JPH0336298B2 - - Google Patents

Info

Publication number
JPH0336298B2
JPH0336298B2 JP56165133A JP16513381A JPH0336298B2 JP H0336298 B2 JPH0336298 B2 JP H0336298B2 JP 56165133 A JP56165133 A JP 56165133A JP 16513381 A JP16513381 A JP 16513381A JP H0336298 B2 JPH0336298 B2 JP H0336298B2
Authority
JP
Japan
Prior art keywords
electron beam
substrate
mark
drawn
laser length
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP56165133A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5866330A (ja
Inventor
Tsukasa Sawaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electronics Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electronics Corp filed Critical Matsushita Electronics Corp
Priority to JP56165133A priority Critical patent/JPS5866330A/ja
Publication of JPS5866330A publication Critical patent/JPS5866330A/ja
Publication of JPH0336298B2 publication Critical patent/JPH0336298B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
    • H01J37/3045—Object or beam position registration

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)
JP56165133A 1981-10-15 1981-10-15 電子ビ−ム描画系の位置補正方法 Granted JPS5866330A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56165133A JPS5866330A (ja) 1981-10-15 1981-10-15 電子ビ−ム描画系の位置補正方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56165133A JPS5866330A (ja) 1981-10-15 1981-10-15 電子ビ−ム描画系の位置補正方法

Publications (2)

Publication Number Publication Date
JPS5866330A JPS5866330A (ja) 1983-04-20
JPH0336298B2 true JPH0336298B2 (enrdf_load_stackoverflow) 1991-05-31

Family

ID=15806522

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56165133A Granted JPS5866330A (ja) 1981-10-15 1981-10-15 電子ビ−ム描画系の位置補正方法

Country Status (1)

Country Link
JP (1) JPS5866330A (enrdf_load_stackoverflow)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60254615A (ja) * 1984-05-30 1985-12-16 Toshiba Mach Co Ltd 電子ビーム露光における温度測定方法
JPS62173714A (ja) * 1986-01-27 1987-07-30 Toshiba Mach Co Ltd 電子ビ−ム描画装置
JPH07105324B2 (ja) * 1986-03-19 1995-11-13 東芝機械株式会社 レ−ザミラ−の位置変位補正方法
JP4505662B2 (ja) * 1999-03-03 2010-07-21 株式会社ニコン 基準マーク構造体、その製造方法及びそれを用いた荷電粒子線露光装置

Also Published As

Publication number Publication date
JPS5866330A (ja) 1983-04-20

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