JPS59157281A - スパツタリング装置 - Google Patents

スパツタリング装置

Info

Publication number
JPS59157281A
JPS59157281A JP2846883A JP2846883A JPS59157281A JP S59157281 A JPS59157281 A JP S59157281A JP 2846883 A JP2846883 A JP 2846883A JP 2846883 A JP2846883 A JP 2846883A JP S59157281 A JPS59157281 A JP S59157281A
Authority
JP
Japan
Prior art keywords
charging
workpiece
sputtering
sputtered film
discharging
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2846883A
Other languages
English (en)
Japanese (ja)
Other versions
JPS621472B2 (enrdf_load_stackoverflow
Inventor
Hidetaka Jo
城　英孝
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokuda Seisakusho Co Ltd
Original Assignee
Tokuda Seisakusho Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokuda Seisakusho Co Ltd filed Critical Tokuda Seisakusho Co Ltd
Priority to JP2846883A priority Critical patent/JPS59157281A/ja
Publication of JPS59157281A publication Critical patent/JPS59157281A/ja
Publication of JPS621472B2 publication Critical patent/JPS621472B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/568—Transferring the substrates through a series of coating stations

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Physical Vapour Deposition (AREA)
JP2846883A 1983-02-24 1983-02-24 スパツタリング装置 Granted JPS59157281A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2846883A JPS59157281A (ja) 1983-02-24 1983-02-24 スパツタリング装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2846883A JPS59157281A (ja) 1983-02-24 1983-02-24 スパツタリング装置

Publications (2)

Publication Number Publication Date
JPS59157281A true JPS59157281A (ja) 1984-09-06
JPS621472B2 JPS621472B2 (enrdf_load_stackoverflow) 1987-01-13

Family

ID=12249480

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2846883A Granted JPS59157281A (ja) 1983-02-24 1983-02-24 スパツタリング装置

Country Status (1)

Country Link
JP (1) JPS59157281A (enrdf_load_stackoverflow)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2594102A1 (fr) * 1986-02-12 1987-08-14 Stein Heurtey Installation flexible automatisee de traitement thermochimique rapide
US5021138A (en) * 1985-01-17 1991-06-04 Babu Suryadevara V Side source center sink plasma reactor
US6413381B1 (en) 2000-04-12 2002-07-02 Steag Hamatech Ag Horizontal sputtering system
JP2012512321A (ja) * 2008-12-15 2012-05-31 ギューリング オッフェネ ハンデルスゲゼルシャフト 基材コンポーネントの表面処理及び／又はコーティング用の装置
CN109468609A (zh) * 2017-09-07 2019-03-15 芝浦机械电子装置株式会社 成膜装置

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5021138A (en) * 1985-01-17 1991-06-04 Babu Suryadevara V Side source center sink plasma reactor
FR2594102A1 (fr) * 1986-02-12 1987-08-14 Stein Heurtey Installation flexible automatisee de traitement thermochimique rapide
US4790750A (en) * 1986-02-12 1988-12-13 Stein Heurtey Automated flexible installation for a rapid thermochemical treatment
US6413381B1 (en) 2000-04-12 2002-07-02 Steag Hamatech Ag Horizontal sputtering system
WO2001079582A3 (en) * 2000-04-12 2002-07-04 Steag Hamatech Ag Horizontal sputtering system
JP2012512321A (ja) * 2008-12-15 2012-05-31 ギューリング オッフェネ ハンデルスゲゼルシャフト 基材コンポーネントの表面処理及び／又はコーティング用の装置
CN109468609A (zh) * 2017-09-07 2019-03-15 芝浦机械电子装置株式会社 成膜装置
US10903059B2 (en) 2017-09-07 2021-01-26 Shibaura Mechatronics Corporation Film formation apparatus
CN109468609B (zh) * 2017-09-07 2021-08-27 芝浦机械电子装置株式会社 成膜装置

Also Published As

Publication number Publication date
JPS621472B2 (enrdf_load_stackoverflow) 1987-01-13

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