JPS59101749A - イオン源およびイオンビーム形成方法 - Google Patents

イオン源およびイオンビーム形成方法

Info

Publication number
JPS59101749A
JPS59101749A JP57209413A JP20941382A JPS59101749A JP S59101749 A JPS59101749 A JP S59101749A JP 57209413 A JP57209413 A JP 57209413A JP 20941382 A JP20941382 A JP 20941382A JP S59101749 A JPS59101749 A JP S59101749A
Authority
JP
Japan
Prior art keywords
ion
ion source
emitter
tip
reservoir
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP57209413A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0439181B2 (enrdf_load_stackoverflow
Inventor
Hifumi Tamura
田村　一二三
Toru Ishitani
亨 石谷
Shoji Yadori
章二 宿利
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP57209413A priority Critical patent/JPS59101749A/ja
Publication of JPS59101749A publication Critical patent/JPS59101749A/ja
Publication of JPH0439181B2 publication Critical patent/JPH0439181B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00—Ion beam tubes
    • H01J27/02—Ion sources; Ion guns
    • H01J27/26—Ion sources; Ion guns using surface ionisation, e.g. field effect ion sources, thermionic ion sources

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Combustion & Propulsion (AREA)
  • Electron Sources, Ion Sources (AREA)
JP57209413A 1982-12-01 1982-12-01 イオン源およびイオンビーム形成方法 Granted JPS59101749A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57209413A JPS59101749A (ja) 1982-12-01 1982-12-01 イオン源およびイオンビーム形成方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57209413A JPS59101749A (ja) 1982-12-01 1982-12-01 イオン源およびイオンビーム形成方法

Publications (2)

Publication Number Publication Date
JPS59101749A true JPS59101749A (ja) 1984-06-12
JPH0439181B2 JPH0439181B2 (enrdf_load_stackoverflow) 1992-06-26

Family

ID=16572465

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57209413A Granted JPS59101749A (ja) 1982-12-01 1982-12-01 イオン源およびイオンビーム形成方法

Country Status (1)

Country Link
JP (1) JPS59101749A (enrdf_load_stackoverflow)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63276858A (ja) * 1987-03-13 1988-11-15 イアン・ジー・ブラウン イオンビーム発生装置
US8330118B2 (en) * 2008-05-16 2012-12-11 Semequip, Inc. Multi mode ion source
JP2022529606A (ja) * 2019-04-16 2022-06-23 アクセリス テクノロジーズ， インコーポレイテッド 複数のアークチャンバを備えるイオン源

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5546425A (en) * 1978-09-29 1980-04-01 Jeol Ltd Electron-bombardment ion source for solid sample
JPS5574050A (en) * 1978-11-29 1980-06-04 Toshiba Corp Ion source device for particle accelerator
JPS56124953U (enrdf_load_stackoverflow) * 1980-02-26 1981-09-22
JPS56127661U (enrdf_load_stackoverflow) * 1980-02-29 1981-09-29
JPS56127660U (enrdf_load_stackoverflow) * 1980-02-29 1981-09-29
JPS5730243A (en) * 1980-07-31 1982-02-18 Rikagaku Kenkyusho Ion beam forming method
JPS5774944A (en) * 1980-10-25 1982-05-11 Toshiba Corp Field radiation type ion generator

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5546425A (en) * 1978-09-29 1980-04-01 Jeol Ltd Electron-bombardment ion source for solid sample
JPS5574050A (en) * 1978-11-29 1980-06-04 Toshiba Corp Ion source device for particle accelerator
JPS56124953U (enrdf_load_stackoverflow) * 1980-02-26 1981-09-22
JPS56127661U (enrdf_load_stackoverflow) * 1980-02-29 1981-09-29
JPS56127660U (enrdf_load_stackoverflow) * 1980-02-29 1981-09-29
JPS5730243A (en) * 1980-07-31 1982-02-18 Rikagaku Kenkyusho Ion beam forming method
JPS5774944A (en) * 1980-10-25 1982-05-11 Toshiba Corp Field radiation type ion generator

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63276858A (ja) * 1987-03-13 1988-11-15 イアン・ジー・ブラウン イオンビーム発生装置
US8330118B2 (en) * 2008-05-16 2012-12-11 Semequip, Inc. Multi mode ion source
JP2022529606A (ja) * 2019-04-16 2022-06-23 アクセリス テクノロジーズ， インコーポレイテッド 複数のアークチャンバを備えるイオン源

Also Published As

Publication number Publication date
JPH0439181B2 (enrdf_load_stackoverflow) 1992-06-26

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