JPS59101848A - 真空処理装置 - Google Patents

真空処理装置

Info

Publication number
JPS59101848A
JPS59101848A JP57211095A JP21109582A JPS59101848A JP S59101848 A JPS59101848 A JP S59101848A JP 57211095 A JP57211095 A JP 57211095A JP 21109582 A JP21109582 A JP 21109582A JP S59101848 A JPS59101848 A JP S59101848A
Authority
JP
Japan
Prior art keywords
wafer
chamber
buffer area
vacuum
moves
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP57211095A
Other languages
English (en)
Japanese (ja)
Other versions
JPS635898B2 (enExample
Inventor
Osamu Watanabe
修 渡辺
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokuda Seisakusho Co Ltd
Original Assignee
Tokuda Seisakusho Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokuda Seisakusho Co Ltd filed Critical Tokuda Seisakusho Co Ltd
Priority to JP57211095A priority Critical patent/JPS59101848A/ja
Publication of JPS59101848A publication Critical patent/JPS59101848A/ja
Publication of JPS635898B2 publication Critical patent/JPS635898B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H10P72/3411—
    • H10P72/0452—
    • H10P72/3306—

Landscapes

  • Physical Vapour Deposition (AREA)
JP57211095A 1982-12-01 1982-12-01 真空処理装置 Granted JPS59101848A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57211095A JPS59101848A (ja) 1982-12-01 1982-12-01 真空処理装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57211095A JPS59101848A (ja) 1982-12-01 1982-12-01 真空処理装置

Publications (2)

Publication Number Publication Date
JPS59101848A true JPS59101848A (ja) 1984-06-12
JPS635898B2 JPS635898B2 (enExample) 1988-02-05

Family

ID=16600326

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57211095A Granted JPS59101848A (ja) 1982-12-01 1982-12-01 真空処理装置

Country Status (1)

Country Link
JP (1) JPS59101848A (enExample)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5599739A (en) * 1979-01-26 1980-07-30 Hitachi Ltd Wafer treating method and its equipment

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5599739A (en) * 1979-01-26 1980-07-30 Hitachi Ltd Wafer treating method and its equipment

Also Published As

Publication number Publication date
JPS635898B2 (enExample) 1988-02-05

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