JPS59117132A - Master slice lsi substrate - Google Patents

Master slice lsi substrate

Info

Publication number
JPS59117132A
JPS59117132A JP23241782A JP23241782A JPS59117132A JP S59117132 A JPS59117132 A JP S59117132A JP 23241782 A JP23241782 A JP 23241782A JP 23241782 A JP23241782 A JP 23241782A JP S59117132 A JPS59117132 A JP S59117132A
Authority
JP
Japan
Prior art keywords
area
wiring
region
terminal
cell array
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP23241782A
Other languages
Japanese (ja)
Inventor
Minoru Nomura
稔 野村
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP23241782A priority Critical patent/JPS59117132A/en
Publication of JPS59117132A publication Critical patent/JPS59117132A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
    • H01L27/04Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body
    • H01L27/10Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a repetitive configuration
    • H01L27/118Masterslice integrated circuits

Landscapes

  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Semiconductor Integrated Circuits (AREA)
  • Design And Manufacture Of Integrated Circuits (AREA)

Abstract

PURPOSE:To prevent local wiring contact by arranging the memory region in contact with the upper side of internal wiring region with the same width as the cell array. CONSTITUTION:An input/output buffer circuit 21, an input/output buffer circuit having an input pad 22, a cell array 9, an internal wiring region having wiring region 8, a memory region 7, a temporary external terminal 23, an RAM terminal 71, a buried layer 24 connecting the circuit 21 and terminal 23 and a leadout wire 232 connecting the circuit 21 and the temporary external terminal 231 are formed on an LSI substrate 1. Since the region 7 is arranged in contact with the upper side of the internal wiring region 3 in the same width as the cell array 9, it is no longer necessary to wire bridging over the region 7 and the detour of wiring is not required.

Description

【発明の詳細な説明】 発明の屈する技術分野 本発明はランダム・アクセス・メモリ、読出し専用記憶
、プログラマブルロジック・アレイを搭載したマスタス
ライス方式LSI基板に関する。
DETAILED DESCRIPTION OF THE INVENTION TECHNICAL FIELD The present invention relates to a master slice type LSI board equipped with a random access memory, a read-only memory, and a programmable logic array.

従来技術 マスクスライス方式LSIが大規模に々るにつれ、LS
I内部で構成できる論理回路数が増大してきている。例
えば、ナンド;ノア等の一般ゲートだけを使用して論理
を構成するだけでなく、プログラマブル・ロジック・ア
レイ(以下PLA)やメモリー機能をも内部に取り込み
、複雑な論理を実現するという傾向が強くなってきてい
る。
Conventional technology As mask slicing LSIs become more popular, LS
The number of logic circuits that can be configured inside I is increasing. For example, there is a strong tendency to not only construct logic using general gates such as NAND and NOR gates, but also incorporate programmable logic arrays (PLA) and memory functions internally to realize complex logic. It has become to.

そこで、従来の単なるセルアレイだけからなるマスクス
ライスLSIでは、その要求が満せなくなシ、ランダム
・アクセス・メモリ(RAM)、読出専用記憶(ROM
)、およびPLA等の領域(以後、6記憶領域”と称す
る。)を基板内に設けたLSIが必要になってきている
。しかし、このような基板の場合、記憶領域内は、一般
に配線の通過が許されないため、その設定位置、記憶領
域の形状、およびその端子位置によっては、I、SI内
されていると、記憶領域をまたぐ接続に対する配線は、
記憶領域の外周部を迂回しなければならず、周囲領域で
局所的な配線の混雑を生んでし甘う。
Therefore, conventional mask-sliced LSIs consisting of only cell arrays cannot meet these requirements; random access memory (RAM), read-only memory (ROM)
), PLA (hereinafter referred to as 6 storage areas), etc., within the board. However, in the case of such a board, the wiring within the storage area is generally Because wiring is not allowed, depending on its setting position, the shape of the storage area, and its terminal position, wiring for connections that cross storage areas may be
It is necessary to bypass the outer periphery of the storage area, resulting in local wiring congestion in the surrounding area.

また、セルアレイの外辺に接して設置すると、接した側
のチップの外部端子と内部ブロックとの自己線用に、周
辺部に多大な配線領域を必要とし、さらにその配線法が
難しくなるという問題をもたらす。LSIが大規模にな
るにつれ、配線は、プログラムにより自動で発生ずるこ
とが重要になり、配線性を悪化する。この短所が大きな
問題となってきている。
Another problem is that when installed in contact with the outer edge of a cell array, a large amount of wiring area is required in the peripheral area for self-wires between the external terminals of the adjacent chip and the internal block, and the wiring method becomes difficult. bring about. As LSIs become larger in scale, it becomes important for wiring to be automatically generated by a program, which deteriorates wiring performance. This shortcoming has become a major problem.

本発明の目的は、上述の欠点を除去するようにしてブロ
ック間の配線性を向上させかつ周辺部の配線領域を少な
くできるようにしたマスクスライスLSI基板を提供す
ることにある。
SUMMARY OF THE INVENTION An object of the present invention is to provide a mask-sliced LSI substrate that eliminates the above-mentioned drawbacks, improves the wiring between blocks, and reduces the wiring area in the periphery.

本発明の構成     一 本願発明の基板は、セルアレイを配置した方形の配線領
域と、 この配線領域の方形の一辺に接するよう前記配線領域内
に配置した記憶領域と、 前記配線領域および前記記憶領域の接辺の外側に配置し
たバッファ回路と、 前記記憶領域の接辺と対抗する辺に配置した端子と、前
記バッファ回路および前記端子を接続するため前記記憶
領域の下に埋め込まれた埋込線とを備邸 えていた。
Configuration of the Present Invention One of the substrates of the present invention includes: a rectangular wiring area in which a cell array is arranged; a storage area disposed within the wiring area so as to be in contact with one side of the rectangle of the wiring area; a buffer circuit placed outside the tangent side; a terminal placed on the side opposite the tangent side of the storage area; and an embedded line buried under the storage area to connect the buffer circuit and the terminal. He had a residence.

発明の実施例 次に本発明について、図面を参照して詳細に説明する。Examples of the invention Next, the present invention will be explained in detail with reference to the drawings.

第1図を参照すると、従来形の不規則領域(ここではR
AM領域)を持つマスタスライスLSI基板1は、人出
力バツファ回路部2と内部配線領域3とから構成されて
いる。前記入出カッくッファ回路部2は、バッファ回路
21.入出カッくラド22および仮性部端子23から構
成されている。前記内部配線領域3は、セル4を1行m
列に設置したセルアレイ、セル行6間の配線領域5゜そ
して、セルアレイ上にに行1列(1≦k(n。
Referring to FIG. 1, a conventional irregular region (here R
A master slice LSI board 1 having an AM area) is composed of a human output buffer circuit section 2 and an internal wiring area 3. The input/output buffer circuit section 2 includes a buffer circuit 21 . It is composed of an input/output bracket 22 and a temporary terminal 23. The internal wiring area 3 has cells 4 arranged in one row m.
A cell array is installed in a column, a wiring area 5° between cell rows 6, and a row 1 column (1≦k(n)) on the cell array.

1<A<m)のセル4を並べた大きさの記憶領域7をも
つ。前記記憶領域7は、その周辺上に端子71を設置し
ている。この構造では、記憶領域7上をまたぐ接続は、
記憶(RAM )領域内の通過が許されないため、記憶
領域(R,AM)7の周辺近辺に迂回しなければならな
くなる。その結iRAM近辺で局所的な配線混雑が発生
し、未配線の原因になる。これを防ぐためには、RAM
周辺に多大な、配線領域を準備する必要が生じ、その分
だけセル4を取シ除かねばならず、集積度を低下させる
。第2図を参照すると、本発明の一実施例は、マスクL
SI基板1上の入出カバソファ回路21および入出力バ
ッド22を有する入出力バッファ回路部2、複数のセル
4から々るセル行6をマトリックス状に自装置したセル
アレイ9およびこの一ヒルアレイ9周囲の配線領域8を
有する方形の内部配線領域3、この内部配線領域3の方
形の一辺に接するように配置された記憶(RAM)領域
7、この領域7の前記接辺に対抗する辺に設けられた第
1の仮性部端子23、この端子23に並置されるRAM
端子71、前記バッファ回路21および前記第1の仮性
部端子23を接続するため前記記憶(RAM )領域7
の下に埋め込まれた埋込線24、前記記憶(RAM )
領域の右辺おrび左辺に配置された第2の仮性部端子2
31、および前記バッファ回路21と前記第2の仮性部
端子との間を接続する引出線232から構成されている
。前記記憶(RAM)領域7は、セルアレイと同一幅で
内部配線領域3の上辺に接して設置されている RAM
の端子71は、記憶(RAM )領域7の下辺に並んで
設置されている1、記憶(RAM )領域7に接するチ
ップ辺上に存在する仮性部端子23も、記憶(RAM)
領域7内の埋め込み線24と接続され、記憶(RAM 
)領域7の下辺に並んで設置されている。RAM領域7
の左および右辺近辺の仮性部端子231も引き出し線2
32により、RAM領域7下辺のラインまで出ている。
It has a storage area 7 that is the size of an array of cells 4 (1<A<m). The storage area 7 has terminals 71 installed around it. In this structure, connections across storage area 7 are
Since passage through the memory (RAM) area is not allowed, it is necessary to take a detour to the vicinity of the memory area (R, AM) 7. As a result, local wiring congestion occurs near the iRAM, causing unwired connections. To prevent this, RAM
It becomes necessary to prepare a large amount of wiring area around the periphery, and the cells 4 must be removed accordingly, which lowers the degree of integration. Referring to FIG. 2, one embodiment of the present invention includes a mask L
An input/output buffer circuit section 2 having an input/output cover sofa circuit 21 and an input/output pad 22 on the SI board 1, a cell array 9 in which cell rows 6 each consisting of a plurality of cells 4 are arranged in a matrix, and wiring around this one-hill array 9. A rectangular internal wiring area 3 having a region 8, a memory (RAM) area 7 arranged so as to be in contact with one side of the square of this internal wiring area 3, and a memory (RAM) area 7 provided on a side opposite to the tangent side of this area 7. 1 temporary terminal 23, RAM juxtaposed to this terminal 23
The memory (RAM) area 7 for connecting the terminal 71, the buffer circuit 21 and the first temporary terminal 23
Embedded line 24 embedded under the memory (RAM)
Second temporary terminals 2 arranged on the right and left sides of the area
31, and a leader line 232 connecting between the buffer circuit 21 and the second temporary terminal. The memory (RAM) area 7 has the same width as the cell array and is installed in contact with the upper side of the internal wiring area 3.
The terminals 71 of the memory (RAM) area 7 are arranged side by side on the lower side of the memory (RAM) area 7.
It is connected to the embedded line 24 in the area 7, and is connected to the memory (RAM).
) are placed side by side on the lower side of area 7. RAM area 7
The temporary terminals 231 near the left and right sides of
32, the line extends to the bottom line of the RAM area 7.

乙の実施例では、RAM領域7をまたがって配線する必
要が無くなυ、配線の迂回は起らなくなる。すなわち、
局所的配線混雑を発生することがないだめ、配線性向上
が計れる。また、仮性部端子と内部ブロックとの配線は
、埋め込み線24を経由することで達成されるため、セ
ルアレイの周囲の配線領域8の設定がRA M領域7の
接する辺側で不要になシ、配線領域を削減できる1、ま
た、周囲を迂回することによシ配線長が心太以上に長く
なるといった欠点も同時に解消することができる。
In the embodiment B, there is no need for wiring across the RAM area 7 υ, and no wiring detours occur. That is,
Wiring performance can be improved without causing local wiring congestion. Furthermore, since the wiring between the temporary part terminal and the internal block is achieved by passing through the buried line 24, the setting of the wiring area 8 around the cell array is not necessary on the side where the RAM area 7 contacts. The wiring area can be reduced (1), and the disadvantage that the wiring length becomes longer than the core thickness by detouring around the surrounding area can also be solved at the same time.

以上、本発明は、その良好な一実施例について説明され
たか、それは単なる例示的なものであシ、ここで説明さ
れた実施例によってのみ本発明が限定されるものではな
く、神々の変形が回層である。
The present invention has been described above with respect to one preferred embodiment thereof, but it is merely an illustrative example, and the present invention is not limited only to the embodiment described herein. It is a cycle layer.

例えば、RA Ivi領域の設定位シ1は、内部配線領
域の4辺ならどこでも良い。
For example, the setting position 1 of the RA Ivi area may be any of the four sides of the internal wiring area.

発明の効果 本発明には、RAM 、 110M 、 P LA%の
不規則領域を迂回する配線を無くす構成をとることによ
り、極度に長い配線、局所的々配線の混雑の発仝を防ぎ
、配線率を向上できるという効果かある。
Effects of the Invention The present invention has a configuration that eliminates wiring that detours around irregular areas of RAM, 110M, and PLA%, thereby preventing extremely long wiring and local wiring congestion, and improving wiring efficiency. It has the effect of improving the

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は、従来形のRAM領域をもつマスクスライスL
SI基板、および第2図は、本発明の一実施例を示す図
である。 第1図および第2図において、1・・・・・・マスクス
ライスLSI基板、2・・・・・・入出力バッファ回路
部、21・・・・・・バッフアロ路、22・・・・・・
入出力パッド、23・・・・・・仮外部端子、231・
・・・・・RA N領域の左、右辺近辺の仮外部端子、
232・・・・・・231までの引出線、24・・・・
・・仮外部端子の引き出し用坏込線、3・・・・・・内
部配線領域、4・・・・・・セル、5・・・・・・配線
領域、6・・・・・・セル行、7・・・・・−RA、M
領域、71・・・・・・RAM端子、訃・・・・・セル
アレイ周囲の配線領域、9・・・・・・セルアレイ。 (イ)1 図 第2図
FIG. 1 shows a mask slice L with a conventional RAM area.
The SI board and FIG. 2 are diagrams showing an embodiment of the present invention. 1 and 2, 1...mask slice LSI board, 2... input/output buffer circuit section, 21... buffer allopath, 22...・
Input/output pad, 23...Temporary external terminal, 231.
...Temporary external terminals near the left and right sides of the RAN area,
232...Leader lines up to 231, 24...
...Push-in wire for drawing out temporary external terminals, 3...Internal wiring area, 4...Cell, 5...Wiring area, 6...Cell Row, 7...-RA, M
Area, 71...RAM terminal, 9...Wiring area around cell array, 9...Cell array. (b)1 Figure 2

Claims (1)

【特許請求の範囲】 セルアレイを配置した方形の配線領域と、この配線領域
の方形の一辺に接するよう前記配線領域内に配置した記
憶領域と、 前記配線領域および前記記憶領域の接辺の外側に配置し
た少なくとも1個のバッファ回路と、−前記記憶領域の
接辺と対抗する辺に配置した少なくとも1個の端子と、 前記バッファ回路と前記端子とを接続するよう前記記憶
領域の下に埋め込まれた少なくとも1個の埋込線とを備
えたことを特徴とするマスクスライスLSI基板。
[Scope of Claims] A rectangular wiring area in which a cell array is arranged, a storage area arranged within the wiring area so as to be in contact with one side of the rectangle of the wiring area, and a storage area located outside the tangent side of the wiring area and the storage area. at least one buffer circuit disposed; - at least one terminal disposed on a side opposite to a tangent side of the storage area; embedded under the storage area so as to connect the buffer circuit and the terminal; 1. A mask sliced LSI substrate comprising at least one embedded line.
JP23241782A 1982-12-23 1982-12-23 Master slice lsi substrate Pending JPS59117132A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP23241782A JPS59117132A (en) 1982-12-23 1982-12-23 Master slice lsi substrate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP23241782A JPS59117132A (en) 1982-12-23 1982-12-23 Master slice lsi substrate

Publications (1)

Publication Number Publication Date
JPS59117132A true JPS59117132A (en) 1984-07-06

Family

ID=16938920

Family Applications (1)

Application Number Title Priority Date Filing Date
JP23241782A Pending JPS59117132A (en) 1982-12-23 1982-12-23 Master slice lsi substrate

Country Status (1)

Country Link
JP (1) JPS59117132A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6197849A (en) * 1984-10-18 1986-05-16 Fujitsu Ltd Gate array lsi device
JPS61274339A (en) * 1985-05-02 1986-12-04 Fujitsu Ltd Gate array provided with ram
JPS6323336A (en) * 1986-07-16 1988-01-30 Nec Corp Master slice system semiconductor integrated circuit
JPH01207947A (en) * 1988-02-15 1989-08-21 Nec Corp Semiconductor integrated circuit device and design thereof
JPH02144937A (en) * 1988-11-28 1990-06-04 Hitachi Ltd Semiconductor integrated circuit device and its wiring

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6197849A (en) * 1984-10-18 1986-05-16 Fujitsu Ltd Gate array lsi device
JPS61274339A (en) * 1985-05-02 1986-12-04 Fujitsu Ltd Gate array provided with ram
JPH0566744B2 (en) * 1985-05-02 1993-09-22 Fujitsu Ltd
JPS6323336A (en) * 1986-07-16 1988-01-30 Nec Corp Master slice system semiconductor integrated circuit
JPH01207947A (en) * 1988-02-15 1989-08-21 Nec Corp Semiconductor integrated circuit device and design thereof
JPH02144937A (en) * 1988-11-28 1990-06-04 Hitachi Ltd Semiconductor integrated circuit device and its wiring

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