JPS59157279A - 薄膜蒸着装置 - Google Patents

薄膜蒸着装置

Info

Publication number
JPS59157279A
JPS59157279A JP24258883A JP24258883A JPS59157279A JP S59157279 A JPS59157279 A JP S59157279A JP 24258883 A JP24258883 A JP 24258883A JP 24258883 A JP24258883 A JP 24258883A JP S59157279 A JPS59157279 A JP S59157279A
Authority
JP
Japan
Prior art keywords
thin film
evaporated
evaporation source
vacuum chamber
counter electrode
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP24258883A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0216380B2 (enrdf_load_stackoverflow
Inventor
Wasaburo Oota
太田　和三郎
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ricoh Co Ltd
Original Assignee
Ricoh Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ricoh Co Ltd filed Critical Ricoh Co Ltd
Priority to JP24258883A priority Critical patent/JPS59157279A/ja
Publication of JPS59157279A publication Critical patent/JPS59157279A/ja
Publication of JPH0216380B2 publication Critical patent/JPH0216380B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
JP24258883A 1983-12-22 1983-12-22 薄膜蒸着装置 Granted JPS59157279A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP24258883A JPS59157279A (ja) 1983-12-22 1983-12-22 薄膜蒸着装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP24258883A JPS59157279A (ja) 1983-12-22 1983-12-22 薄膜蒸着装置

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP17969783A Division JPS5989763A (ja) 1983-09-28 1983-09-28 薄膜蒸着装置

Publications (2)

Publication Number Publication Date
JPS59157279A true JPS59157279A (ja) 1984-09-06
JPH0216380B2 JPH0216380B2 (enrdf_load_stackoverflow) 1990-04-17

Family

ID=17091286

Family Applications (1)

Application Number Title Priority Date Filing Date
JP24258883A Granted JPS59157279A (ja) 1983-12-22 1983-12-22 薄膜蒸着装置

Country Status (1)

Country Link
JP (1) JPS59157279A (enrdf_load_stackoverflow)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1987007916A1 (en) * 1986-06-18 1987-12-30 Ricoh Company, Ltd. Thin film forming apparatus
US4974544A (en) * 1986-10-07 1990-12-04 Ricoh Company, Co. Vapor deposition apparatus
US4982696A (en) * 1988-01-08 1991-01-08 Ricoh Company, Ltd. Apparatus for forming thin film
US5114559A (en) * 1989-09-26 1992-05-19 Ricoh Company, Ltd. Thin film deposition system
US5133849A (en) * 1988-12-12 1992-07-28 Ricoh Company, Ltd. Thin film forming apparatus

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1987007916A1 (en) * 1986-06-18 1987-12-30 Ricoh Company, Ltd. Thin film forming apparatus
GB2204596A (en) * 1986-06-18 1988-11-16 Ricoh Kk Thin film forming apparatus
GB2204596B (en) * 1986-06-18 1991-04-03 Ricoh Kk Thin film forming apparatus
US4974544A (en) * 1986-10-07 1990-12-04 Ricoh Company, Co. Vapor deposition apparatus
US4982696A (en) * 1988-01-08 1991-01-08 Ricoh Company, Ltd. Apparatus for forming thin film
US5133849A (en) * 1988-12-12 1992-07-28 Ricoh Company, Ltd. Thin film forming apparatus
US5114559A (en) * 1989-09-26 1992-05-19 Ricoh Company, Ltd. Thin film deposition system

Also Published As

Publication number Publication date
JPH0216380B2 (enrdf_load_stackoverflow) 1990-04-17

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