JPS59172724A - マーク検出装置 - Google Patents

マーク検出装置

Info

Publication number
JPS59172724A
JPS59172724A JP58048091A JP4809183A JPS59172724A JP S59172724 A JPS59172724 A JP S59172724A JP 58048091 A JP58048091 A JP 58048091A JP 4809183 A JP4809183 A JP 4809183A JP S59172724 A JPS59172724 A JP S59172724A
Authority
JP
Japan
Prior art keywords
beams
alignment
sheet
mark
mask
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP58048091A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0141249B2 (de
Inventor
Hideki Ine
秀樹 稲
Hiroshi Shinkai
洋 新開
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP58048091A priority Critical patent/JPS59172724A/ja
Priority to US06/589,341 priority patent/US4669883A/en
Priority to DE3410421A priority patent/DE3410421C2/de
Priority to GB08407502A priority patent/GB2139753B/en
Publication of JPS59172724A publication Critical patent/JPS59172724A/ja
Publication of JPH0141249B2 publication Critical patent/JPH0141249B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7065—Production of alignment light, e.g. light source, control of coherence, polarization, pulse length, wavelength
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7023—Aligning or positioning in direction perpendicular to substrate surface
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7069—Alignment mark illumination, e.g. darkfield, dual focus
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Control Of Position Or Direction (AREA)
JP58048091A 1983-03-22 1983-03-22 マーク検出装置 Granted JPS59172724A (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP58048091A JPS59172724A (ja) 1983-03-22 1983-03-22 マーク検出装置
US06/589,341 US4669883A (en) 1983-03-22 1984-03-14 Method and apparatus for alignment
DE3410421A DE3410421C2 (de) 1983-03-22 1984-03-21 Verfahren und Vorrichtung zum Erfassen einer linienförmigen ersten Markierung und einer linienförmigen zweiten Markierung
GB08407502A GB2139753B (en) 1983-03-22 1984-03-22 Sensing relative position of alignment marks

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58048091A JPS59172724A (ja) 1983-03-22 1983-03-22 マーク検出装置

Publications (2)

Publication Number Publication Date
JPS59172724A true JPS59172724A (ja) 1984-09-29
JPH0141249B2 JPH0141249B2 (de) 1989-09-04

Family

ID=12793643

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58048091A Granted JPS59172724A (ja) 1983-03-22 1983-03-22 マーク検出装置

Country Status (4)

Country Link
US (1) US4669883A (de)
JP (1) JPS59172724A (de)
DE (1) DE3410421C2 (de)
GB (1) GB2139753B (de)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61100817A (ja) * 1984-10-22 1986-05-19 Canon Inc 位置合わせ方法

Families Citing this family (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4937459A (en) * 1984-11-16 1990-06-26 Canon Kabushiki Kaisha Alignment signal detecting device
US4913328A (en) * 1987-06-05 1990-04-03 Odetics, Inc. Active tape tracking system with crown guide rollers for magnetic recorder/players
JPH0743245B2 (ja) * 1987-07-03 1995-05-15 キヤノン株式会社 アライメント装置
JPH0315018A (ja) * 1989-01-13 1991-01-23 Dainippon Screen Mfg Co Ltd 画像走査記録装置のレーザ露光装置
JP2940055B2 (ja) * 1990-02-28 1999-08-25 ソニー株式会社 レーザ描画装置
JP3093337B2 (ja) * 1991-07-15 2000-10-03 キヤノン株式会社 走査光学装置
JP3306972B2 (ja) * 1993-02-26 2002-07-24 キヤノン株式会社 位置検出装置及びそれを用いた半導体素子の製造方法
US5659384A (en) * 1993-04-09 1997-08-19 Canon Kabushiki Kaisha Position detection apparatus and method
KR960024689A (ko) * 1994-12-01 1996-07-20 오노 시게오 광학 장치
JP3303595B2 (ja) * 1995-03-24 2002-07-22 キヤノン株式会社 照明装置及びそれを用いた観察装置
KR0186068B1 (ko) * 1995-12-27 1999-04-01 문정환 리소그라피 장치의 위치 정렬 시스템
US5943089A (en) * 1996-08-23 1999-08-24 Speedline Technologies, Inc. Method and apparatus for viewing an object and for viewing a device that acts upon the object
JP4208277B2 (ja) * 1997-11-26 2009-01-14 キヤノン株式会社 露光方法及び露光装置
CN1098164C (zh) * 1998-03-04 2003-01-08 大霸电子股份有限公司 喷嘴头墨水舱厚膜曝光对位的方法
US6493065B2 (en) 2000-05-30 2002-12-10 Canon Kabushiki Kaisha Alignment system and alignment method in exposure apparatus
JP2002353099A (ja) 2001-05-22 2002-12-06 Canon Inc 位置検出方法及び装置及び露光装置及びデバイス製造方法
US6853652B2 (en) * 2001-06-27 2005-02-08 Quantum Corporation Spatial filtering of laser ghosts
JP4006217B2 (ja) * 2001-10-30 2007-11-14 キヤノン株式会社 露光方法、露光装置及びデバイスの製造方法
JP4353498B2 (ja) 2002-04-30 2009-10-28 キヤノン株式会社 管理装置及び方法、デバイス製造方法、並びにコンピュータプログラム
JP2003324055A (ja) * 2002-04-30 2003-11-14 Canon Inc 管理システム及び装置及び方法並びに露光装置及びその制御方法
JP4018438B2 (ja) 2002-04-30 2007-12-05 キヤノン株式会社 半導体露光装置を管理する管理システム
US7069104B2 (en) * 2002-04-30 2006-06-27 Canon Kabushiki Kaisha Management system, management apparatus, management method, and device manufacturing method
JP4095391B2 (ja) * 2002-09-24 2008-06-04 キヤノン株式会社 位置検出方法
JP4795300B2 (ja) * 2006-04-18 2011-10-19 キヤノン株式会社 位置合わせ方法、インプリント方法、位置合わせ装置、インプリント装置、及び位置計測方法

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55157230A (en) * 1979-05-28 1980-12-06 Hitachi Ltd Pattern position detector

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3683195A (en) * 1971-03-22 1972-08-08 Kasper Instruments Apparatus for the automatic alignment of two superimposed objects,e.g. a semiconductor wafer and mask
US4070117A (en) * 1972-06-12 1978-01-24 Kasper Instruments, Inc. Apparatus for the automatic alignment of two superimposed objects, e.g. a semiconductor wafer and mask
JPS51140488A (en) * 1975-05-30 1976-12-03 Hitachi Ltd Mask alignment device
US4199219A (en) * 1977-04-22 1980-04-22 Canon Kabushiki Kaisha Device for scanning an object with a light beam
DE2843282A1 (de) * 1977-10-05 1979-04-12 Canon Kk Fotoelektrische erfassungsvorrichtung
US4277178A (en) * 1980-01-15 1981-07-07 Ford Aerospace & Communications Corp. Web element concentration detection system
JPS5719726A (en) * 1980-07-10 1982-02-02 Nippon Kogaku Kk <Nikon> Positioning device
JPS5852825A (ja) * 1981-09-24 1983-03-29 Canon Inc 位置合わせ信号処理装置
JPS5854648A (ja) * 1981-09-28 1983-03-31 Nippon Kogaku Kk <Nikon> 位置合わせ装置
JPS5882248A (ja) * 1981-11-12 1983-05-17 Canon Inc 自動整合装置

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55157230A (en) * 1979-05-28 1980-12-06 Hitachi Ltd Pattern position detector

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61100817A (ja) * 1984-10-22 1986-05-19 Canon Inc 位置合わせ方法

Also Published As

Publication number Publication date
DE3410421A1 (de) 1984-09-27
GB2139753B (en) 1987-01-14
GB8407502D0 (en) 1984-05-02
DE3410421C2 (de) 1995-12-07
GB2139753A (en) 1984-11-14
JPH0141249B2 (de) 1989-09-04
US4669883A (en) 1987-06-02

Similar Documents

Publication Publication Date Title
JPS59172724A (ja) マーク検出装置
US5072126A (en) Promixity alignment using polarized illumination and double conjugate projection lens
JP2514037B2 (ja) 検知光学系
US4371264A (en) Optical system for aligning two patterns and photo-repeater using such a system
JPS6011325B2 (ja) 走査装置
JPH04232951A (ja) 面状態検査装置
US4641035A (en) Apparatus and a method for position detection of an object stepped portion
JP2634620B2 (ja) 投影式露光方法およびその装置
JPH11265847A (ja) 位置検出方法及び位置検出装置
JPH0117245B2 (de)
JPS61121437A (ja) 投影型露光装置
JPS6356917A (ja) 投影露光装置
JPH0479128B2 (de)
JPS61134022A (ja) 位置合せ信号検出装置
JPH0715366B2 (ja) 物体位置検出光学装置
JP3004303B2 (ja) 露光方法及びその装置
JPH04339245A (ja) 表面状態検査装置
JPH08124830A (ja) 投影露光装置
JPH07104131B2 (ja) 回折光の分離方法および分離装置
JPH0516649B2 (de)
JPS63187102A (ja) パタ−ン検出装置
JPS6262519A (ja) 位置検出装置
JPS6052024A (ja) 位置検出装置
JPS60220932A (ja) 位置整合装置
JPS63153820A (ja) 投影露光装置