JPS59110485A - Production of molybdenum composite plate - Google Patents
Production of molybdenum composite plateInfo
- Publication number
- JPS59110485A JPS59110485A JP22104182A JP22104182A JPS59110485A JP S59110485 A JPS59110485 A JP S59110485A JP 22104182 A JP22104182 A JP 22104182A JP 22104182 A JP22104182 A JP 22104182A JP S59110485 A JPS59110485 A JP S59110485A
- Authority
- JP
- Japan
- Prior art keywords
- plate
- molybdenum
- copper
- coating layer
- thin coating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K20/00—Non-electric welding by applying impact or other pressure, with or without the application of heat, e.g. cladding or plating
- B23K20/22—Non-electric welding by applying impact or other pressure, with or without the application of heat, e.g. cladding or plating taking account of the properties of the materials to be welded
Abstract
Description
【発明の詳細な説明】
この発明は半導体装置の温度補償板として用いられるモ
リブデン板の片面あるいは両面に他の金属または合金の
板を接着させた密着性のよいモリブデン基複合板の製造
方法に関する。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method for manufacturing a molybdenum substrate composite plate with good adhesion, which is used as a temperature compensating plate for a semiconductor device, in which a plate of another metal or alloy is adhered to one or both sides of a molybdenum plate.
モリブデンは、熱膨張係数がシリコンの熱膨張係数に近
似しているため半導体部品のシリコン素子の熱ひずみに
よる破損を防止するための温度補償板として使用されて
いる。このモリブデン温度補償板の接合時の工程を簡略
化するためにモリブデン板の片面あるいは両面に銅や銀
などを接合させたクラツド板が使用されることがある。Molybdenum has a coefficient of thermal expansion similar to that of silicon, and is therefore used as a temperature compensating plate to prevent silicon elements of semiconductor components from being damaged due to thermal strain. In order to simplify the bonding process for this molybdenum temperature compensating plate, a clad plate in which copper, silver, or the like is bonded to one or both sides of a molybdenum plate is sometimes used.
しかしなからこのようなりラッド板は金属ヘッダー上へ
シリコン素子を接合する時の加熱や半導体装置使用中の
ヒートサイクルの繰り返しによってクラッド面が剥離す
る等の問題が生じ易く、密着強度の高いクラツド板が要
求されていた。However, such a clad plate is prone to problems such as peeling of the cladding surface due to heating when bonding a silicon element to a metal header or repeated heat cycles during use of a semiconductor device. was required.
モリブデン板としては一般に焼結材が用いられるが、機
械的性質が脆弱で、−硬度も高く、クラツド板の製造方
法として一般に用いられているロール圧着法では希望す
るような高い密着強度は得られない欠点があった。Sintered materials are generally used as molybdenum plates, but they have weak mechanical properties and high hardness, and the desired high adhesion strength cannot be obtained with the roll crimping method commonly used for manufacturing clad plates. There were no drawbacks.
本発明は上記の欠点を解消し密着性の良好なモリブデン
基複合板の製造方法を提供することを目的とするもので
ある。An object of the present invention is to provide a method for manufacturing a molybdenum-based composite plate with good adhesion, which eliminates the above-mentioned drawbacks.
この目的を達成するために本発明はモリブデン基板の片
面又は両面の全面に接合しようとする金属と同種あるい
はその金属と親和性の強い金属の被覆薄層を形成した後
、該被覆薄層に基板と幅及ぴ長さが等しいかより大きい
金属板を全面で重ね、真空、不活性、あるし・は還元性
雰囲気中で加圧加熱して接合するものである。In order to achieve this object, the present invention forms a thin covering layer of a metal of the same kind or a strong affinity with the metal to be bonded on the entire surface of one or both sides of a molybdenum substrate, and then applies the thin covering layer to the substrate. Metal plates of equal or larger width and length are overlapped on their entire surfaces and bonded by pressure and heating in a vacuum, inert, or reducing atmosphere.
本発明においてはモリブデン基板のクラッドをしようと
する面上に予め被覆薄層を形成させることが必要である
。被覆薄層の材質としては銅、金、銀あるいはそれらの
合金でクラッドしようとする金属と同一の材料が最も好
ましいが、それ以外でも前記のものであれば特に限定さ
れるものではない。In the present invention, it is necessary to previously form a thin coating layer on the surface of the molybdenum substrate that is to be clad. The material of the thin coating layer is most preferably the same as the metal to be clad with copper, gold, silver, or an alloy thereof, but is not particularly limited as long as it is other than the above-mentioned materials.
被覆方法としては被覆する面を洗浄、脱脂した後メッキ
、蒸着、溶着等一般的な方法を用いることができる。被
覆薄層の厚さはθ、、?〜5μm程度が最適である。こ
れらの被覆N層は熱処理等を施してモリブデン基板中へ
拡散させておくのが好ましい0
本発明の製造方法において、クラッドしようとする金属
としては銅、ニッケル、金、銀の金属板、あるいはそれ
らの合金板が適しており、モリブデン基板と幅及び長さ
が同寸法の金属板あるいは合金板を被覆薄層の形成され
たモリブテン基板の被覆薄層と重ねて加圧加熱処理して
も良いが、モリブデン基板より幅及び長さが大きい金属
板あるいは合金板を被覆薄層の形成されたモリブデン基
板の被覆薄層と重ねて加圧加熱処理すると更によく接着
する。As a coating method, general methods such as plating, vapor deposition, welding, etc. can be used after cleaning and degreasing the surface to be coated. The thickness of the thin coating layer is θ, ? The optimum thickness is approximately 5 μm. It is preferable that these coating N layers are diffused into the molybdenum substrate by heat treatment or the like. In the manufacturing method of the present invention, the metal to be clad is a metal plate of copper, nickel, gold, or silver, or a metal plate of copper, nickel, gold, or silver. A metal plate or an alloy plate with the same width and length as the molybdenum substrate is suitable, and a thin coating layer of the molybdenum substrate on which the thin coating layer has been formed may be stacked and subjected to pressure and heat treatment. If a metal plate or an alloy plate having a width and length larger than the molybdenum substrate is stacked on the thin coating layer of the molybdenum substrate on which the thin coating layer is formed, and subjected to pressure and heat treatment, the bond will be better bonded.
この場合クラッドしようとする金属の寸法は幅、長さ、
共モリブテン基板の幅及び長さに対し/1.2倍以上あ
ると一層接着強度が大きくなる。In this case, the dimensions of the metal to be clad are width, length,
If the width and length of the co-molybdenum substrate is 1.2 times or more, the adhesive strength will be further increased.
熱処理の雰囲気は真空、不活性あるいは還元性雰囲気中
で行なうことが必要で、酸化性雰囲気は避けるへきであ
る。The heat treatment must be carried out in a vacuum, inert or reducing atmosphere, and an oxidizing atmosphere should be avoided.
熱処理の温度はクラッドしようとしている金属または合
金の融点より僅かに低い温度で行なうと最も接着強度を
大きくできるが、幅及び長さがモリブデン基板の/、Ω
倍以上のときは融点より300C位低い温度範囲までは
被覆薄層を設けない場合よりも接着強度をよくできる。The bonding strength can be maximized by heat treatment at a temperature slightly lower than the melting point of the metal or alloy to be clad, but the width and length of the molybdenum substrate
When the temperature is more than twice as high, the adhesive strength can be improved up to a temperature range about 300C lower than the melting point than when no thin coating layer is provided.
しかしクラッドしようとする金属板の寸法がモリブデン
基板と同寸法のときには融点より、2oo c低い温度
までの範囲に保持することによって接着強度を被覆薄層
を設けない場合よりよくできる。However, when the dimensions of the metal plate to be clad are the same as those of the molybdenum substrate, the adhesive strength can be improved by maintaining the temperature within a range of 200 C lower than the melting point than when no thin coating layer is provided.
熱処理時の加圧はモリブデン基板の被覆薄層に重ねたク
ラツド材とが充分密に接触するよう適当な治具に挾んで
加圧ねじて締付ける等の手段を用いることができ、治具
とクラツド材との接触面には雲母板等を介在させてゆ着
を防止することが好ましい。Pressure during heat treatment can be applied by means such as clamping the material in an appropriate jig and tightening it with pressure screws so that the thin coating layer of the molybdenum substrate and the cladding material are in close contact with each other. It is preferable to interpose a mica plate or the like on the contact surface with the material to prevent sagging.
モリブデン基板へのクランド材の12合は、その用途に
応じて片面でも、両面でも良く、クラツド材は基板の両
面の材質が異なっていても良く、又モリブデン基板2枚
またはそれ以」二を中間にクラツド材を介して多層に重
ね合わせた複合板も製造することもできる。Cladding material may be attached to the molybdenum substrate on one side or both sides depending on the application, and the materials on both sides of the substrate may be different, or two or more molybdenum substrates may be attached in the middle. It is also possible to manufacture composite plates in which multiple layers are stacked together with cladding materials in between.
以下実施例について説明する。Examples will be described below.
実施例/
長さグツθmm、幅11Qmm、及び長さ3sommz
幅3Q mm。Example/Length θmm, width 11Qmm, and length 3somz
Width 3Q mm.
厚さ各/ rnmの無酸素銅板を有機溶剤中に浸漬し、
−超音波洗浄を施して表面脱脂処理する。一方長さ3s
o rum 、幅3Q mm 、厚さ/闘の焼結モリブ
デ〉・板の表面を同様に脱脂処理した後、両面全面に厚
さ約/μmの銅メッキを施こし、不活性雰囲気中で70
0C,2時間加熱して銅をモリブデン中に拡散させ、次
いでこのモリブデン板の両面に前記脱脂した銅板を清浄
な環境下でモリブデン板より銅板の方が大きいときはモ
リブデン板の周りで銅板が突出するように全面で重ね合
わせ、最外層に雲母板を当てて加圧治具にセットして重
ねた板を加圧圧接状態とする。重ね合わせた板を加圧治
具ごとボートにのせて炉に装入し、1000 U 、水
素雰囲気中で2時間熱処理し、次いで不活性雰囲気中で
炉中冷却した後取り出した。得られた複合板の中央部か
ら長さ乙Q m、m、幅約3 mmの試料を切出し、試
料の両端を万力とチャックで30鴎の間隔で厚さ方向に
挾みチャックをqθ°右にまわし、これを元に戻し、次
に左に9dまわし元に戻すねじり試験を7回と勘定して
試料にクランクが発生するまでの回数を試料/θケの乎
j@値で表わして密着性の良否を調査した。An oxygen-free copper plate with a thickness of /rnm is immersed in an organic solvent,
- Ultrasonic cleaning and surface degreasing. On the other hand, length 3s
o rum, width 3Q mm, thickness/thickness of sintered molybdenum> After degreasing the surface of the plate in the same way, copper plating with a thickness of approximately 1/μm was applied to both surfaces, and the plate was plated for 70 minutes in an inert atmosphere.
Heat at 0C for 2 hours to diffuse copper into molybdenum, then apply the degreased copper plate on both sides of the molybdenum plate in a clean environment, and if the copper plate is larger than the molybdenum plate, the copper plate will protrude around the molybdenum plate. The two plates are overlapped on their entire surfaces, and a mica plate is placed on the outermost layer and set in a pressure jig to press the stacked plates together. The stacked plates together with the pressure jig were placed on a boat and charged into a furnace, heat treated in a hydrogen atmosphere of 1000 U for 2 hours, then cooled in the furnace in an inert atmosphere, and then taken out. A sample with a length of Q m, m and a width of approximately 3 mm was cut from the center of the composite plate obtained, and both ends of the sample were held in a vise and a chuck in the thickness direction at intervals of 30 mm, and the chuck was held at qθ°. Turn clockwise, return to original position, then turn counterclockwise 9 degrees and return to original position. Counting the torsion test as 7 times, the number of times until a crank occurs in the sample is expressed as the value of sample/θ. The quality of adhesion was investigated.
実施例λ〜左
実施例/と同様の材料を用い、クラツド材をモリブデン
板と接触させて加圧加熱する温度のみを900、 g3
0、goo、73OCの各温度に変化させ、他は実施例
/と同様にしてねじり試験を行なった。Using the same materials as in Example λ~Left Example/, only the temperature at which the clad material was brought into contact with the molybdenum plate and heated under pressure was 900 g3.
A torsion test was conducted in the same manner as in Example except that the temperature was changed to 0, goo, and 73OC.
実施例乙
長さll、to關、幅グθmm及び長さ3汐0關、幅3
りmm。Example Length: 11, to: width: θ mm, length: 3:0:0, width:: 3
Rmm.
厚さ各/ tnmの5重量%の銅を含有した銀板を脱脂
洗浄し、一方焼結モリブデン板は実施例/と同寸法のも
のを準備し、同様の処理を施こし、このモリブデン板の
両面に前記脱脂した銅入り銀板を実施例/と同様接触さ
せて圧接してgooC(同相線gqo C)の水素雰囲
気中で2時間熱処理し、次いで不活性雰囲気中で炉中冷
却し、得られた複合板から実施例/と同様に試料を切り
出し、ねじり試験を行なった。A silver plate containing 5% by weight of copper with a thickness of /tnm was degreased and cleaned, while a sintered molybdenum plate with the same dimensions as in Example / was prepared, and the same treatment was applied to the molybdenum plate. The degreased copper-containing silver plate was brought into contact with both sides in the same manner as in Example/1, and heat-treated in a hydrogen atmosphere of gooC (common phase line gqo C) for 2 hours, and then cooled in a furnace in an inert atmosphere. A sample was cut out from the composite plate and subjected to a torsion test in the same manner as in Example.
比較例
実施例/と同じ無酸素銅板を脱脂洗浄し、また実施例/
と同じ焼結モリブデン板を脱脂処理したま\で表面被覆
薄層を施こさずに両面全面に前記脱脂した無酸素銅板を
加圧接触せしめて1000 Cの水素雰囲気中で2時間
処理し、次いで不活性雰囲気中で炉中冷却し得られた複
合板から実ゞ施例/と同様に試料を切り出しねしり試験
を行なった。Comparative Example The same oxygen-free copper plate as Example/ was degreased and cleaned, and
The same sintered molybdenum plate was degreased, but the degreased oxygen-free copper plate was brought into pressure contact with both surfaces without applying a thin surface coating layer, and treated in a hydrogen atmosphere at 1000 C for 2 hours, and then A sample was cut out from the composite plate obtained by cooling in a furnace in an inert atmosphere and subjected to a torsion test in the same manner as in Example.
以上の実施例/〜乙及び比較例の試験結果を第1表にま
とめて示す。The test results of the above Examples/--B and Comparative Examples are summarized in Table 1.
第 / 表Chapter / Table
Claims (1)
、金、銀あるいはそれらの合金の被覆薄層を形成し、該
被覆薄層にモリブデン基板と幅及び長さが等しいかより
大きい銅、ニッケル、金、銀の金属板あるいはそれらの
合金板を全面で重ね、真空、不活性あるいは還元性雰囲
気中で加熱加圧して接合することを特徴とするモリブデ
ン基複合板の製造方法。(1) A thin coating layer of copper, gold, silver, or an alloy thereof is formed on one or both sides of a molybdenum substrate, and the thin coating layer is coated with copper, nickel, or the like having a width and length equal to or greater than that of the molybdenum substrate. A method for producing a molybdenum-based composite plate, which comprises stacking gold and silver metal plates or alloy plates thereof over the entire surface and joining them by heating and pressing in a vacuum, inert or reducing atmosphere.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP22104182A JPS59110485A (en) | 1982-12-15 | 1982-12-15 | Production of molybdenum composite plate |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP22104182A JPS59110485A (en) | 1982-12-15 | 1982-12-15 | Production of molybdenum composite plate |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS59110485A true JPS59110485A (en) | 1984-06-26 |
JPH0258036B2 JPH0258036B2 (en) | 1990-12-06 |
Family
ID=16760557
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP22104182A Granted JPS59110485A (en) | 1982-12-15 | 1982-12-15 | Production of molybdenum composite plate |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS59110485A (en) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63183187A (en) * | 1987-01-23 | 1988-07-28 | Tokyo Tungsten Co Ltd | Composite electrode material and its production |
JPS63183188A (en) * | 1987-01-23 | 1988-07-28 | Tokyo Tungsten Co Ltd | Composite electrode material and its production |
JPH01178383A (en) * | 1988-01-08 | 1989-07-14 | Toshiba Corp | Joining body and its manufacture |
JPH0397815A (en) * | 1989-09-08 | 1991-04-23 | Kuroki Kogyosho:Kk | Insert material for joining |
CN114559147A (en) * | 2021-04-21 | 2022-05-31 | 河南科技大学 | Preparation method of copper alloy composite board |
-
1982
- 1982-12-15 JP JP22104182A patent/JPS59110485A/en active Granted
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63183187A (en) * | 1987-01-23 | 1988-07-28 | Tokyo Tungsten Co Ltd | Composite electrode material and its production |
JPS63183188A (en) * | 1987-01-23 | 1988-07-28 | Tokyo Tungsten Co Ltd | Composite electrode material and its production |
JPH01178383A (en) * | 1988-01-08 | 1989-07-14 | Toshiba Corp | Joining body and its manufacture |
JPH0397815A (en) * | 1989-09-08 | 1991-04-23 | Kuroki Kogyosho:Kk | Insert material for joining |
JPH0525932B2 (en) * | 1989-09-08 | 1993-04-14 | Kuroki Kogyosho Kk | |
CN114559147A (en) * | 2021-04-21 | 2022-05-31 | 河南科技大学 | Preparation method of copper alloy composite board |
CN114559147B (en) * | 2021-04-21 | 2024-03-12 | 河南科技大学 | Preparation method of copper alloy composite board |
Also Published As
Publication number | Publication date |
---|---|
JPH0258036B2 (en) | 1990-12-06 |
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