JPS5871660A - 薄膜トランジスタの製造方法 - Google Patents

薄膜トランジスタの製造方法

Info

Publication number
JPS5871660A
JPS5871660A JP56169767A JP16976781A JPS5871660A JP S5871660 A JPS5871660 A JP S5871660A JP 56169767 A JP56169767 A JP 56169767A JP 16976781 A JP16976781 A JP 16976781A JP S5871660 A JPS5871660 A JP S5871660A
Authority
JP
Japan
Prior art keywords
amorphous silicon
film
silicon film
sio2
layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP56169767A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0338735B2 (enExample
Inventor
Toshiro Kodama
敏郎 児玉
Satoru Kawai
悟 川井
Nobuyoshi Takagi
高城　信義
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP56169767A priority Critical patent/JPS5871660A/ja
Publication of JPS5871660A publication Critical patent/JPS5871660A/ja
Publication of JPH0338735B2 publication Critical patent/JPH0338735B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00—Field-effect transistors [FET]
    • H10D30/60—Insulated-gate field-effect transistors [IGFET]

Landscapes

  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP56169767A 1981-10-23 1981-10-23 薄膜トランジスタの製造方法 Granted JPS5871660A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56169767A JPS5871660A (ja) 1981-10-23 1981-10-23 薄膜トランジスタの製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56169767A JPS5871660A (ja) 1981-10-23 1981-10-23 薄膜トランジスタの製造方法

Publications (2)

Publication Number Publication Date
JPS5871660A true JPS5871660A (ja) 1983-04-28
JPH0338735B2 JPH0338735B2 (enExample) 1991-06-11

Family

ID=15892471

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56169767A Granted JPS5871660A (ja) 1981-10-23 1981-10-23 薄膜トランジスタの製造方法

Country Status (1)

Country Link
JP (1) JPS5871660A (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63306668A (ja) * 1987-06-09 1988-12-14 Oki Electric Ind Co Ltd 薄膜トランジスタの製造方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63306668A (ja) * 1987-06-09 1988-12-14 Oki Electric Ind Co Ltd 薄膜トランジスタの製造方法

Also Published As

Publication number Publication date
JPH0338735B2 (enExample) 1991-06-11

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