JPS5842229A - レジストパタ−ン形成方法 - Google Patents

レジストパタ−ン形成方法

Info

Publication number
JPS5842229A
JPS5842229A JP13976281A JP13976281A JPS5842229A JP S5842229 A JPS5842229 A JP S5842229A JP 13976281 A JP13976281 A JP 13976281A JP 13976281 A JP13976281 A JP 13976281A JP S5842229 A JPS5842229 A JP S5842229A
Authority
JP
Japan
Prior art keywords
film thickness
resist
residual film
pattern
dimension
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP13976281A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0336291B2 (enrdf_load_stackoverflow
Inventor
Shigeru Furuya
茂 古谷
Yasuhide Machida
町田　泰秀
Noriaki Nakayama
中山　範明
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP13976281A priority Critical patent/JPS5842229A/ja
Publication of JPS5842229A publication Critical patent/JPS5842229A/ja
Publication of JPH0336291B2 publication Critical patent/JPH0336291B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Electron Beam Exposure (AREA)
JP13976281A 1981-09-07 1981-09-07 レジストパタ−ン形成方法 Granted JPS5842229A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13976281A JPS5842229A (ja) 1981-09-07 1981-09-07 レジストパタ−ン形成方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13976281A JPS5842229A (ja) 1981-09-07 1981-09-07 レジストパタ−ン形成方法

Publications (2)

Publication Number Publication Date
JPS5842229A true JPS5842229A (ja) 1983-03-11
JPH0336291B2 JPH0336291B2 (enrdf_load_stackoverflow) 1991-05-31

Family

ID=15252792

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13976281A Granted JPS5842229A (ja) 1981-09-07 1981-09-07 レジストパタ−ン形成方法

Country Status (1)

Country Link
JP (1) JPS5842229A (enrdf_load_stackoverflow)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60217626A (ja) * 1984-04-12 1985-10-31 Matsushita Electronics Corp レジストパタ−ンの現像制御方法
DE19818840B4 (de) * 1997-10-01 2005-12-01 Fujitsu Ltd., Kawasaki Ladungsteilchenstrahlbelichtungsverfahren und Ladungsteilchenstrahlbelichtungsvorrichtung

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5580318A (en) * 1978-12-12 1980-06-17 Fujitsu Ltd Electron-beam exposure
JPS55140228A (en) * 1979-04-20 1980-11-01 Hitachi Ltd Method for formation of pattern

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5580318A (en) * 1978-12-12 1980-06-17 Fujitsu Ltd Electron-beam exposure
JPS55140228A (en) * 1979-04-20 1980-11-01 Hitachi Ltd Method for formation of pattern

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60217626A (ja) * 1984-04-12 1985-10-31 Matsushita Electronics Corp レジストパタ−ンの現像制御方法
DE19818840B4 (de) * 1997-10-01 2005-12-01 Fujitsu Ltd., Kawasaki Ladungsteilchenstrahlbelichtungsverfahren und Ladungsteilchenstrahlbelichtungsvorrichtung

Also Published As

Publication number Publication date
JPH0336291B2 (enrdf_load_stackoverflow) 1991-05-31

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