JPS59144139A - Manufacture of molybdenum-based composite plate - Google Patents

Manufacture of molybdenum-based composite plate

Info

Publication number
JPS59144139A
JPS59144139A JP1906283A JP1906283A JPS59144139A JP S59144139 A JPS59144139 A JP S59144139A JP 1906283 A JP1906283 A JP 1906283A JP 1906283 A JP1906283 A JP 1906283A JP S59144139 A JPS59144139 A JP S59144139A
Authority
JP
Japan
Prior art keywords
plates
molybdenum
plate
nickel
width
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1906283A
Other languages
Japanese (ja)
Inventor
Kikuo Nishi
喜久雄 西
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Metal Mining Co Ltd
Original Assignee
Sumitomo Metal Mining Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Metal Mining Co Ltd filed Critical Sumitomo Metal Mining Co Ltd
Priority to JP1906283A priority Critical patent/JPS59144139A/en
Publication of JPS59144139A publication Critical patent/JPS59144139A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/80Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
    • H01L24/83Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L24/26Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/80Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
    • H01L2224/83Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector
    • H01L2224/8319Arrangement of the layer connectors prior to mounting
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/80Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
    • H01L2224/83Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector
    • H01L2224/838Bonding techniques
    • H01L2224/8385Bonding techniques using a polymer adhesive, e.g. an adhesive based on silicone, epoxy, polyimide, polyester
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01029Copper [Cu]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01042Molybdenum [Mo]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/06Polymers
    • H01L2924/078Adhesive characteristics other than chemical
    • H01L2924/07802Adhesive characteristics other than chemical not being an ohmic electrical conductor

Abstract

PURPOSE:To obtain a clad plate which has good adhesiveness by forming thin layer of nickel on one or both side overall surfaces of a molybdenum base plate, superposing metal plates on the entire surfaces and then heating under pressure the plate in reducing atmosphere. CONSTITUTION:Tough pitch copper plate which has, for example, 420mm. in length, 40mm. in width and 1mm. in thickness, is dipped in an organic solvent, and cleaned by supersonic wave to degrease the surfaces of the plate. After the surfaces of sintered molybdenum plates which respectively have 380mm. in length, 35mm. in width and 420mm. in length, 40mm. in width, and 1mm. in thickness are, on the other hand, similarly degreased, the entire both surfaces of the plates are plated by nickel in thickness of approx. 1mum, and heated at 700 deg.C for 1hr to diffuse the nickel in the molybdenum. Then, the copper plates are superposed on the both overall surfaces of the molybdenum plates, mica plates are contacted on the outermost layers of the plates, set to a pressurizing jig, and the superposed plates are pressurized and kept in pressure contacting state. These plates are heat treated at 1,000 deg.C in hydrogen atmosphere for 2hr, then cooled in the furnace in inert gas atmosphere, and then removed.

Description

【発明の詳細な説明】 この発明は半導体装置の温度補償板として用いられるモ
リブデン板の片面あるいは両面に他の金属または合金の
板を接着させた密着性のよいモリブデン基複合板の製造
方法に関する。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method for manufacturing a molybdenum substrate composite plate with good adhesion, which is used as a temperature compensating plate for a semiconductor device, in which a plate of another metal or alloy is adhered to one or both sides of a molybdenum plate.

モリブデンは、熱膨張係数がシリコンの熱膨張係数に近
似しているため半導体部品のシリコン素子の熱ひず4み
による破損を防止するための温度補償板として使用され
ている。
Since molybdenum has a coefficient of thermal expansion close to that of silicon, it is used as a temperature compensating plate for preventing damage to silicon elements of semiconductor components due to thermal strain.

このモリブデン温度補償板の接合時の工程を簡略化する
ためにモリブデン板の片面あるいは両面に銅や銀などを
接合させたクラツド板が使用されることがある。しかし
ながらこのようなりラッド板は金属へラダー上へシリコ
ン素子を接合する時の加熱や半導体装置使用中のヒート
サイクルの繰り返しによってクラッド面が剥離する等の
問題が生じ易く、密着強度の高いクラツド板が要求され
ていた。
In order to simplify the bonding process for this molybdenum temperature compensating plate, a clad plate in which copper, silver, or the like is bonded to one or both sides of a molybdenum plate is sometimes used. However, such a clad plate is prone to problems such as peeling of the cladding surface due to heating when bonding a silicon element onto a metal ladder or repeated heat cycles during use of a semiconductor device, so a clad plate with high adhesion strength is It was requested.

モリブデン板としては一般に焼結材が用いられるが、機
械的性質が脆弱で、硬度も高く、クラツド板の製造方法
として一般に用いられているロール圧着法では希望する
ような高い密着強度は得られない欠点があったg 出願人は上記の欠点を解消し密着性の良好なモリブデン
基複合板の製造方法として先に特願昭37−22IO’
lI号を出願した。この方法はモリブデン基板に銅、金
、銀あるいはそれらの合金の被覆薄層を形成し、その上
にモリブデン基板と同寸法があるいは寸法の大きい銅、
ニッケル、金、銀の金属板あるいはそれらの合金板を重
ねて真空、不活性あるいは還元性雰囲気中で加熱加圧し
て接合すると密接性のよい複合板が得られるものであっ
て、特に良好な密着性が要求されるときにはクラッドし
ようとする金属板の寸法は幅、長さ共モリブデン基板の
寸法に対し八−倍以上あることが好ま゛しかった。
Sintered materials are generally used as molybdenum plates, but they have weak mechanical properties and high hardness, and the desired high adhesion strength cannot be obtained using the roll crimping method commonly used for manufacturing clad plates. The applicant previously proposed a method for manufacturing a molybdenum-based composite plate with good adhesion by solving the above-mentioned drawbacks, in the patent application No. 37-22 IO'.
No. 1I was filed. This method involves forming a thin coating layer of copper, gold, silver, or their alloys on a molybdenum substrate, and then coating a thin layer of copper, which has the same or larger dimensions as the molybdenum substrate.
A composite plate with good adhesion can be obtained by stacking nickel, gold, silver metal plates or their alloy plates and joining them under heat and pressure in a vacuum, inert or reducing atmosphere, and particularly good adhesion. When high performance is required, the dimensions of the metal plate to be clad are preferably eight times or more larger than the dimensions of the molybdenum substrate in both width and length.

発明者は種々研究の結果モリブデン基板にニッケルある
いはニッケル合金の被覆を施すと前記方法よりもさらに
優れた密着性のあるモリブデン基複合板が得られること
を見出したものである。
As a result of various studies, the inventors have discovered that by coating a molybdenum substrate with nickel or a nickel alloy, a molybdenum substrate composite plate with even better adhesion than the above method can be obtained.

本発明はモリブデン基板の片面又は両面の全面にニッケ
ルあるいはニッケル合金の被覆薄層を形成した後、該被
覆薄層に基板と幅及び長さが等しいかより大きい金属板
を全面で重ね、真空、不活性、あるいは還元性雰囲気中
で加圧加熱して接合するものである。
In the present invention, a thin coating layer of nickel or nickel alloy is formed on one or both sides of a molybdenum substrate, and then a metal plate having the same width and length as the substrate or larger is superimposed on the thin coating layer, and then vacuum Bonding is performed by pressurizing and heating in an inert or reducing atmosphere.

本発明においてはモリブデン基板のクラッドをしようと
する面上に予めニッケルあるいはニッケル合金の被覆薄
層を形成させることが必要で、ニッケル合金としてはニ
ッケルー銅、ニッケルー金、ニッケルー銀合金が好まし
い。
In the present invention, it is necessary to previously form a coating thin layer of nickel or a nickel alloy on the surface of the molybdenum substrate to be clad, and the nickel alloy is preferably nickel-copper, nickel-gold, or nickel-silver alloy.

被覆方法としては被覆する面を洗浄、脱脂した後メッキ
、蒸着、溶着等一般的な方法を用いることができる。被
覆薄層の厚さは0.3〜sttm程度が最適である。こ
れらの被覆薄層は熱処理等を施してモリブデン基板中へ
拡散させておくのが好ましい。
As a coating method, general methods such as plating, vapor deposition, welding, etc. can be used after cleaning and degreasing the surface to be coated. The optimal thickness of the thin coating layer is about 0.3 to sttm. Preferably, these thin coating layers are diffused into the molybdenum substrate by heat treatment or the like.

本発明の製造方法において、クラッドしようとする金属
としては、銅、ニッケル、金、銀の金属板、あるいはそ
れらの合金板が適しており、この中では銅が最も好まし
く、モリブデン基板と幅及び長さが同寸法の金属板ある
いは合金板を被覆薄層の形成されたモリブデン基板の被
覆薄層と重ねて加圧加熱処理しても良いが、モリブデン
基板より幅及び長さが大きい金属板あるいは合金板を被
覆薄層の形成されたモリブデン基板の被覆薄層と重ねて
加圧加熱処理すると更によく接着する。
In the manufacturing method of the present invention, copper, nickel, gold, silver metal plates, or alloy plates thereof are suitable as the metal to be clad, and among these, copper is the most preferable, and the width and length of the molybdenum substrate A metal plate or alloy plate with the same dimensions may be stacked with the thin coating layer of a molybdenum substrate on which a thin coating layer has been formed, and then subjected to pressure and heat treatment. When the plate is laminated with a thin coating layer of a molybdenum substrate on which a thin coating layer has been formed and subjected to pressure and heat treatment, the adhesion becomes even better.

この場合クラッドしようとする金属の寸法(↓暢・長さ
、共モリブデン基板の幅及び長さに対し/、7倍以上あ
ると一層接着強度が天きくなる。
In this case, if the dimensions of the metal to be cladded are 7 times or more the width and length of the molybdenum substrate, the bonding strength will be even higher.

熱処理の雰囲気は真空、不活性あるいは還元性雰囲気中
で行なうことが必要で、酸化性雰囲気は避けるべきであ
る。
The heat treatment must be carried out in a vacuum, inert or reducing atmosphere, and an oxidizing atmosphere should be avoided.

熱処理の温度はクラッドしようとしている金属または合
金の融点より僅かに低い温度で行なうと最も接着強度を
大きくできるが、幅及び長さかモリブデン基板の/、7
倍以上のときは融点より4t000位低い温度範囲まで
は被覆薄層を設けない場合よりも接着強度をよくできる
。しかしクラッドしようとする金属板の寸法がモリブデ
ン基板と同寸法のときには融点より3so c低い温度
までの範囲に保持することによって接着強度を被覆薄層
を設けない場合よりよくできる。
The bonding strength can be maximized by heat treatment at a temperature slightly lower than the melting point of the metal or alloy to be clad, but the width and length of the molybdenum substrate
When the temperature is more than twice that, the adhesive strength can be improved up to a temperature range of about 4t000 lower than the melting point than when no thin coating layer is provided. However, when the dimensions of the metal plate to be clad are the same as those of the molybdenum substrate, by maintaining the temperature within a range of 3 soc below the melting point, the bonding strength can be improved compared to the case where no thin coating layer is provided.

熱処理時の加圧はモリブデン基板の被覆薄層に重ねたク
ラツド材とが充分密に接触するよう適当な治具に挾んで
加圧ねじて締付ける等の手段を用いることができ、治具
とクラツド材との接触面には雲母板等を介在させてゆ着
を防止すること、が好ましい。
Pressure during heat treatment can be applied by means such as clamping the material in an appropriate jig and tightening it with pressure screws so that the thin coating layer of the molybdenum substrate and the cladding material are in close contact with each other. Preferably, a mica plate or the like is interposed on the contact surface with the material to prevent sagging.

モリブデン基板へのクラツド材の接合は、その用途に応
じて片面でも、両面でも良く、クラツド材は基板の両面
の材質が異なっていても良く、又モリブデン基板2枚ま
たはそれ以上を中間にクラツド材を介して多層に重ね合
わせた複合板も製造することができる。
The cladding material may be bonded to a molybdenum substrate on one or both sides depending on the application.The cladding material may be made of different materials on both sides of the substrate, or the cladding material may be bonded between two or more molybdenum substrates. It is also possible to produce composite plates in which multiple layers are stacked together.

以下実施例について説明する。Examples will be described below.

実施例/ 長さit、2omm、幅11Qm*、厚さ/關の無酸素
銅板を有機溶剤中に浸漬し、超音波洗浄を施して表面脱
脂処理する。一方長さ3g0mm、幅3j;mm、及び
長さqxo mm %幅グθ關、厚さ各/ mmの焼結
モリブデン板の表面を同様に脱脂処理した後、両面全面
に厚さ約/μmのニッケルメ°ツキを施こし、不活性雰
囲気中で700C,S2時間加熱してニッケルをモリブ
デン中に拡散させ、次いでこのモリブデン板の両面に前
記脱脂した銅板を清浄な環境下でモリブデン板より銅板
の方が大きいときはモリブデン板の周りで銅板が突出す
るように全面で重ね合わせ、最外層に雲母板を当てて加
圧治具にセットして重ねた板を加圧圧接状態とする。重
ね合わせた板を加圧治具ごとボートにのせて炉に装入し
、/θOOC。
Example/An oxygen-free copper plate having a length of 2 om, a width of 11 Qm*, and a thickness of 1/2 mm is immersed in an organic solvent and subjected to ultrasonic cleaning to degrease the surface. On the other hand, after degreasing the surface of a sintered molybdenum plate with a length of 3g0mm, a width of 3j; Nickel plating is applied and heated in an inert atmosphere at 700C for 2 hours to diffuse nickel into molybdenum, and then the degreased copper plate is placed on both sides of this molybdenum plate in a clean environment, so that the copper plate is better than the molybdenum plate. When the amount is large, the copper plate is overlapped on the entire surface so that it protrudes around the molybdenum plate, the mica plate is placed on the outermost layer, and the plate is set in a pressure jig to press the stacked plates together. Place the stacked plates together with the pressure jig on a boat and charge it into the furnace, /θOOC.

水素雰囲気中で2時間熱処理し、次いで不活性雰囲気中
で炉中冷却した後取り出した。得られた複合板の中央部
から長さるQ mm 、幅約3 mmの試料を切出し、
試料の両端を万力とチャックで、39 mmの間隔で厚
さ方向に挾みチャックを9゜。右にまわし、これを元に
戻し、次に左に900まわし元に戻すねしり試験を7回
と勘定して試料にクラックが発生するまでの回数を試料
10ケの平均値で表わして密着性の良否を調査した。
It was heat treated in a hydrogen atmosphere for 2 hours, then cooled in a furnace in an inert atmosphere, and then taken out. A sample with a length of Q mm and a width of about 3 mm was cut out from the center of the obtained composite plate, and
Use a vise and chuck to hold both ends of the sample in the thickness direction at 39 mm intervals, and hold the chuck at 9 degrees. Turn clockwise, return to original position, then turn counterclockwise 900° and return to original position. Counting the twisting test as 7 times, the number of times until a crack occurs in the sample is expressed as the average value of 10 samples, and the adhesion is measured. We investigated the quality of the product.

実施例、2〜7 実施例/と同様の材料を用い、クラツド材をモリブデン
板と接触させて加圧加熱する温度のみを900、 汀O
Xg00.7!0.700. A!;QC(1)各温度
に変化させ、他は実施例/と同様゛にしてねじり試験を
行なった。
Examples, 2 to 7 Using the same materials as in Example//, only the temperature at which the clad material was brought into contact with the molybdenum plate and heated under pressure was set to 900 and 0.
Xg00.7!0.700. A! QC (1) A torsion test was conducted in the same manner as in Example 1 except that the temperature was varied.

実施例g 長さllλ0關、幅lo關、厚さ/馴の3重量%の銅を
含有した銀板を脱脂洗浄し、一方焼結モリブデン板は実
施例/と同寸法のものを準備し、同様の処理を施こし、
このモリブデン板の両面に前記脱脂した銅入り銀板を実
施例/と同様接触させて圧接してg00Cc固相線gq
Or):)の水素雰囲気中で2時間熱処理し、次いで不
活性雰囲気中で炉中冷却し、得られた複合板から実施例
/と同様に試料を切り出し、ねじり試験を行なった。
Example g A silver plate containing 3% by weight of copper with a length of 11λ0, a width of 10, and a thickness/width was degreased and cleaned, while a sintered molybdenum plate with the same dimensions as Example/ was prepared, Apply the same treatment,
The degreased copper-containing silver plate is brought into contact with both sides of this molybdenum plate in the same manner as in Example/, and the g00Cc solidus line gq
Or):) was heat treated in a hydrogen atmosphere for 2 hours, and then cooled in a furnace in an inert atmosphere. Samples were cut out from the obtained composite plate in the same manner as in Example 1 and subjected to a torsion test.

比較例/ 実施例/と同じ無酸素銅板を脱脂洗浄し、また実施例/
と同じ焼結モリブデン板を脱脂処理したま\で表面被覆
薄層を施こさずに両面全面に前記脱脂した無酸素銅板を
加圧接触せしめて10θOCの水素雰囲気中で2時間処
理し、次いで不活性雰囲気中で炉中冷却し得られた複合
板から実施例/と同様に試料を切り出しねじり試験を行
なった。
The same oxygen-free copper plate as Comparative Example/Example/ was degreased and cleaned, and the same oxygen-free copper plate as Example/
The same sintered molybdenum plate was degreased, but the degreased oxygen-free copper plate was brought into pressure contact with both sides without applying a thin surface coating layer, and treated in a hydrogen atmosphere at 10θOC for 2 hours. A sample was cut out from the composite plate obtained by cooling in a furnace in an active atmosphere and subjected to a torsion test in the same manner as in Example.

比較例コル乙 実施例/と同じ無酸素銅−板を脱脂洗浄し、また実施例
/と同じ焼結モリブデン板を脱脂処理した後両面全面に
厚さ約/μmの銅メッキを施こし、不活性雰囲気中で同
様に熱処理を施こし、このモリブデン板の両面に前記脱
脂した無酸素銅板を実施例/に記載したと同様に重ね合
わせて1ooo 、qoo、g3θ、goo、7左θC
各温度に変化させて加圧加熱処理を行ない、同様にねじ
り試験を行なった。
Comparative Example Col B The same oxygen-free copper plate as Example / was degreased and cleaned, and the same sintered molybdenum plate as Example / was degreased, and then copper plating with a thickness of about /μm was applied to both surfaces. Heat treatment was performed in the same manner in an active atmosphere, and the degreased oxygen-free copper plates were superimposed on both sides of the molybdenum plate in the same manner as described in Examples/100, qoo, g3θ, goo, 7 left θC.
Pressure and heat treatment was performed at various temperatures, and a torsion test was conducted in the same manner.

以上の実施例/〜g及び比較例/〜乙の試験結果を第1
表にまとめて示す。
The test results of the above Examples/~g and Comparative Examples/~B are
They are summarized in the table.

第     /     表 ねじり試験量 「/ 無酸素銅  ニッケル  1000    9.
 、?       g、 g上表の結果からクラツド
材の寸法がモリブデン基板より幅、長さ共約/、/倍以
上ある場合には加熱温度が実施例A/〜乙の無酸素銅の
溶融温度iog、:y Cより約tioo c低い70
0Cまでのものは密着性が比較例/のモリブデン基板に
被覆薄層を施こさないものに比して非常に優れているが
、実施例A7は溶融温度よりttoo C以上低い温度
の加熱で比較例/に比して顕著な差がなく、またクラツ
ド材の大きさがモリブデン基板と同寸法の場合には加熱
温度が溶融温度より約350C低い7タQCまでのもの
は良好な密着性を示した。また実施例gのAg −Cu
板も加熱温度がこの合金の固相線のざ70Cよりも約7
0 tZ’低く、密着性が優れていることを示している
Chapter / Table Torsion test amount / Oxygen-free copper nickel 1000 9.
,? g, g From the results in the table above, if the dimensions of the clad material are more than double the width and length of the molybdenum substrate, the heating temperature will be the melting temperature of the oxygen-free copper of Examples A/-B: 70 which is about tioo c lower than y C
The adhesion of the sample up to 0C is very superior to that of the comparative example, which does not have a thin coating layer applied to the molybdenum substrate, but Example A7 was compared by heating at a temperature more than ttoo C below the melting temperature. There is no noticeable difference compared to example /, and when the size of the cladding material is the same as that of the molybdenum substrate, the heating temperature is about 350C lower than the melting temperature up to 7T QC, showing good adhesion. Ta. Moreover, Ag-Cu of Example g
The heating temperature of the plate is about 7°C higher than the solidus line of this alloy, which is 70°C.
0 tZ' is low, indicating excellent adhesion.

また実施例/〜Sと比較例λ〜乙を対比すれば明らかな
ように本発明に用いられるモリブデン基板への被覆材料
であるニッケルは銅を被覆した場合に比してその密着性
が大幅に優れていることを示している。
Furthermore, as is clear from a comparison between Examples/~S and Comparative Examples λ~B, the adhesion of nickel, which is the coating material to the molybdenum substrate used in the present invention, is significantly greater than that when coated with copper. It shows that it is excellent.

Claims (1)

【特許請求の範囲】[Claims] (1)  モリブデン基板の片面または両面の全面にニ
ッケルあるいはニッケル合金の被覆薄層を形成し、該被
覆薄層にモリブデン基板と幅及び゛長さが等しいかより
大きい銅、ニッケル、金、銀の金属板あるいはそれらの
合金板を全面で重ね、真空、不活性あるいは還元性雰囲
気中で加熱加圧して接合することを特徴とするモリブデ
ン基複合板の製造方法。
(1) A thin coating layer of nickel or nickel alloy is formed on one or both sides of a molybdenum substrate, and a thin coating layer of copper, nickel, gold, or silver with a width and length equal to or greater than that of the molybdenum substrate is formed on the thin coating layer. A method for producing a molybdenum-based composite plate, which comprises stacking metal plates or alloy plates thereof on their entire surface and joining them by heating and pressing in a vacuum, inert or reducing atmosphere.
JP1906283A 1983-02-07 1983-02-07 Manufacture of molybdenum-based composite plate Pending JPS59144139A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1906283A JPS59144139A (en) 1983-02-07 1983-02-07 Manufacture of molybdenum-based composite plate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1906283A JPS59144139A (en) 1983-02-07 1983-02-07 Manufacture of molybdenum-based composite plate

Publications (1)

Publication Number Publication Date
JPS59144139A true JPS59144139A (en) 1984-08-18

Family

ID=11988942

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1906283A Pending JPS59144139A (en) 1983-02-07 1983-02-07 Manufacture of molybdenum-based composite plate

Country Status (1)

Country Link
JP (1) JPS59144139A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62149433A (en) * 1985-12-25 1987-07-03 株式会社東芝 Copper clad molybdenum plate and manufacture thereof

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62149433A (en) * 1985-12-25 1987-07-03 株式会社東芝 Copper clad molybdenum plate and manufacture thereof

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