JPS59164615A - シラン精製方法 - Google Patents

シラン精製方法

Info

Publication number
JPS59164615A
JPS59164615A JP3798383A JP3798383A JPS59164615A JP S59164615 A JPS59164615 A JP S59164615A JP 3798383 A JP3798383 A JP 3798383A JP 3798383 A JP3798383 A JP 3798383A JP S59164615 A JPS59164615 A JP S59164615A
Authority
JP
Japan
Prior art keywords
silane
container
silicon
liquefied
vessel
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP3798383A
Other languages
English (en)
Japanese (ja)
Other versions
JPS631242B2 (enrdf_load_stackoverflow
Inventor
Shunpei Yamazaki
舜平 山崎
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Semiconductor Energy Laboratory Co Ltd
Original Assignee
Semiconductor Energy Laboratory Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Semiconductor Energy Laboratory Co Ltd filed Critical Semiconductor Energy Laboratory Co Ltd
Priority to JP3798383A priority Critical patent/JPS59164615A/ja
Publication of JPS59164615A publication Critical patent/JPS59164615A/ja
Publication of JPS631242B2 publication Critical patent/JPS631242B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Silicon Compounds (AREA)
JP3798383A 1983-03-08 1983-03-08 シラン精製方法 Granted JPS59164615A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3798383A JPS59164615A (ja) 1983-03-08 1983-03-08 シラン精製方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3798383A JPS59164615A (ja) 1983-03-08 1983-03-08 シラン精製方法

Publications (2)

Publication Number Publication Date
JPS59164615A true JPS59164615A (ja) 1984-09-17
JPS631242B2 JPS631242B2 (enrdf_load_stackoverflow) 1988-01-12

Family

ID=12512797

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3798383A Granted JPS59164615A (ja) 1983-03-08 1983-03-08 シラン精製方法

Country Status (1)

Country Link
JP (1) JPS59164615A (enrdf_load_stackoverflow)

Also Published As

Publication number Publication date
JPS631242B2 (enrdf_load_stackoverflow) 1988-01-12

Similar Documents

Publication Publication Date Title
KR20070010022A (ko) 저농도 지르코늄의 하프늄 할라이드 조성물
US6794315B1 (en) Ultrathin oxide films on semiconductors
US8043980B2 (en) Methods for making and using halosilylgermanes
US6712908B2 (en) Purified silicon production system
KR20130130416A (ko) 고순도의 저메인 생성방법 및 생성장치
JP3592218B2 (ja) 水晶薄膜の製造方法
US4717602A (en) Method for producing silicon nitride layers
JPS59164615A (ja) シラン精製方法
CN115044980A (zh) 一种利用化学气相沉积法制备二硫化钼钨单晶的方法
Tripathi et al. A study of the OMVPE growth mechanisms using internal reflectance spectroscopy to examine adsorption of TMGa and NH3 and surface reactions between them
US3916041A (en) Method of depositing titanium dioxide films by chemical vapor deposition
WO2000067300A1 (en) Liquid precursors for formation of materials containing alkali metals
US5906861A (en) Apparatus and method for depositing borophosphosilicate glass on a substrate
JPS59164616A (ja) シラン精製方法
JP3836553B2 (ja) シリコン系絶縁膜の製造方法
JPS6145707B2 (enrdf_load_stackoverflow)
JP4287942B2 (ja) アルコキシドの精製方法
Desu et al. Low temperature CVD of SiO2 films using novel precursors
CN103205727A (zh) 非晶硅光学薄膜折射率调节方法
JPH02259074A (ja) Cvd方法および装置
US6100415A (en) Purified alkoxide and process for purifying crude alkoxide
JPS59162116A (ja) シリコン被膜作製方法
Borah et al. Facile Synthesis of Vertically Aligned MoS2 Nanosheets at Ambient Pressure
Zhuang et al. Hafnium Nitrate Precursor Synthesis and HfO 2 Thin Film Deposition
JPS58223612A (ja) アモルフアスシリコン膜生成装置