JPS59116376A - 対向タ−ゲツト式スパツタ装置 - Google Patents

対向タ−ゲツト式スパツタ装置

Info

Publication number
JPS59116376A
JPS59116376A JP22389982A JP22389982A JPS59116376A JP S59116376 A JPS59116376 A JP S59116376A JP 22389982 A JP22389982 A JP 22389982A JP 22389982 A JP22389982 A JP 22389982A JP S59116376 A JPS59116376 A JP S59116376A
Authority
JP
Japan
Prior art keywords
target
targets
magnetic field
core
facing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP22389982A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6354789B2 (en:Method
Inventor
Kazuhiko Honsho
本床　和彦
Sadao Kadokura
貞夫 門倉
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Teijin Ltd
Original Assignee
Teijin Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Teijin Ltd filed Critical Teijin Ltd
Priority to JP22389982A priority Critical patent/JPS59116376A/ja
Publication of JPS59116376A publication Critical patent/JPS59116376A/ja
Publication of JPS6354789B2 publication Critical patent/JPS6354789B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3402—Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
JP22389982A 1982-12-22 1982-12-22 対向タ−ゲツト式スパツタ装置 Granted JPS59116376A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP22389982A JPS59116376A (ja) 1982-12-22 1982-12-22 対向タ−ゲツト式スパツタ装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP22389982A JPS59116376A (ja) 1982-12-22 1982-12-22 対向タ−ゲツト式スパツタ装置

Publications (2)

Publication Number Publication Date
JPS59116376A true JPS59116376A (ja) 1984-07-05
JPS6354789B2 JPS6354789B2 (en:Method) 1988-10-31

Family

ID=16805445

Family Applications (1)

Application Number Title Priority Date Filing Date
JP22389982A Granted JPS59116376A (ja) 1982-12-22 1982-12-22 対向タ−ゲツト式スパツタ装置

Country Status (1)

Country Link
JP (1) JPS59116376A (en:Method)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4784739A (en) * 1986-12-26 1988-11-15 Teijin Limited Method of producing a thin film by sputtering and an opposed target type sputtering apparatus
US4842708A (en) * 1982-02-16 1989-06-27 Teijin Limited Perpendicular magnetic recording medium, method for producing the same, and sputtering device
JPH0229455U (en:Method) * 1988-08-18 1990-02-26
US5283095A (en) * 1991-04-12 1994-02-01 Nissin Electric Co., Ltd. Optical recording medium comprising (1,1,1) aluminum
JP2000219965A (ja) * 1999-02-02 2000-08-08 Shin Etsu Chem Co Ltd スパッタ装置用磁気回路

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4842708A (en) * 1982-02-16 1989-06-27 Teijin Limited Perpendicular magnetic recording medium, method for producing the same, and sputtering device
US4784739A (en) * 1986-12-26 1988-11-15 Teijin Limited Method of producing a thin film by sputtering and an opposed target type sputtering apparatus
JPH0229455U (en:Method) * 1988-08-18 1990-02-26
US5283095A (en) * 1991-04-12 1994-02-01 Nissin Electric Co., Ltd. Optical recording medium comprising (1,1,1) aluminum
JP2000219965A (ja) * 1999-02-02 2000-08-08 Shin Etsu Chem Co Ltd スパッタ装置用磁気回路

Also Published As

Publication number Publication date
JPS6354789B2 (en:Method) 1988-10-31

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