JPS5866330A - 電子ビ−ム描画系の位置補正方法 - Google Patents
電子ビ−ム描画系の位置補正方法Info
- Publication number
- JPS5866330A JPS5866330A JP56165133A JP16513381A JPS5866330A JP S5866330 A JPS5866330 A JP S5866330A JP 56165133 A JP56165133 A JP 56165133A JP 16513381 A JP16513381 A JP 16513381A JP S5866330 A JPS5866330 A JP S5866330A
- Authority
- JP
- Japan
- Prior art keywords
- electron beam
- substrate
- mark
- variation
- drawn
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000010894 electron beam technology Methods 0.000 title claims abstract description 32
- 238000000034 method Methods 0.000 title claims abstract description 25
- 239000000758 substrate Substances 0.000 claims abstract description 46
- 238000005259 measurement Methods 0.000 claims abstract description 27
- 230000003287 optical effect Effects 0.000 claims abstract description 19
- 238000001514 detection method Methods 0.000 claims description 15
- 238000000609 electron-beam lithography Methods 0.000 claims description 10
- 238000006243 chemical reaction Methods 0.000 abstract 1
- 238000005192 partition Methods 0.000 abstract 1
- 229910052751 metal Inorganic materials 0.000 description 6
- 239000002184 metal Substances 0.000 description 6
- 238000001259 photo etching Methods 0.000 description 4
- 239000004065 semiconductor Substances 0.000 description 4
- 239000011521 glass Substances 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 2
- 229910052804 chromium Inorganic materials 0.000 description 2
- 239000011651 chromium Substances 0.000 description 2
- 239000010408 film Substances 0.000 description 2
- WGLPBDUCMAPZCE-UHFFFAOYSA-N Trioxochromium Chemical compound O=[Cr](=O)=O WGLPBDUCMAPZCE-UHFFFAOYSA-N 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 229910000423 chromium oxide Inorganic materials 0.000 description 1
- 230000001276 controlling effect Effects 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000002596 correlated effect Effects 0.000 description 1
- 230000000875 corresponding effect Effects 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 229910001385 heavy metal Inorganic materials 0.000 description 1
- 238000001459 lithography Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
- H01J37/3045—Object or beam position registration
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Electron Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP56165133A JPS5866330A (ja) | 1981-10-15 | 1981-10-15 | 電子ビ−ム描画系の位置補正方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP56165133A JPS5866330A (ja) | 1981-10-15 | 1981-10-15 | 電子ビ−ム描画系の位置補正方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5866330A true JPS5866330A (ja) | 1983-04-20 |
| JPH0336298B2 JPH0336298B2 (enrdf_load_stackoverflow) | 1991-05-31 |
Family
ID=15806522
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP56165133A Granted JPS5866330A (ja) | 1981-10-15 | 1981-10-15 | 電子ビ−ム描画系の位置補正方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5866330A (enrdf_load_stackoverflow) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60254615A (ja) * | 1984-05-30 | 1985-12-16 | Toshiba Mach Co Ltd | 電子ビーム露光における温度測定方法 |
| JPS62173714A (ja) * | 1986-01-27 | 1987-07-30 | Toshiba Mach Co Ltd | 電子ビ−ム描画装置 |
| JPS62217686A (ja) * | 1986-03-19 | 1987-09-25 | Toshiba Mach Co Ltd | レ−ザミラ−の位置変位補正方法 |
| JP2000252204A (ja) * | 1999-03-03 | 2000-09-14 | Nikon Corp | 基準マーク構造体、その製造方法及びそれを用いた荷電粒子線露光装置 |
-
1981
- 1981-10-15 JP JP56165133A patent/JPS5866330A/ja active Granted
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60254615A (ja) * | 1984-05-30 | 1985-12-16 | Toshiba Mach Co Ltd | 電子ビーム露光における温度測定方法 |
| JPS62173714A (ja) * | 1986-01-27 | 1987-07-30 | Toshiba Mach Co Ltd | 電子ビ−ム描画装置 |
| JPS62217686A (ja) * | 1986-03-19 | 1987-09-25 | Toshiba Mach Co Ltd | レ−ザミラ−の位置変位補正方法 |
| JP2000252204A (ja) * | 1999-03-03 | 2000-09-14 | Nikon Corp | 基準マーク構造体、その製造方法及びそれを用いた荷電粒子線露光装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0336298B2 (enrdf_load_stackoverflow) | 1991-05-31 |
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