Japan
Prior art keywords
transistor
circuit
diode
ecl
ttl
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP4714683A
Other languages
Japanese (ja)
Inventor
Akira Yamagiwa
明 山際
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP4714683A priority Critical patent/JPS59172742A/en
Publication of JPS59172742A publication Critical patent/JPS59172742A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
    • H01L27/04Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body
    • H01L27/10Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a repetitive configuration
    • H01L27/118Masterslice integrated circuits
    • H01L27/11898Input and output buffer/driver structures

Landscapes

  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
  • Design And Manufacture Of Integrated Circuits (AREA)

Abstract

PURPOSE:To easily realize any kind of connection of CMOS circuit, TTL circuit and ECL circuit by forming P-MOS transitor, N-MOS transistor, bipolar transistor and diode which become basic elements in the particular format on a water. CONSTITUTION:First, a P-MOS transistor 1, an N-MOS transistor 2, a junction diode 3 which become basic elements and a baisic element A of junction type bipolar transistor 4 are formed on a wafer. These basic elements are wired into the circit, thereby forming any of the interface circuit B with TTL and the interface circuit C with ECL. Even when the disposition of basic elements is the same, the TTL interface and ECL interface circuits can be formed only in corresponding to the processes after the wiring and the master slice method can be employed.

Description

【発明の詳細な説明】 〔発明の利用分野〕 本発明は半導体論理回路の製造方法に関する。[Detailed description of the invention] [Field of application of the invention] The present invention relates to a method of manufacturing a semiconductor logic circuit.

〔従来技術〕  ゛ c M OS回路は半導体微細技術の進歩に伴い、急激
な高速化が達成され、電子機器の広汎な分野で匣用され
つつある。特に電子計算機等のディジタル装置において
は、従来のTTLl路やE、CL回路と6併用や置換が
可能となってきた。このようにc M OS回路が広(
用いられて(ると、TTLl路やECL回路とのインタ
ーフェイスが必要となる。インターフェイスとして、c
 M OS回路のドライブ能力を補うバイポーラトラン
ジスタを用いるBi−c M OS回路が知られている
。しかしこれは、cMO8出力回路の高速化としてのみ
提案されているか、又はc M OSとTTLやECL
とは出力レベルの一致や電源電圧との関係で、ある特定
の回路、例えばTTL回路のみに適合するインターフェ
イス回路となっており、TTL回路やECL回路との個
別対応の設計がなされてきた。
[Prior Art] With advances in semiconductor microtechnology, MOS circuits have rapidly increased in speed and are being used in a wide range of electronic devices. Particularly in digital devices such as electronic computers, it has become possible to use or replace conventional TTL1 circuits, E, and CL circuits. In this way, the cMOS circuit is wide (
(If used, an interface with the TTL circuit or ECL circuit is required.
Bi-c MOS circuits are known that use bipolar transistors to supplement the drive ability of MOS circuits. However, this has only been proposed as a speed-up of the cMO8 output circuit, or has been proposed for cMOS and TTL or ECL.
This is an interface circuit that is suitable only for a certain specific circuit, for example, a TTL circuit, in relation to output level matching and power supply voltage, and has been designed to be compatible with TTL circuits and ECL circuits.

〔発明の目的〕[Purpose of the invention]

本発明の目的はcMO8回路とTTLl路、ECLl路
とのいずれの接続にも容易に対応できる半導体fl*埋
回路の製造方法を提供することにある。
An object of the present invention is to provide a method for manufacturing a semiconductor fl* buried circuit that can easily accommodate the connection between a cMO8 circuit and either a TTLl path or an ECLl path.

〔発明の[要〕[Essentials of the invention]

本@明は、ウェハー上にpMOsトランジスタと、nM
OS)ランジスタと、バイポーラトランジスタとおよび
ダイオ−ドとを形成するステップと、上記pMO8)ラ
ンジスタとpMO8)ランジスタでcMOsインバータ
回路を構成すると共に、該インバータ回路のpMOSト
ランジスタと高位電源端子との間に上記ダイオードと、
ベースとコレクタを接続した上記バイポーラトランジス
タとを直列接続する配線か、上記pMO8)ランジスタ
とnMOsトランジスタでcMOsインバータ回路を構
成すると共に、該インバータ回路のpMO8)ランジス
タと上記ダイオードのアノードと上記バイポーラトラン
ジスタのコレクタとを上記高位電源端子に、上記インバ
ータ回路の出力を上記ダイオードのカノードおよび上記
バイポーラトランジスタのベースにそれぞれ接続して上
記バイポーラトランジスタのエミッタを最終出方とする
配線かのいずれか一方を選択して配線を行なうステップ
からなる半導体論理回路の製造方法を特致とする。
This @Akira has pMOS transistors and nM transistors on the wafer.
OS) A step of forming a transistor, a bipolar transistor, and a diode, configuring a cMOS inverter circuit with the pMO8) transistor and the pMO8) transistor, and forming a cMOS inverter circuit between the pMOS transistor of the inverter circuit and a high-level power supply terminal. The above diode and
Either the wiring connects the bipolar transistor whose base and collector are connected in series, or the pMO8) transistor and the nMOS transistor constitute a cMOS inverter circuit, and the inverter circuit's pMO8) transistor, the anode of the diode, and the bipolar transistor Select one of two wirings: connect the collector to the high-level power supply terminal, connect the output of the inverter circuit to the cathode of the diode and the base of the bipolar transistor, and connect the emitter of the bipolar transistor as the final output. The specialty of this paper is a method for manufacturing semiconductor logic circuits, which consists of the steps of wiring.

〔発明の実施例〕[Embodiments of the invention]

以下本発明の実施例を図面を3照して詳細に説明する。 Embodiments of the present invention will be described in detail below with reference to the drawings.

まず、ウェハー上に第1図に示すとと(、基本素子とな
るpMO8(p  channel  Metal 0
xide  Sem1conductor ) トラン
ジスタ1、n M O8(n  channel  M
etal  0xide  Sem1conducto
r)  トランジスタ2、接合ダイオード8、および接
合型バイポーラトランジスタ4の基本素子を形成する。
First, as shown in FIG. 1, a basic element pMO8 (p channel Metal 0
xide Sem1conductor ) Transistor 1, n M O8 (n channel M
etal Oxide Sem1conducto
r) forming the basic elements of the transistor 2, the junction diode 8 and the junction bipolar transistor 4;

そしてこれら基本菓子を第2図に示す回路、または第8
肉に示す回路のいずれかに配線し、第2図に示すTTL
とのインターフェイス回路、第8図に示すECLとのイ
ンターフェイス回路のいずれかを構成する。
These basic confections can be connected to the circuit shown in Figure 2 or the circuit shown in Figure 8.
Wire to either of the circuits shown in the figure and connect the TTL shown in Figure 2.
An interface circuit with the ECL shown in FIG. 8 is configured.

これによれば、マスタスライス的手法の採用により、同
一の基本素子を使って、TTL、ECLいずれのインタ
ーフェイス回路を構成することができる。
According to this, by employing the master slice method, it is possible to configure either a TTL or ECL interface circuit using the same basic element.

第2図を参照するに、pMO,s)ジンジスタlとnM
OS)ランジスタ2でcM、OSインバータ回路を構成
する。このインバータ回路のpMOsトランジスタ1と
高位の゛電源端子vDDとの間に接合ダイオード、8と
、ベースとコレクタが接続されてダイオード接続された
バイポーラトランジスタ4とを直列接続する。nMOS
)ランジスタ2は低位の電源端子vssに接続される。
Referring to Figure 2, pMO, s) gingista l and nM
OS) The transistor 2 constitutes a cM, OS inverter circuit. A junction diode 8 and a diode-connected bipolar transistor 4 whose base and collector are connected are connected in series between the pMOS transistor 1 of this inverter circuit and a high-level power supply terminal vDD. nMOS
) The transistor 2 is connected to the low power supply terminal vss.

第2図の回路によると、入力INがローレベル時、pM
O8)ランジスタ1がオンし、出力OUTはハイレベル
となる。逆にINがハイレベル時、nMOS)ランジス
タ2がオンし、OU Tは四−レベルとなる。cMOs
インバータ回路への高位電源の電圧はダイオード8およ
びトランジスタ4による電圧B VBK; 1.5 V
だけ低くなる。VDDおよびvssをTTL回路の電源
電圧と同じ値であるVDD−5V、vs、=Ovとすル
ト、OUTの出力ハイレベルは3.5  V、 出力ロ
ーレベルはOvとなる。蛇って、第2図の回路によると
、TTL回路の電源電圧と同じ値を使って、ダイオード
8およびトランジスタ4をc M OSインバータ回路
の高位電源側に接続することによって、従来のVDDに
MOSを直結した場合に比べてハイレベルの改善がなさ
れる。信号振幅は約3.5 vの適正値になり、5Vの
場合に比べて、過渡応答の数置だけでな(、電流変化ノ
イズや結合ノイズを小さくすること力覧でき−る。さら
に直装なことは、Xν10Sデバイスは微細化((伴い
耐圧低下が問題となる。第2図の回路でvDDは従来の
5Vで使用して21:、、素子耐圧は3.5■ですむた
め、きわめて有利である。
According to the circuit shown in Figure 2, when the input IN is at low level, pM
O8) The transistor 1 is turned on and the output OUT becomes high level. Conversely, when IN is at high level, nMOS transistor 2 is turned on and OUT is at the 4-level. cMOs
The voltage of the high-level power supply to the inverter circuit is the voltage B VBK due to diode 8 and transistor 4; 1.5 V
only becomes lower. When VDD and vss are set to the same value as the power supply voltage of the TTL circuit, VDD-5V, vs, = Ov, the output high level of the power output and OUT becomes 3.5 V, and the output low level becomes Ov. According to the circuit of FIG. 2, by connecting the diode 8 and the transistor 4 to the high power supply side of the CMOS inverter circuit using the same value as the power supply voltage of the TTL circuit, the conventional VDD can be connected to the MOS A high level of improvement is achieved compared to the case of direct connection. The signal amplitude becomes an appropriate value of approximately 3.5 V, and compared to the case of 5 V, it can be seen that not only the transient response (current change noise and coupling noise) is reduced. The thing is that the Xν10S device is miniaturized ((with this comes the problem of a drop in breakdown voltage. In the circuit shown in Figure 2, vDD is used at the conventional 5V, and the element breakdown voltage is only 3.5V, so it is extremely It's advantageous.

第8図を参照するに、第2図と同様、pMOsトランジ
スタ1とnMOS)ランジスタ2でc MOSインバー
タ回路を構成する。このpMO8)ランジスタ1を高位
のt線端子vDDに、nMOsトランジスタ2を低位の
′#t#端子vssFc接続する。
Referring to FIG. 8, similarly to FIG. 2, a pMOS transistor 1 and an nMOS transistor 2 constitute a cMOS inverter circuit. This pMO8) transistor 1 is connected to the high-level t-line terminal vDD, and the nMOS transistor 2 is connected to the low-level '#t# terminal vssFc.

さらに高位の電源−子VDDにパイボーラトランジスタ
4のコレクタを、バイポーラトランジスタ40ベースに
c M OSインバータ回路の出力を接続し、エミッタ
を出力端子OUTに接続し、トランジスタ4のエミッタ
からE CLレベル出力を」収出すようにする。さらに
高位の社線端子vDDとバイポーラトランジスタ4の゛
ベース間にダイオード8を接続して、ローレベルをクラ
ンプするようにする。
Furthermore, the collector of the piebola transistor 4 is connected to the higher power supply terminal VDD, the output of the CMOS inverter circuit is connected to the base of the bipolar transistor 40, the emitter is connected to the output terminal OUT, and the emitter of the transistor 4 outputs an ECL level. ”. Furthermore, a diode 8 is connected between the high-level wire terminal vDD and the base of the bipolar transistor 4 to clamp the low level.

第8図の回路によると、入力I−Nがローレベル時、p
MOSトランジスタ1がオンし、c M OSインバー
タ回路の出力がハイレベルになることにより、バイポー
ラトランジスタ会もオンし、出力OUTはハイレベルと
なる。逆に入力INがハイレベル時、11M0Sトラン
ジスタ2がオンし、CMOSインバータ回路の出力がロ
ーレベルとなり、バイポーラトランジスタ委がオフとな
り、出力OUTはローレしくルとなる。この回路の場合
、VDD=Ov1v、5−−2vと通常(7,)ECL
回Mの終端抵抗”TTを用いることができる。従って°
rTLの場合のように耐圧上の問題はない。
According to the circuit shown in FIG. 8, when input I-N is at low level, p
When the MOS transistor 1 is turned on and the output of the cMOS inverter circuit becomes high level, the bipolar transistor circuit is also turned on, and the output OUT becomes high level. Conversely, when the input IN is at a high level, the 11M0S transistor 2 is turned on, the output of the CMOS inverter circuit is at a low level, the bipolar transistor circuit is turned off, and the output OUT is at a low level. For this circuit, VDD=Ov1v, 5--2v and normal (7,) ECL
A terminating resistor "TT" of times M can be used. Therefore, °
Unlike the case of rTL, there is no problem with voltage resistance.

このように、第1図のごとく基本素子の配置を同一にし
ておいても、配線工程以降の対応だけで、TTI、イン
ターフエ1スおよびECLインターフェイスの回路が”
J能となり、マスタースライス的手法を採用することが
できる。また第2図に2」クシたTTLインターフェイ
ス回路では、通常の5v電源を使用しても耐圧ネックと
はならず、微細化を進めることが可能となる。
In this way, even if the layout of the basic elements is the same as shown in Figure 1, the TTI, interface 1, and ECL interface circuits can be changed just by taking steps after the wiring process.
J ability and can adopt master slice techniques. In addition, in the TTL interface circuit shown in FIG. 2, which has a 2" comb, even if a normal 5V power supply is used, there is no breakdown voltage bottleneck, and it is possible to advance miniaturization.

第4図は第2図の変形例であり、基本的な動作は第2図
と同様である。
FIG. 4 is a modification of FIG. 2, and the basic operation is the same as that in FIG. 2.

〔発明の効呆〕[Efficacy of invention]

不発明によオLば、c M OS回路とT ’I’ L
回路、ECL回路とのいずれの接続にも容易に河応″:
i−ることができる。
Due to non-invention, cMOS circuit and T'I'L
Easily compatible with both circuits and ECL circuits:
i- can do it.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は不発明の一実施例による基本素子構成を示す図
、第2図は第1図の基本素子によるTTLインターンエ
イス回路を示す図、第8図は第1図の基本素子によるE
 CLインターフニーイス回路を示す図、第4図は第2
図の変形例な示す図である。 1・・・pMOSトランジスタ、2・・・nMO8)ラ
ンジスタ、8・・・ダイオード、4・・・バイポーラト
ランジスタ。 ■DD ss
FIG. 1 is a diagram showing a basic element configuration according to an embodiment of the invention, FIG. 2 is a diagram showing a TTL intern eighth circuit using the basic elements shown in FIG. 1, and FIG. 8 is a diagram showing an E
A diagram showing the CL interface circuit, Figure 4 is the second
It is a figure which shows the modification of a figure. 1... pMOS transistor, 2... nMO8) transistor, 8... diode, 4... bipolar transistor. ■DD ss

Claims (1)

【特許請求の範囲】[Claims] +1)  ウェハー上にpMOSトランジスタと、nM
OSトランジスタと、バイポーラトランジスタと、およ
びダイオードとを形成するステップと、上記pMO8)
ランジスタとnMO8)ランジスタでcMOSインバー
タ回路を構成すると共に、上記バイポーラトランジスタ
と上記ダイオードを直列に接続して両者の電圧降下の相
が得られ、T’rLレベルに合うように上記インバータ
回路と接続する配線か、あるいは、上記pMOSトラン
ジスタとnMO8)ランジスタでCバイポーラトランジ
スタが上記ダイオードで振幅制限クランプされるエミッ
タホロワ動作となり、ECLレベルと合うように上記イ
ンバータ回路と接続する配線のいずれか一方を選択して
配線を行うステップとからなる半導体論理回路の製造方
法。
+1) pMOS transistor and nM transistor on wafer
forming an OS transistor, a bipolar transistor, and a diode, and the above pMO8)
A cMOS inverter circuit is configured with a transistor and nMO8) The transistor is connected in series with the bipolar transistor and the diode to obtain a voltage drop phase between the two, which is connected to the inverter circuit to match the T'rL level. Either the wiring or the above pMOS transistor and nMO8) transistor, the C bipolar transistor operates as an emitter follower where the amplitude is limited and clamped by the above diode, and select either one of the wirings to be connected to the above inverter circuit so as to match the ECL level. A method for manufacturing a semiconductor logic circuit, which comprises a step of performing wiring.
JP4714683A 1983-03-23 1983-03-23 Manufacture of semiconductor logic circuit Pending JPS59172742A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4714683A JPS59172742A (en) 1983-03-23 1983-03-23 Manufacture of semiconductor logic circuit

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4714683A JPS59172742A (en) 1983-03-23 1983-03-23 Manufacture of semiconductor logic circuit

Publications (1)

Publication Number Publication Date
JPS59172742A true JPS59172742A (en) 1984-09-29

Family

ID=12766957

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4714683A Pending JPS59172742A (en) 1983-03-23 1983-03-23 Manufacture of semiconductor logic circuit

Country Status (1)

Country Link
JP (1) JPS59172742A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01260692A (en) * 1988-04-12 1989-10-17 Hitachi Ltd Semiconductor integrated circuit device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01260692A (en) * 1988-04-12 1989-10-17 Hitachi Ltd Semiconductor integrated circuit device

Similar Documents

Publication Publication Date Title
JPS63187728A (en) Electric circuit
US4851721A (en) Semiconductor integrated circuit
US5214317A (en) CMOS to ECL translator with incorporated latch
JPH07240678A (en) Semiconductor integrated circuit
EP0068883A2 (en) A level converter circuit
JPS59121854A (en) Semiconductor lsi device
KR0138949B1 (en) Semiconductor device having cmos circuit and bipolar circuit mixed
JPH08139579A (en) Current source and semiconductor integrated circuit device
JPS59172742A (en) Manufacture of semiconductor logic circuit
EP0450453B1 (en) BICMOS input circuit for detecting signals out of ECL range
JPS6070822A (en) Semiconductor integrated circuit
EP0326952A2 (en) Bipolar-CMOS interface circuit
JP3165751B2 (en) Semiconductor integrated circuit device
JPS58130557A (en) C-mos device
JPH06326593A (en) Semiconductor integrated circuit device
KR0142001B1 (en) Mosfet interface circuit having an increased or a reduced mutual conductance
JP2590681B2 (en) Semiconductor logic circuit device
JPH1127133A (en) Semiconductor integrated circuit
JPH098638A (en) Cmos input/output buffer circuit
JPH0481120A (en) Cmos level shift circuit
JP2738277B2 (en) Interface circuit
JP4119076B2 (en) Reference voltage generation circuit
JPH0513542B2 (en)
JP2754673B2 (en) ECL-TTL level conversion circuit
JPH06334124A (en) Semiconductor integrated circuit