JPS59148002A - 蒸着およびスパツタ用酸化ジルコニウム組成物およびそれを用いる光学用薄膜の製造方法 - Google Patents

蒸着およびスパツタ用酸化ジルコニウム組成物およびそれを用いる光学用薄膜の製造方法

Info

Publication number
JPS59148002A
JPS59148002A JP58022031A JP2203183A JPS59148002A JP S59148002 A JPS59148002 A JP S59148002A JP 58022031 A JP58022031 A JP 58022031A JP 2203183 A JP2203183 A JP 2203183A JP S59148002 A JPS59148002 A JP S59148002A
Authority
JP
Japan
Prior art keywords
zirconium oxide
film
oxide
sputtering
composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP58022031A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6151282B2 (de
Inventor
Shizuko Katsube
勝部　倭子
Takayuki Katsube
勝部　能之
Kazuo Hirasawa
平沢　一男
Takeshi Shibata
健 柴田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
SHIN NIPPON KINZOKU KAGAKU KK
National Institute of Advanced Industrial Science and Technology AIST
Original Assignee
SHIN NIPPON KINZOKU KAGAKU KK
Agency of Industrial Science and Technology
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by SHIN NIPPON KINZOKU KAGAKU KK, Agency of Industrial Science and Technology filed Critical SHIN NIPPON KINZOKU KAGAKU KK
Priority to JP58022031A priority Critical patent/JPS59148002A/ja
Publication of JPS59148002A publication Critical patent/JPS59148002A/ja
Publication of JPS6151282B2 publication Critical patent/JPS6151282B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C23C14/083—Oxides of refractory metals or yttrium

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Inorganic Compounds Of Heavy Metals (AREA)
  • Surface Treatment Of Glass (AREA)
JP58022031A 1983-02-15 1983-02-15 蒸着およびスパツタ用酸化ジルコニウム組成物およびそれを用いる光学用薄膜の製造方法 Granted JPS59148002A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58022031A JPS59148002A (ja) 1983-02-15 1983-02-15 蒸着およびスパツタ用酸化ジルコニウム組成物およびそれを用いる光学用薄膜の製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58022031A JPS59148002A (ja) 1983-02-15 1983-02-15 蒸着およびスパツタ用酸化ジルコニウム組成物およびそれを用いる光学用薄膜の製造方法

Publications (2)

Publication Number Publication Date
JPS59148002A true JPS59148002A (ja) 1984-08-24
JPS6151282B2 JPS6151282B2 (de) 1986-11-08

Family

ID=12071603

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58022031A Granted JPS59148002A (ja) 1983-02-15 1983-02-15 蒸着およびスパツタ用酸化ジルコニウム組成物およびそれを用いる光学用薄膜の製造方法

Country Status (1)

Country Link
JP (1) JPS59148002A (de)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0206780A2 (de) * 1985-06-20 1986-12-30 Tosoh Corporation Zirkoniumdioxidsinterkörper mit verbesserter Lichtdurchlässigkeit
EP0279102A2 (de) * 1986-11-24 1988-08-24 Corning Glass Works Durch Kristallumwandlung gehärtete Zirkonium-Titan-Yttriumoxid-Keramik
EP0390218A2 (de) * 1989-03-31 1990-10-03 Hoya Corporation Optisches Anti-Reflektionselement
JPH02291502A (ja) * 1989-04-28 1990-12-03 Hoya Corp プラスチックレンズ用多層反射防止膜
EP1205774A2 (de) * 2000-11-13 2002-05-15 Hoya Corporation Zusammensetzung für Dampfabscheidung, deren Verwendung in Verfahren zur Bildung einer entspiegelnden Beschichtung, und optisches Element

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0206780A2 (de) * 1985-06-20 1986-12-30 Tosoh Corporation Zirkoniumdioxidsinterkörper mit verbesserter Lichtdurchlässigkeit
EP0206780A3 (en) * 1985-06-20 1988-05-11 Tosoh Corporation Zirconia sintered body of improved light transmittance
EP0279102A2 (de) * 1986-11-24 1988-08-24 Corning Glass Works Durch Kristallumwandlung gehärtete Zirkonium-Titan-Yttriumoxid-Keramik
EP0390218A2 (de) * 1989-03-31 1990-10-03 Hoya Corporation Optisches Anti-Reflektionselement
JPH02291502A (ja) * 1989-04-28 1990-12-03 Hoya Corp プラスチックレンズ用多層反射防止膜
EP1205774A2 (de) * 2000-11-13 2002-05-15 Hoya Corporation Zusammensetzung für Dampfabscheidung, deren Verwendung in Verfahren zur Bildung einer entspiegelnden Beschichtung, und optisches Element
EP1205774A3 (de) * 2000-11-13 2004-06-09 Hoya Corporation Zusammensetzung für Dampfabscheidung, deren Verwendung in Verfahren zur Bildung einer entspiegelnden Beschichtung, und optisches Element
US7106515B2 (en) 2000-11-13 2006-09-12 Hoya Corporation Composition for vapor deposition, method for forming an antireflection film, and optical element
EP1801621A3 (de) * 2000-11-13 2009-12-02 Hoya Corporation Zusammensetzung zur Aufdampfung, Verfahren zur Herstellung einer Antireflexschicht damit und optisches Element

Also Published As

Publication number Publication date
JPS6151282B2 (de) 1986-11-08

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