JPS5884974A - エツチング剤組成物 - Google Patents

エツチング剤組成物

Info

Publication number
JPS5884974A
JPS5884974A JP56182444A JP18244481A JPS5884974A JP S5884974 A JPS5884974 A JP S5884974A JP 56182444 A JP56182444 A JP 56182444A JP 18244481 A JP18244481 A JP 18244481A JP S5884974 A JPS5884974 A JP S5884974A
Authority
JP
Japan
Prior art keywords
fluorine
salt
acid
etching
composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP56182444A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0133550B2 (cs
Inventor
Iwao Hisamoto
久本　巖
Tomoaki Maeda
前田　知明
Satoru Matsuda
悟 松田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Daikin Industries Ltd
Original Assignee
Daikin Industries Ltd
Daikin Kogyo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Daikin Industries Ltd, Daikin Kogyo Co Ltd filed Critical Daikin Industries Ltd
Priority to JP56182444A priority Critical patent/JPS5884974A/ja
Publication of JPS5884974A publication Critical patent/JPS5884974A/ja
Publication of JPH0133550B2 publication Critical patent/JPH0133550B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • ing And Chemical Polishing (AREA)
JP56182444A 1981-11-13 1981-11-13 エツチング剤組成物 Granted JPS5884974A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56182444A JPS5884974A (ja) 1981-11-13 1981-11-13 エツチング剤組成物

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56182444A JPS5884974A (ja) 1981-11-13 1981-11-13 エツチング剤組成物

Publications (2)

Publication Number Publication Date
JPS5884974A true JPS5884974A (ja) 1983-05-21
JPH0133550B2 JPH0133550B2 (cs) 1989-07-13

Family

ID=16118369

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56182444A Granted JPS5884974A (ja) 1981-11-13 1981-11-13 エツチング剤組成物

Country Status (1)

Country Link
JP (1) JPS5884974A (cs)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4517106A (en) * 1984-04-26 1985-05-14 Allied Corporation Soluble surfactant additives for ammonium fluoride/hydrofluoric acid oxide etchant solutions
US4582624A (en) * 1983-08-10 1986-04-15 Daikin Industris, Ltd. Etchant composition
JPS61207586A (ja) * 1985-03-12 1986-09-13 Morita Kagaku Kogyo Kk 二酸化シリコン膜のエツチング液

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4582624A (en) * 1983-08-10 1986-04-15 Daikin Industris, Ltd. Etchant composition
US4517106A (en) * 1984-04-26 1985-05-14 Allied Corporation Soluble surfactant additives for ammonium fluoride/hydrofluoric acid oxide etchant solutions
JPS61207586A (ja) * 1985-03-12 1986-09-13 Morita Kagaku Kogyo Kk 二酸化シリコン膜のエツチング液

Also Published As

Publication number Publication date
JPH0133550B2 (cs) 1989-07-13

Similar Documents

Publication Publication Date Title
JPS6039176A (ja) エッチング剤組成物
US4795582A (en) Surface treating composition for micro processing
US5705089A (en) Cleaning fluid for semiconductor substrate
KR900001290B1 (ko) 부식액 조성물
EP0182306B1 (en) Etchant composition
KR900003980B1 (ko) 부식액 조성물 및 그 제조방법
JP2919959B2 (ja) ホトレジストでパターン化された金属層のためのエッチング剤液
GB1589619A (en) Etching polycrystalline silicon
JP2852355B2 (ja) 微細加工表面処理剤
JPS5884974A (ja) エツチング剤組成物
US4761244A (en) Etching solutions containing ammonium fluoride and an alkyl polyaccharide surfactant
JPS6332867B2 (cs)
JPH02240285A (ja) 低表面張力硫酸組成物
JPH0433833B2 (cs)
EP0278628B1 (en) Etching solutions containing ammonium fluoride
JP2001040389A (ja) ウエハ洗浄液
JP3353359B2 (ja) 低表面張力硫酸組成物
JPH04346351A (ja) ホトレジスト用現像液
JPH0413430B2 (cs)
JPH11238725A (ja) エッチング組成物
JPH04346352A (ja) ホトレジスト用現像液
JPH0570798A (ja) 低表面張力硫酸組成物
JPH06200296A (ja) 硫酸組成物
JPH04325599A (ja) 低表面張力を有する硫酸組成物
JPH04323300A (ja) 低表面張力硫酸組成物