JPS5855736A - 発光分光分析による濃度分布解析装置 - Google Patents

発光分光分析による濃度分布解析装置

Info

Publication number
JPS5855736A
JPS5855736A JP15447781A JP15447781A JPS5855736A JP S5855736 A JPS5855736 A JP S5855736A JP 15447781 A JP15447781 A JP 15447781A JP 15447781 A JP15447781 A JP 15447781A JP S5855736 A JPS5855736 A JP S5855736A
Authority
JP
Japan
Prior art keywords
sample surface
sample
density distribution
analyzing apparatus
scanning
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP15447781A
Other languages
English (en)
Japanese (ja)
Other versions
JPS642214B2 (enrdf_load_html_response
Inventor
Naoki Imamura
直樹 今村
Isao Fukui
福井　勲
Takahide Hirano
平野　隆英
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shimadzu Corp
Shimazu Seisakusho KK
Original Assignee
Shimadzu Corp
Shimazu Seisakusho KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shimadzu Corp, Shimazu Seisakusho KK filed Critical Shimadzu Corp
Priority to JP15447781A priority Critical patent/JPS5855736A/ja
Publication of JPS5855736A publication Critical patent/JPS5855736A/ja
Publication of JPS642214B2 publication Critical patent/JPS642214B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/62—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light
    • G01N21/66—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light electrically excited, e.g. electroluminescence
    • G01N21/67—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light electrically excited, e.g. electroluminescence using electric arcs or discharges

Landscapes

  • Health & Medical Sciences (AREA)
  • Nuclear Medicine, Radiotherapy & Molecular Imaging (AREA)
  • Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Investigating, Analyzing Materials By Fluorescence Or Luminescence (AREA)
JP15447781A 1981-09-28 1981-09-28 発光分光分析による濃度分布解析装置 Granted JPS5855736A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15447781A JPS5855736A (ja) 1981-09-28 1981-09-28 発光分光分析による濃度分布解析装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15447781A JPS5855736A (ja) 1981-09-28 1981-09-28 発光分光分析による濃度分布解析装置

Publications (2)

Publication Number Publication Date
JPS5855736A true JPS5855736A (ja) 1983-04-02
JPS642214B2 JPS642214B2 (enrdf_load_html_response) 1989-01-17

Family

ID=15585102

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15447781A Granted JPS5855736A (ja) 1981-09-28 1981-09-28 発光分光分析による濃度分布解析装置

Country Status (1)

Country Link
JP (1) JPS5855736A (enrdf_load_html_response)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62162947A (ja) * 1986-01-13 1987-07-18 Nippon Steel Corp 鋼材の表面疵要因判定法
JPH04309848A (ja) * 1991-04-08 1992-11-02 Sumitomo Metal Ind Ltd 発光分光分析方法及び発光分光分析装置
EP1355145A1 (en) * 2002-04-19 2003-10-22 Central Iron & Steel Research Institute A method for analysing metals in the fundamental state utilizing the statistical distribution of elements
EP1351049A3 (en) * 2002-04-01 2004-02-25 Central Iron & Steel Research Institute Analyzer for metal

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57122351A (en) * 1981-01-21 1982-07-30 Nippon Steel Corp Method of spectrochemical analysis wherein continuous light emission is utilized

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57122351A (en) * 1981-01-21 1982-07-30 Nippon Steel Corp Method of spectrochemical analysis wherein continuous light emission is utilized

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62162947A (ja) * 1986-01-13 1987-07-18 Nippon Steel Corp 鋼材の表面疵要因判定法
JPH04309848A (ja) * 1991-04-08 1992-11-02 Sumitomo Metal Ind Ltd 発光分光分析方法及び発光分光分析装置
EP1351049A3 (en) * 2002-04-01 2004-02-25 Central Iron & Steel Research Institute Analyzer for metal
EP1355145A1 (en) * 2002-04-19 2003-10-22 Central Iron & Steel Research Institute A method for analysing metals in the fundamental state utilizing the statistical distribution of elements

Also Published As

Publication number Publication date
JPS642214B2 (enrdf_load_html_response) 1989-01-17

Similar Documents

Publication Publication Date Title
US5572444A (en) Method and apparatus for automatic performance evaluation of electronic display devices
JP5307503B2 (ja) Ｘ線分析装置及びｘ線分析方法
US7206378B2 (en) X-ray analysis apparatus
US5303025A (en) Emission spectrochemical quantitative analysis method and apparatus
JPS5855736A (ja) 発光分光分析による濃度分布解析装置
US8705698B2 (en) X-ray analyzer and mapping method for an X-ray analysis
US5128545A (en) Method and apparatus for background correction in analysis of a specimen surface
US5895916A (en) Method and apparatus for adjusting electron beam apparatus
US3585385A (en) Method and apparatus for heat treating a material and monitoring the material content x-ray spectrographically
JP2978089B2 (ja) 金属中介在物の粒度分布測定方法
JPS5961759A (ja) 発光分光分析装置
EP0501476A2 (en) Spectroscopic analysis method and analyzing system
JP2002062270A (ja) 電子線を用いた表面分析装置における面分析データ表示方法
JPS6162849A (ja) 自動多機能分析装置の濃度線分析方式
JPH0711486B2 (ja) 発光分光分析方法
JPS62285048A (ja) 元素濃度分布測定方法
EP1351049A2 (en) Analyzer for metal
JP2000199749A (ja) 蛍光ｘ線分析装置
JPH1172450A (ja) 蛍光ｘ線分析方法および装置
JPH028199Y2 (enrdf_load_html_response)
JPS5930214B2 (ja) 介在物または偏析帯の局所発光分光分析方法
JP2001176439A (ja) 表面分析装置による分析測定方法
JPH08145891A (ja) 発光分光分析装置
JPH0660877B2 (ja) 発光分光分析法
JPH0666745A (ja) エネルギスペクトル測定装置