JPS5853980A - エツチング剤組成物 - Google Patents
エツチング剤組成物Info
- Publication number
- JPS5853980A JPS5853980A JP15241381A JP15241381A JPS5853980A JP S5853980 A JPS5853980 A JP S5853980A JP 15241381 A JP15241381 A JP 15241381A JP 15241381 A JP15241381 A JP 15241381A JP S5853980 A JPS5853980 A JP S5853980A
- Authority
- JP
- Japan
- Prior art keywords
- salt
- acid
- fluorine
- carbon atoms
- composition
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- ing And Chemical Polishing (AREA)
- Weting (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15241381A JPS5853980A (ja) | 1981-09-25 | 1981-09-25 | エツチング剤組成物 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15241381A JPS5853980A (ja) | 1981-09-25 | 1981-09-25 | エツチング剤組成物 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5853980A true JPS5853980A (ja) | 1983-03-30 |
JPS6332867B2 JPS6332867B2 (enrdf_load_stackoverflow) | 1988-07-01 |
Family
ID=15539965
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP15241381A Granted JPS5853980A (ja) | 1981-09-25 | 1981-09-25 | エツチング剤組成物 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5853980A (enrdf_load_stackoverflow) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4761245A (en) * | 1987-01-27 | 1988-08-02 | Olin Corporation | Etching solutions containing ammonium fluoride and an alkylphenol polyglycidol ether surfactant |
US4761244A (en) * | 1987-01-27 | 1988-08-02 | Olin Corporation | Etching solutions containing ammonium fluoride and an alkyl polyaccharide surfactant |
US4863563A (en) * | 1987-01-27 | 1989-09-05 | Olin Corporation | Etching solutions containing ammonium fluoride and a nonionic alkyl amine glycidol adduct and method of etching |
WO2010113616A1 (ja) * | 2009-03-31 | 2010-10-07 | ダイキン工業株式会社 | エッチング液 |
-
1981
- 1981-09-25 JP JP15241381A patent/JPS5853980A/ja active Granted
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4761245A (en) * | 1987-01-27 | 1988-08-02 | Olin Corporation | Etching solutions containing ammonium fluoride and an alkylphenol polyglycidol ether surfactant |
US4761244A (en) * | 1987-01-27 | 1988-08-02 | Olin Corporation | Etching solutions containing ammonium fluoride and an alkyl polyaccharide surfactant |
US4863563A (en) * | 1987-01-27 | 1989-09-05 | Olin Corporation | Etching solutions containing ammonium fluoride and a nonionic alkyl amine glycidol adduct and method of etching |
WO2010113616A1 (ja) * | 2009-03-31 | 2010-10-07 | ダイキン工業株式会社 | エッチング液 |
CN102379028A (zh) * | 2009-03-31 | 2012-03-14 | 大金工业株式会社 | 蚀刻液 |
KR101279293B1 (ko) * | 2009-03-31 | 2013-06-26 | 다이킨 고교 가부시키가이샤 | 에칭액 |
JP5423788B2 (ja) * | 2009-03-31 | 2014-02-19 | ダイキン工業株式会社 | エッチング液及びその製造方法、並びに該エッチング液を用いたエッチング方法及びエッチング処理物の製造方法 |
Also Published As
Publication number | Publication date |
---|---|
JPS6332867B2 (enrdf_load_stackoverflow) | 1988-07-01 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPS6039176A (ja) | エッチング剤組成物 | |
JP6443649B1 (ja) | 銅厚膜用エッチング液 | |
KR900001290B1 (ko) | 부식액 조성물 | |
EP0182306B1 (en) | Etchant composition | |
JP3630168B2 (ja) | エッチング液組成物 | |
KR960013146B1 (ko) | 마이크로 프로세싱용 표면처리 조성물 | |
US5705089A (en) | Cleaning fluid for semiconductor substrate | |
JPH0694596B2 (ja) | Nh4f/hf系の二酸化ケイ素エッチング液およびその製法 | |
JP2919959B2 (ja) | ホトレジストでパターン化された金属層のためのエッチング剤液 | |
JP3217116B2 (ja) | 低表面張力洗浄用組成物 | |
JP4684869B2 (ja) | シリコンエッチング液 | |
JPWO2008111389A1 (ja) | エッチング液及びエッチング方法 | |
US4761245A (en) | Etching solutions containing ammonium fluoride and an alkylphenol polyglycidol ether surfactant | |
JPS5853980A (ja) | エツチング剤組成物 | |
US4761244A (en) | Etching solutions containing ammonium fluoride and an alkyl polyaccharide surfactant | |
JPH02240285A (ja) | 低表面張力硫酸組成物 | |
TW201900928A (zh) | 蝕刻液組成物及蝕刻方法 | |
JPS5884974A (ja) | エツチング剤組成物 | |
EP0278628B1 (en) | Etching solutions containing ammonium fluoride | |
JP2808799B2 (ja) | 窒化シリコン膜のエッチング方法 | |
JPH0433833B2 (enrdf_load_stackoverflow) | ||
JPH11162953A (ja) | シリコンウェーハのエッチング方法 | |
JP2018032781A (ja) | エッチング液、及びエッチング方法 | |
JPH05275406A (ja) | 硫酸組成物 | |
JP2001040389A (ja) | ウエハ洗浄液 |