JPS5895694A - 分子線結晶成長方法 - Google Patents
分子線結晶成長方法Info
- Publication number
- JPS5895694A JPS5895694A JP19260081A JP19260081A JPS5895694A JP S5895694 A JPS5895694 A JP S5895694A JP 19260081 A JP19260081 A JP 19260081A JP 19260081 A JP19260081 A JP 19260081A JP S5895694 A JPS5895694 A JP S5895694A
- Authority
- JP
- Japan
- Prior art keywords
- molecular beam
- crystal growth
- molecular beams
- substrate
- bell jar
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B23/00—Single-crystal growth by condensing evaporated or sublimed materials
- C30B23/02—Epitaxial-layer growth
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP19260081A JPS5895694A (ja) | 1981-11-30 | 1981-11-30 | 分子線結晶成長方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP19260081A JPS5895694A (ja) | 1981-11-30 | 1981-11-30 | 分子線結晶成長方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5895694A true JPS5895694A (ja) | 1983-06-07 |
| JPH039076B2 JPH039076B2 (enrdf_load_html_response) | 1991-02-07 |
Family
ID=16293956
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP19260081A Granted JPS5895694A (ja) | 1981-11-30 | 1981-11-30 | 分子線結晶成長方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5895694A (enrdf_load_html_response) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN119876861A (zh) * | 2024-09-29 | 2025-04-25 | 西安交通大学 | 一种超高真空多源共沉积装置及其工作方法 |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS52156781A (en) * | 1976-06-23 | 1977-12-27 | Matsushita Electric Ind Co Ltd | Growth of crystal with molecular beam |
-
1981
- 1981-11-30 JP JP19260081A patent/JPS5895694A/ja active Granted
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS52156781A (en) * | 1976-06-23 | 1977-12-27 | Matsushita Electric Ind Co Ltd | Growth of crystal with molecular beam |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN119876861A (zh) * | 2024-09-29 | 2025-04-25 | 西安交通大学 | 一种超高真空多源共沉积装置及其工作方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH039076B2 (enrdf_load_html_response) | 1991-02-07 |
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