JPS59129421A - 半導体熱処理用部材 - Google Patents

半導体熱処理用部材

Info

Publication number
JPS59129421A
JPS59129421A JP58003370A JP337083A JPS59129421A JP S59129421 A JPS59129421 A JP S59129421A JP 58003370 A JP58003370 A JP 58003370A JP 337083 A JP337083 A JP 337083A JP S59129421 A JPS59129421 A JP S59129421A
Authority
JP
Japan
Prior art keywords
quartz glass
semiconductor
heat treatment
viscosity
devitrification
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP58003370A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0450734B2 (enrdf_load_stackoverflow
Inventor
Nobuyuki Ueshima
上嶋　信幸
Masayuki Saito
正行 斉藤
Haruki Kimura
春樹 木村
Shigeru Abe
茂 安部
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Coorstek KK
Original Assignee
Toshiba Ceramics Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Ceramics Co Ltd filed Critical Toshiba Ceramics Co Ltd
Priority to JP58003370A priority Critical patent/JPS59129421A/ja
Publication of JPS59129421A publication Critical patent/JPS59129421A/ja
Priority to JP4125336A priority patent/JPH0714822B2/ja
Publication of JPH0450734B2 publication Critical patent/JPH0450734B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67098—Apparatus for thermal treatment
    • H01L21/67115—Apparatus for thermal treatment mainly by radiation
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B32/00—Thermal after-treatment of glass products not provided for in groups C03B19/00, C03B25/00 - C03B31/00 or C03B37/00, e.g. crystallisation, eliminating gas inclusions or other impurities; Hot-pressing vitrified, non-porous, shaped glass products
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/02—Pure silica glass, e.g. pure fused quartz
    • C03B2201/03—Impurity concentration specified

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Thermal Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Health & Medical Sciences (AREA)
  • Power Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Toxicology (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Re-Forming, After-Treatment, Cutting And Transporting Of Glass Products (AREA)
  • Glass Melting And Manufacturing (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Glass Compositions (AREA)
JP58003370A 1983-01-14 1983-01-14 半導体熱処理用部材 Granted JPS59129421A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP58003370A JPS59129421A (ja) 1983-01-14 1983-01-14 半導体熱処理用部材
JP4125336A JPH0714822B2 (ja) 1983-01-14 1992-04-20 石英ガラスの純化方法

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP58003370A JPS59129421A (ja) 1983-01-14 1983-01-14 半導体熱処理用部材
JP4125336A JPH0714822B2 (ja) 1983-01-14 1992-04-20 石英ガラスの純化方法

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP4125336A Division JPH0714822B2 (ja) 1983-01-14 1992-04-20 石英ガラスの純化方法

Publications (2)

Publication Number Publication Date
JPS59129421A true JPS59129421A (ja) 1984-07-25
JPH0450734B2 JPH0450734B2 (enrdf_load_stackoverflow) 1992-08-17

Family

ID=26336931

Family Applications (2)

Application Number Title Priority Date Filing Date
JP58003370A Granted JPS59129421A (ja) 1983-01-14 1983-01-14 半導体熱処理用部材
JP4125336A Expired - Lifetime JPH0714822B2 (ja) 1983-01-14 1992-04-20 石英ガラスの純化方法

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP4125336A Expired - Lifetime JPH0714822B2 (ja) 1983-01-14 1992-04-20 石英ガラスの純化方法

Country Status (1)

Country Link
JP (2) JPS59129421A (enrdf_load_stackoverflow)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63236723A (ja) * 1987-03-26 1988-10-03 Shinetsu Sekiei Kk 半導体工業用石英ガラス製品
JPH05105577A (ja) * 1990-06-25 1993-04-27 Shinetsu Quartz Prod Co Ltd シリコン単結晶引き上げ用石英ガラスルツボとその製造方法
JPH0784328B2 (ja) * 1984-11-05 1995-09-13 三菱マテリアル株式会社 ガラス質シリカ製容器又はパイプの品質改良法
WO1995034091A1 (de) * 1994-06-09 1995-12-14 Heraeus Quarzglas Gmbh Halbzeug für ein elektronisches oder opto-elektronisches halbleiterbauelement
US6133178A (en) * 1997-12-03 2000-10-17 Tosoh Corporation High purity transparent silica glass
JP2011132073A (ja) * 2009-12-24 2011-07-07 Tosoh Corp 金属不純物拡散阻止能を有する石英ガラス

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4557441B2 (ja) * 2000-03-17 2010-10-06 ジャパンスーパークォーツ株式会社 石英粉末の精製方法と装置およびその石英ガラス製品
JP4204374B2 (ja) 2003-04-21 2009-01-07 信越石英株式会社 石英ガラス治具の製造方法

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0784328B2 (ja) * 1984-11-05 1995-09-13 三菱マテリアル株式会社 ガラス質シリカ製容器又はパイプの品質改良法
JPS63236723A (ja) * 1987-03-26 1988-10-03 Shinetsu Sekiei Kk 半導体工業用石英ガラス製品
JPH05105577A (ja) * 1990-06-25 1993-04-27 Shinetsu Quartz Prod Co Ltd シリコン単結晶引き上げ用石英ガラスルツボとその製造方法
WO1995034091A1 (de) * 1994-06-09 1995-12-14 Heraeus Quarzglas Gmbh Halbzeug für ein elektronisches oder opto-elektronisches halbleiterbauelement
US6133178A (en) * 1997-12-03 2000-10-17 Tosoh Corporation High purity transparent silica glass
DE19855915B4 (de) * 1997-12-03 2007-08-23 Tosoh Corp., Shinnanyo Transparentes hochreines Quarzglas und Verfahren zu dessen Herstellung
DE19855915C5 (de) * 1997-12-03 2009-09-24 Tosoh Corp., Shinnanyo Transparentes hochreines Quarzglas und Verfahren zu dessen Herstellung
JP2011132073A (ja) * 2009-12-24 2011-07-07 Tosoh Corp 金属不純物拡散阻止能を有する石英ガラス

Also Published As

Publication number Publication date
JPH0714822B2 (ja) 1995-02-22
JPH0450734B2 (enrdf_load_stackoverflow) 1992-08-17
JPH05301731A (ja) 1993-11-16

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