JPS59139624A - 試料の加熱方法 - Google Patents

試料の加熱方法

Info

Publication number
JPS59139624A
JPS59139624A JP1405483A JP1405483A JPS59139624A JP S59139624 A JPS59139624 A JP S59139624A JP 1405483 A JP1405483 A JP 1405483A JP 1405483 A JP1405483 A JP 1405483A JP S59139624 A JPS59139624 A JP S59139624A
Authority
JP
Japan
Prior art keywords
wafer
sample
along
edge
per unit
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1405483A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0454964B2 (enrdf_load_stackoverflow
Inventor
Junji Sakurai
桜井　潤治
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP1405483A priority Critical patent/JPS59139624A/ja
Publication of JPS59139624A publication Critical patent/JPS59139624A/ja
Publication of JPH0454964B2 publication Critical patent/JPH0454964B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67098—Apparatus for thermal treatment
    • H01L21/67115—Apparatus for thermal treatment mainly by radiation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/324—Thermal treatment for modifying the properties of semiconductor bodies, e.g. annealing, sintering

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Recrystallisation Techniques (AREA)
JP1405483A 1983-01-31 1983-01-31 試料の加熱方法 Granted JPS59139624A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1405483A JPS59139624A (ja) 1983-01-31 1983-01-31 試料の加熱方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1405483A JPS59139624A (ja) 1983-01-31 1983-01-31 試料の加熱方法

Publications (2)

Publication Number Publication Date
JPS59139624A true JPS59139624A (ja) 1984-08-10
JPH0454964B2 JPH0454964B2 (enrdf_load_stackoverflow) 1992-09-01

Family

ID=11850370

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1405483A Granted JPS59139624A (ja) 1983-01-31 1983-01-31 試料の加熱方法

Country Status (1)

Country Link
JP (1) JPS59139624A (enrdf_load_stackoverflow)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8314360B2 (en) * 2005-09-26 2012-11-20 Ultratech, Inc. Apparatuses and methods for irradiating a substrate to avoid substrate edge damage
JP2018120891A (ja) * 2017-01-23 2018-08-02 パナソニックＩｐマネジメント株式会社 基材加熱装置および方法および電子デバイスの製造方法
US11465141B2 (en) 2016-09-23 2022-10-11 Alveo Technologies, Inc. Methods and compositions for detecting analytes
US11473128B2 (en) 2014-10-06 2022-10-18 Alveo Technologies, Inc. System and method for detection of nucleic acids
US12275007B2 (en) 2018-12-20 2025-04-15 Alveo Technologies, Inc. Handheld impedance-based diagnostic test system for detecting analytes

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8314360B2 (en) * 2005-09-26 2012-11-20 Ultratech, Inc. Apparatuses and methods for irradiating a substrate to avoid substrate edge damage
US11473128B2 (en) 2014-10-06 2022-10-18 Alveo Technologies, Inc. System and method for detection of nucleic acids
US11465141B2 (en) 2016-09-23 2022-10-11 Alveo Technologies, Inc. Methods and compositions for detecting analytes
JP2018120891A (ja) * 2017-01-23 2018-08-02 パナソニックＩｐマネジメント株式会社 基材加熱装置および方法および電子デバイスの製造方法
US12275007B2 (en) 2018-12-20 2025-04-15 Alveo Technologies, Inc. Handheld impedance-based diagnostic test system for detecting analytes

Also Published As

Publication number Publication date
JPH0454964B2 (enrdf_load_stackoverflow) 1992-09-01

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